Showing 121–132 of 164 results

  • SrSnO3 Sputtering Targets 3N-6N High Purity Strontium Stannate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SrSnO3 (Strontium Stannate) Sputtering Targets

    • High Purity: Ensures superior film quality and uniform deposition.
    • Optimal Conductivity: Suitable for advanced optoelectronic devices.
    • Customization: Available in various sizes, shapes, and compositions to meet specific requirements.
    • Stability: Excellent thermal and chemical stability for long-lasting performance.
  • SrTiO3 Sputtering Targets 3N-6N High Purity Strontium Titanate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan MaterialsSrTiO3 Sputtering Targets 3N-6N High Purity Strontium Titanate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SrTiO3 (Strontium Titanate) Sputtering Targets

    • High Purity: Typically ≥99.9% for superior film quality and performance
    • Excellent Dielectric Properties: Ideal for high-frequency electronic applications
    • Perovskite Structure: Ensures compatibility with complex oxide thin films
    • Customizable: Available in various sizes and shapes to suit specific requirements
    • Durability: High thermal and chemical stability for long-term use
  • SrVO3 Sputtering Targets 2N5-6N High Purity Strontium Vanadate Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrVO3 (Strontium Vanadate) Sputtering Targets

    • High Conductivity: Excellent electrical conductivity makes SrVO₃ ideal for applications requiring transparent conductive materials.
    • High Purity: Available in ≥99.5% purity, ensuring high-quality thin-film deposition.
    • Stable Sputtering Performance: Reliable and consistent sputtering performance with minimal target degradation.
    • Optical Transparency: Ideal for optoelectronic devices requiring both electrical conductivity and optical transparency.
    • Customization: Targets can be made in various sizes and shapes to meet specific deposition system requirements.
  • Ta2O5 Sputtering Target 3N-6N High Purity Tantalum Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTa2O5 Sputtering Target 3N-6N High Purity Tantalum Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    Ta2O5 (Tantalum Pentoxide) Sputtering Target

    • High Dielectric Constant: Ta₂O₅ films exhibit a high dielectric constant, making them ideal for use in capacitors and semiconductor devices requiring high electrical insulation.
    • Chemical and Thermal Stability: Ta₂O₅ provides excellent resistance to chemical attack and can withstand high temperatures, making it suitable for applications in harsh environments.
    • Optical Transparency: Ta₂O₅ is transparent over a wide range of wavelengths, which makes it an excellent material for optical coatings that require high refractive index and low absorption.
    • High Refractive Index: The high refractive index of Ta₂O₅ makes it ideal for optical multilayer coatings used in anti-reflective applications and optical filters.
    • Durability: Ta₂O₅ films are known for their mechanical strength and durability, providing a robust protective layer in various high-performance applications.
  • TaC Sputtering Target 3N-6N High Purity Tantalum Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsTaC Sputtering Target 3N-6N High Purity Tantalum Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    TaC (Tantalum Carbide) Sputtering Target

    • Extreme Hardness: TaC coatings provide excellent hardness, making them ideal for cutting tools, wear-resistant coatings, and surfaces exposed to high friction.
    • High Melting Point: With a melting point exceeding 3880°C, TaC is one of the most heat-resistant materials, suitable for high-temperature applications in aerospace and industrial processes.
    • Corrosion Resistance: TaC films offer robust resistance to chemicals, making them ideal for protective coatings in chemically aggressive environments.
    • Electrical Conductivity: TaC has good electrical conductivity, which is advantageous in certain electronic and semiconductor applications.
    • Oxidation Resistance: The oxidation resistance of TaC enhances its performance in environments where exposure to high temperatures and reactive gases is common.
  • TaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsTaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    TaN (Tantalum Nitride) Sputtering Target

    • Excellent Diffusion Barrier: TaN films provide an effective barrier against the diffusion of metals, such as copper, making them crucial for semiconductor devices.
    • High Electrical Resistivity: TaN has a relatively high electrical resistivity, which makes it suitable for thin-film resistors and other resistive applications.
    • Chemical and Thermal Stability: Tantalum Nitride exhibits excellent stability in extreme chemical and thermal environments, ensuring long-lasting performance in harsh conditions.
    • Hardness and Wear Resistance: TaN films offer superior hardness and wear resistance, making them ideal for protective coatings in demanding industrial applications.
    • Corrosion Resistance: TaN is resistant to corrosion, making it suitable for use in environments where exposure to chemicals or moisture is a concern.
  • TeCd Sputtering Target 3N-6N High Purity Tellurium Cadmium Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    TeCd (Tellurium Cadmium) Sputtering Target

