Showing 1–12 of 164 results

  • Al2O3 Sputtering Targets 3N-5N High Purity Aluminum Oxide Ceramic Sputtering Target High Pure 99.9%-99.999% Customized - Tinsan Materials

    Al2O3 (Aluminum Oxide) Sputtering Targets

    • High Purity: Available in purities up to 99.999% for superior thin film quality.
    • Excellent Stability: Exceptional thermal and chemical resistance for high-temperature and corrosive environments.
    • Superior Hardness: Ideal for creating durable, scratch-resistant coatings.
    • Dielectric Properties: High dielectric constant for microelectronic and capacitor applications.
    • Consistent Performance: Engineered for uniform film deposition and low contamination levels.
  • AlB2 Sputtering Targets 2N5-6N High Purity Aluminum Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    AlB2 (Aluminum Diboride) Sputtering Targets

    • High Purity: Ensures consistent and reliable deposition results.
    • Superior Thermal Stability: Suitable for high-temperature applications.
    • Durable Films: High hardness and wear resistance in thin-film layers.
    • Customizable Configurations: Available in various sizes and bonding options.
    • Broad Applicability: Adaptable for diverse industrial and scientific uses.
  • AlN Sputtering Target 3N-6N High Purity Aluminium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsAlN Sputtering Target 3N-6N High Purity Aluminium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    AlN (Aluminium Nitride) Sputtering Target

    • High Thermal Conductivity: AlN offers one of the highest thermal conductivities among non-metals, which is vital for heat dissipation in high-power electronics and optoelectronics.
    • Electrical Insulation: AlN is an excellent electrical insulator, making it suitable for electronic applications requiring electrical isolation with effective thermal management.
    • Piezoelectric Properties: AlN exhibits strong piezoelectric properties, making it ideal for use in sensors, actuators, and acoustic wave devices.
    • High Hardness and Durability: AlN films are mechanically robust, offering good wear resistance and durability for applications in harsh environments.
    • Good Chemical Stability: AlN is resistant to many chemicals and environmental conditions, ensuring longevity in demanding applications.
  • AZO Sputtering Target 3N-6N High Purity ZnO Al2O3 Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom for VacuumPVD Coating - Tinsan MaterialsAZO Sputtering Target 3N-6N High Purity ZnO Al2O3 Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom for VacuumPVD Coating - Tinsan Materials

    AZO (Aluminum-Doped Zinc Oxide) Sputtering Target

    • High Optical Transparency: AZO offers excellent transparency in the visible spectrum, making it ideal for applications requiring clear conductive films.
    • Good Electrical Conductivity: Despite its transparency, AZO provides high electrical conductivity, which is critical in photovoltaic cells and touchscreens.
    • Environmentally Friendly: Unlike ITO, AZO does not rely on scarce or expensive elements like indium, making it a more sustainable and cost-effective choice.
    • Thermal and Chemical Stability: AZO films maintain stability under various temperature and environmental conditions, making them suitable for outdoor and industrial applications.
    • Low Reflectivity: AZO films are known for their low reflectance, which is beneficial in display technologies to reduce glare and improve visibility.
  • B4C Sputtering Targets 2N-6N High Purity Boron Carbide Ceramic Sputtering Target High Pure 99%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsBoron Carbide Sputtering Targets 2N-6N High Purity B4C Ceramic Sputtering Target High Pure 99%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    B4C (Boron Carbide) Sputtering Targets

    • Exceptional Hardness: High resistance to wear and abrasion.
    • Chemical Stability: Resistant to acids and alkalis, ensuring longevity in extreme environments.
    • Lightweight: Facilitates applications where low weight is critical.
    • High Purity: Delivers superior film quality and consistency.
  • BaTiO3 Sputtering Target 3N-7N High Purity Barium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan Materials

    BaTiO3 (Barium Titanium Oxide) Sputtering Target

    • High Dielectric Constant: BaTiO₃ is known for its exceptionally high dielectric constant, making it ideal for capacitors and electro-optic applications.
    • Ferroelectric and Piezoelectric Properties: The material exhibits both ferroelectric and piezoelectric behaviors, making it suitable for memory devices, sensors, and actuators.
    • Excellent Thermal Stability: BaTiO₃ maintains good thermal stability, ensuring reliable performance in high-temperature environments.
    • High Purity and Low Defects: BaTiO₃ sputtering targets are available in high-purity grades (up to 99.999%), ensuring low defect densities in the deposited thin films, which is crucial for advanced electronic applications.
    • Custom Composition: Barium Titanate can be tailored with dopants to modify its electrical and thermal properties, optimizing performance for specific applications.
  • Bi2O2Se Sputtering Targets 2N5-6N High Purity Bismuth Oxyselenide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Bi2O2Se (Bismuth Oxyselenide) Sputtering Targets

