Showing 109–120 of 164 results

  • Sm2O3 Sputtering Targets 3N-6N High Purity Samarium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    Sm2O3 (Samarium Oxide) Sputtering Targets

    • High Purity: Ensures minimal contamination for reliable thin-film deposition.
    • Thermal Stability: Suitable for high-temperature processes.
    • Excellent Magnetic Properties: Ideal for magnetics and spintronic applications.
    • Optical Performance: High transparency in specific wavelength ranges.
    • Custom Configurations: Available in various sizes and purity levels.
  • SnO2 Sputtering Target 3N-6N High Purity Tin Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSnO2 Sputtering Target 3N-6N High Purity Tin Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SnO2 (Tin Oxide) Sputtering Target

    • High Transparency: SnO2 films are highly transparent in the visible light spectrum, making them suitable for optoelectronic applications like transparent conductive films.
    • Good Conductivity: Despite its transparency, SnO2 has good electrical conductivity, essential for its role in electrodes and gas sensors.
    • Wide Bandgap: SnO2 is a wide-bandgap semiconductor, giving it excellent performance in high-temperature environments and under high-voltage conditions.
    • Chemical Stability: Tin oxide is chemically stable, ensuring that films remain durable and resistant to corrosion in various conditions.
  • SnS2 Sputtering Target 3N-6N High Purity Tin Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SnS2 (Tin Disulfide) Sputtering Target

    • Semiconductor Properties: SnS₂ has a direct bandgap, making it suitable for absorbing light and generating charge carriers, ideal for photovoltaic and optoelectronic applications.
    • High Absorption Coefficient: SnS₂ thin films exhibit high optical absorption, making them effective in solar energy harvesting applications.
    • Environmentally Friendly: Tin and sulfur are abundant and non-toxic elements, making SnS₂ a more environmentally benign material compared to some other semiconductor compounds.
    • Layered Structure: The layered crystal structure of SnS₂ allows for good ion intercalation in energy storage devices and provides opportunities for 2D material applications.
  • SnSe Sputtering Targets 3N-6N High Purity Tin Selenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SnSe (Tin Selenide) Sputtering Targets

    • High Purity: ≥ 99.99% purity for optimal thin-film deposition.
    • Layered Crystal Structure: Supports efficient film formation and exfoliation.
    • Exceptional Thermoelectric Performance: High Seebeck coefficient and low thermal conductivity.
    • Broad Application Range: Versatile for electronic, photovoltaic, and thermoelectric uses.
    • Customizable Options: Available in various sizes, shapes, and bonding configurations.
  • SnSe2 Sputtering Targets 3N-6N High Purity Tin Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsSnSe2 Sputtering Targets 3N-6N High Purity Tin Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan Materials

    SnSe2 (Tin Diselenide) Sputtering Targets

    • High Purity: ≥ 99.99% purity ensures consistent and efficient thin-film deposition.
    • Layered Structure: Promotes easy exfoliation and high-quality thin-film production.
    • Exceptional Optical and Electrical Properties: High carrier mobility and excellent absorption coefficients.
    • Thermoelectric Efficiency: Strong performance in thermal-to-electric energy conversion.
    • Customizable Options: Tailored sizes and shapes to suit diverse applications.
  • SnTe Sputtering Targets 2N5-6N High Purity Tin Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SnTe (Tin Telluride) Sputtering Targets

    • High Purity: Reduces impurities, ensuring superior thin-film quality.
    • Stable Composition: Precisely controlled Sn and Te ratio for consistent performance.
    • Excellent Film Properties: Produces smooth, high-density, and defect-free films.
    • Versatile Deposition: Suitable for PVD and other thin-film coating techniques.
    • Customizable Options: Flexible sizes and specifications to fit diverse sputtering systems.
  • Sr3Al2O6 Sputtering Targets 3N-6N High Purity Strontium Aluminate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsSr3Al2O6 Sputtering Targets 3N-6N High Purity Strontium Aluminate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    Sr3Al2O6 (Strontium Aluminate) Sputtering Targets

    • Thermal Stability: Sr₃Al₂O₆ sputtering targets exhibit excellent thermal stability, making them suitable for high-temperature deposition processes.
    • Durability: The material provides strong, durable films that are resistant to wear and tear, enhancing the longevity of devices.
    • High Luminescent Properties: When doped with certain elements, it can act as a phosphorescent material, making it valuable in the display and lighting industries.
    • Versatile Film Properties: It can produce films with excellent uniformity and precise thickness control in sputtering processes.
    • Chemical Resistance: Sr₃Al₂O₆ is chemically stable, contributing to the robustness of coatings and films.
  • SrCoO3 Sputtering Targets 3N-6N High Purity Strontium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsSrCoO3 Sputtering Targets 3N-6N High Purity Strontium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan Materials

    SrCoO3 (Strontium Cobalt Oxide) Sputtering Targets

    • Excellent Electrical Conductivity: Ensures efficient charge transfer in energy devices.
    • Thermal and Chemical Stability: Performs reliably under high-temperature and reactive conditions.
    • High Purity Material: Minimizes impurities for optimal film quality.
    • Versatile Applications: Suitable for complex oxide-based thin-film devices.
    • Customizable Configurations: Various sizes, purities, and bonding options to meet specific requirements.
  • SrMnO3 Sputtering Targets 3N-6N High Purity Strontium Manganite Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrMnO3 (Strontium Manganite) Sputtering Targets

    • High Purity: Ensures low contamination and high film integrity.
    • Superior Density: Achieves consistent sputtering performance and uniform thin films.
    • Customizable Specifications: Available in various sizes, shapes, and densities.
    • Excellent Thermal Stability: Withstands high temperatures for advanced applications.
    • Wide Compatibility: Suitable for different sputtering systems.
  • SrMoO4 (Strontium Molybdate) Sputtering Targets

    • High Purity: Ensures minimal contamination in the deposited thin films.
    • Chemical Stability: Offers long-lasting performance in demanding environments.
    • Customizable: Available in various sizes, shapes, and thicknesses to meet specific requirements.
    • Consistent Quality: Designed for uniform film deposition with optimal density and microstructure.
  • SrNbO3 (Strontium Niobate) Sputtering Targets

    • High Purity: Manufactured with stringent quality controls to ensure material integrity and minimal impurities.
    • Customizable Options: Available in various sizes, thicknesses, and shapes to meet specific deposition requirements.
    • Excellent Physical Properties: Offers reliable electrical and optical performance.
    • Versatile Compatibility: Suitable for advanced sputtering systems.
  • SrRuO3 Sputtering Targets 3N-6N High Purity Strontium Ruthenate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrRuO3 (Strontium Ruthenate) Sputtering Targets

    • High Electrical Conductivity: SrRuO₃ films provide excellent electrical conductivity, making them ideal for use as electrodes and contact layers.
    • Stability: Offers good stability under various operating conditions, making it suitable for use in demanding applications.
    • Magnetic Properties: Exhibits magnetic properties, making it useful in devices that require the integration of magnetic and electronic functions.
    • Compatible with Other Oxides: SrRuO₃ can be easily integrated with other perovskite oxide materials, making it versatile for various electronic applications.
    • High Purity: Available in high-purity grades (≥99.9%) to ensure clean and consistent thin-film deposition.