    • Excellent Photovoltaic Properties: TeCd, especially CdTe, is widely used in thin-film solar cells due to its excellent light absorption and efficient energy conversion.
    • Infrared Sensitivity: TeCd thin films exhibit high sensitivity to infrared light, making them suitable for infrared detectors and thermal imaging devices.
    • Stable Thin Films: TeCd films are chemically stable and durable, ensuring long-term performance in harsh environmental conditions.
    • Efficient Energy Conversion: TeCd materials offer high energy conversion efficiency, particularly in solar and thermoelectric applications, providing reliable performance in energy devices.
  • Ti2O3 Sputtering Targets 3N-6N High Purity Titanium(III) Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Ti2O3 (Titanium(III) Oxide) Sputtering Targets

    • High Purity: Ensures uniform film deposition with minimal contamination.
    • Excellent Optical Properties: Provides transparency and reflectivity for optical applications.
    • Electrical Conductivity: Suitable for applications requiring conductive thin films.
    • Durable and Stable: Resistant to chemical and thermal degradation, ensuring long-lasting performance.
    • Versatile Compatibility: Can be used with various sputtering systems and processes.
  • Ti3O5 Sputtering Targets 2N5-6N High Purity Titanium Oxide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Ti3O5 (Titanium Oxide) Sputtering Targets

    • High Purity: Ensures consistent and reliable thin-film quality.
    • Stable Performance: Exceptional thermal and chemical stability for demanding applications.
    • Customizable Configurations: Available in various sizes and forms to suit diverse deposition systems.
    • Optical Clarity: Produces transparent coatings with excellent optical properties.
    • Durability: High resistance to mechanical stress and environmental degradation.
  • TiB2 Sputtering Targets 2N5-5N High Purity Titanium Diboride Ceramic Sputtering Target High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan MaterialsTiB2 Sputtering Targets 2N5-5N High Purity Titanium Diboride Ceramic Sputtering Targets High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    TiB2 (Titanium Diboride) Sputtering Targets

    • Exceptional Hardness: Provides superior durability and wear resistance.
    • High Thermal Stability: Performs well under extreme temperatures.
    • Electrical Conductivity: Suitable for electronic applications requiring conductive layers.
    • Corrosion Resistance: Withstands harsh chemical environments.
    • High Purity: Ensures consistent thin-film quality and reliable performance.
  • TiC Sputtering Target 3N-6N High Purity Titanium Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiC Sputtering Target 3N-6N High Purity Titanium Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiC (Titanium Carbide) Sputtering Target

    • High Hardness: TiC coatings provide excellent hardness, making them suitable for wear-resistant applications like cutting tools and dies.
    • Corrosion Resistance: TiC films resist oxidation and corrosion, providing a protective barrier in harsh environments, including high-temperature applications.
    • Thermal Stability: TiC has high thermal stability, making it ideal for coatings in high-temperature operations such as aerospace and automotive components.
    • Electrical Conductivity: TiC exhibits good electrical conductivity, making it suitable for certain electronic and semiconductor applications where conductivity is critical.
    • Chemical Resistance: TiC coatings offer chemical resistance, providing protective layers against corrosive agents and harsh chemicals.
  • TiN Sputtering Target 3N-6N High Purity Titanium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiN Sputtering Target 3N-6N High Purity Titanium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiN (Titanium Nitride) Sputtering Target

    • High Hardness: TiN coatings are known for their exceptional hardness, making them ideal for cutting tools and components subject to high friction and stress.
    • Corrosion Resistance: TiN provides excellent protection against corrosion and oxidation, extending the lifespan of coated parts and tools.
    • High Temperature Stability: TiN remains stable at high temperatures, making it suitable for applications in high-temperature environments such as aerospace or industrial machinery.
    • Good Electrical Conductivity: TiN is conductive and is often used in microelectronics as a barrier or adhesion layer in integrated circuits.
    • Gold-Like Appearance: TiN has a bright gold color, making it popular for decorative applications and coatings in architectural elements and consumer products.