    • Layered Structure: Enables the exfoliation of thin films for various nanodevice applications.
    • High Carrier Mobility: Supports rapid electron and hole movement for faster electronic response.
    • Tunable Bandgap: Adjustable for different applications, optimizing its use in various electronic and optical devices.
    • Good Thermal Stability: Suitable for high-temperature applications, enhancing long-term reliability.
  • Bi2S3 Sputtering Targets 3N-6N High Purity Bismuth Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Bi2S3 (Bismuth Sulfide) Sputtering Targets

    • High Conductivity: Bi₂S₃ films exhibit good electrical conductivity, making them ideal for use in electronic applications.
    • Thermoelectric Efficiency: Known for its high thermoelectric performance, making it a key material in thermoelectric energy conversion devices.
    • Optical Transparency: The material has desirable optical transparency in the visible spectrum, which is advantageous for optoelectronic applications.
    • Chemical Stability: Bismuth Sulfide is stable under a wide range of chemical conditions, which ensures longevity and reliability in demanding environments.
    • High Purity: Bi₂S₃ sputtering targets are available in high purity, ensuring the production of high-quality thin films with minimal contamination.
  • Bi2Se3 Sputtering Target 3N-6N High Purity Bismuth Selenide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Bi2Se3 (Bismuth Selenide) Sputtering Target

    • Topological Insulator Properties: Bi₂Se₃ is known for its topological insulator characteristics, where it supports surface conduction while acting as an insulator in its bulk, opening pathways for advanced quantum applications.
    • Thermoelectric Efficiency: Bi₂Se₃ exhibits excellent thermoelectric performance with a high Seebeck coefficient, making it a critical material for thermoelectric energy conversion.
    • Low Thermal Conductivity: Its low thermal conductivity helps in maximizing the thermoelectric efficiency in power generation and cooling applications.
    • High IR Sensitivity: Bi₂Se₃’s sensitivity to infrared radiation makes it ideal for IR sensors and other optoelectronic devices.
  • BiFeO3 Sputtering Target 3N-6N High Purity Bismuth Ferrite Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsBiFeO3 Sputtering Target 3N-6N High Purity Bismuth Ferrite Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    BiFeO3 (Bismuth Ferrite) Sputtering Target

    • Multiferroic Properties: BiFeO₃ demonstrates both ferroelectric and antiferromagnetic properties, making it ideal for multifunctional devices.
    • Room Temperature Functionality: One of the few multiferroic materials that operates effectively at room temperature, allowing for broader application in consumer electronics and industrial devices.
    • Photovoltaic Effects: BiFeO₃ can be used to create thin films that convert light into electricity, opening avenues for energy harvesting and improving photovoltaic technologies.
    • Customizable: The size, shape, and purity of BiFeO₃ sputtering targets can be tailored to meet specific requirements for various deposition techniques.
  • BiSbTe Sputtering Targets 3N-6N High Purity Bismuth Antimony Telluride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    BiSbTe (Bismuth Antimony Telluride) Sputtering Targets

    • Excellent Thermoelectric Performance: BiSbTe is known for its high thermoelectric efficiency, which makes it ideal for thermoelectric cooling and energy conversion applications.
    • Wide Temperature Range: BiSbTe thin films perform effectively across a broad range of temperatures, particularly between 200 K and 400 K, making them suitable for various environmental conditions.
    • Customizable Compositions: The composition of BiSbTe sputtering targets can be adjusted by varying the ratio of bismuth, antimony, and tellurium to meet specific thermoelectric performance requirements.
    • High Purity: BiSbTe sputtering targets are available in high-purity grades to ensure the highest quality thin films for critical applications in energy harvesting and temperature regulation.
    • Stable & Durable: Bismuth Antimony Telluride thin films exhibit excellent stability, long-term durability, and resistance to degradation under prolonged thermal cycling.
  • Bismuth Iron Garnet Sputtering Targets 3N-5N High Purity BiIG Bi3Fe5O12 Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized - Tinsan MaterialsBismuth Iron Garnet Sputtering Targets 3N-5N High Purity BiIG Bi3Fe5O12 Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized - Tinsan Materials

    Bismuth Iron Garnet (BiIG / Bi3Fe5O12) Sputtering Targets

    • High Purity: ≥ 99.9% purity ensures high-quality thin films with precise optical and magnetic properties.
    • Superior Magneto-Optical Performance: Provides excellent Faraday rotation and low optical loss.
    • Stable Composition: Chemically stable and reliable for prolonged usage.
    • Customizability: Available in various shapes, sizes, and thicknesses to fit specific sputtering systems.
    • Compatibility: Suitable for both RF and DC magnetron sputtering methods.