Showing 133–144 of 164 results

  • SnS Sputtering Targets 3N-6N High Purity Tin Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Tin Sulfide (SnS) Sputtering Targets

    • High Purity: ≥ 99.9% purity ensures consistent and high-quality film deposition.
    • Optoelectronic Properties: Exhibits excellent absorption coefficients and semiconducting behavior.
    • Environmentally Friendly: Non-toxic and abundant material for sustainable applications.
    • Customizable Formulations: Tailored compositions to meet specific research and industrial needs.
    • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.
  • TiO Sputtering Targets 2N5-6N High Purity Titanium Monoxide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    TiO (Titanium Monoxide) Sputtering Targets

    • High Purity: Ensures superior film quality and minimal contamination.
    • Stable Properties: Excellent thermal and chemical stability under deposition conditions.
    • Customizable Forms: Available in various sizes and shapes to suit specific system requirements.
    • Versatile Performance: Suitable for a wide range of thin-film applications.
    • Durability: High mechanical strength for extended usability.
  • TiO2 Sputtering Target 3N-6N High Purity Titanium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiO2 Sputtering Target 3N-6N High Purity Titanium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiO2 (Titanium Dioxide) Sputtering Target

    • High Refractive Index: TiO₂ has one of the highest refractive indices among dielectric materials, making it ideal for optical coatings that require light management.
    • Photocatalytic Activity: TiO₂ is highly effective as a photocatalyst, breaking down organic compounds and providing self-cleaning or environmental purification functions.
    • High Dielectric Constant: TiO₂’s excellent dielectric properties make it useful in capacitors and other semiconductor applications requiring stable, insulating layers.
    • Thermal and Chemical Stability: TiO₂ films are stable under high temperatures and resistant to chemical attack, which is important for robust and long-lasting coatings.
    • UV Absorption: TiO₂ effectively absorbs UV light, making it suitable for applications in UV-blocking coatings or as a protective layer in various devices.
  • TiSi2 Sputtering Targets 3N-6N High Purity Titanium Silicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    TiSi2 (Titanium Silicide) Sputtering Targets

    • High Electrical Conductivity: Enables efficient current flow in thin films.
    • Thermal Stability: Performs well under high-temperature conditions.
    • High Purity: Ensures minimal impurities for precise and reliable deposition.
    • Versatility: Suitable for a wide range of deposition techniques, including magnetron sputtering.
    • Customizable Specifications: Tailored to meet the demands of diverse applications.
  • TiTe2 Sputtering Targets 3N-6N High Purity Titanium Ditelluride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    TiTe2 (Titanium Ditelluride) Sputtering Targets

    • High Purity: Ensures optimal film quality and performance.
    • Excellent Electrical Conductivity: Suitable for advanced electronic applications.
    • Thermal Stability: Resilient under high-temperature deposition processes.
    • Layered Structure: Ideal for 2D material synthesis and related technologies.
    • Customizable Specifications: Available in tailored sizes, shapes, and configurations.
  • Tm2O3 Sputtering Targets 3N-6N High Purity Thulium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    Tm2O3 (Thulium Oxide) Sputtering Targets

    • High Purity: Ensures optimal performance and low impurity levels in thin films.
    • Exceptional Optical Properties: Ideal for laser and photonic applications.
    • Thermal Stability: Suitable for high-temperature processes.
    • Customizable Specifications: Adaptable to diverse application needs.
    • Compatibility: Works with various sputtering systems, including RF and DC.
  • Tm3Fe5O12 Sputtering Targets 2N5-6N High Purity Thulium Iron Garnet Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Tm3Fe5O12 (Thulium Iron Garnet) Sputtering Targets

    • High Purity: Ensures minimal contamination for superior thin-film properties.
    • Precise Stoichiometry: Optimized Tm₃Fe₅O₁₂ composition for consistent results.
    • Magnetic and Optical Excellence: Delivers high-performance film characteristics.
    • Robust Performance: Supports a wide range of deposition techniques.
    • Customizable Options: Tailored specifications for diverse deposition systems.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    Tungsten Trioxide (WO3) Sputtering Targets

    • High Purity: Ensures consistent film quality and performance.
    • Customizable Dimensions: Available in a variety of sizes and shapes to meet specific requirements.
    • Excellent Durability: Suitable for high-temperature and high-power sputtering processes.
    • Uniformity: Enables consistent thin-film deposition for advanced technologies.
    • Eco-Friendly Applications: Ideal for energy-efficient devices like smart windows.
  • V2O5 Sputtering Target 3N-6N High Purity Vanadium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsV2O5 Sputtering Target 3N-6N High Purity Vanadium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    V2O5 (Vanadium Pentoxide) Sputtering Target

    • Electrochromic Properties: V₂O₅ is a well-known electrochromic material, enabling the dynamic control of optical properties in thin films.
    • High Oxidation State: Vanadium pentoxide has a high oxidation state, which enhances its catalytic and electrochemical performance in various applications.
    • Thermal Stability: V₂O₅ is stable at high temperatures, making it suitable for thin-film applications that require resistance to heat.
    • Multifunctional: V₂O₅ is versatile and can be used in applications ranging from energy storage to optical and gas-sensing devices.
  • VC Sputtering Targets 2N5-6N High Purity Vanadium Carbide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Carbide (VC) Sputtering Targets

    • Exceptional Hardness: Provides outstanding resistance to abrasion and wear.
    • Chemical Stability: Maintains performance in harsh and reactive environments.
    • High Thermal Conductivity: Efficiently dissipates heat in critical applications.
    • Uniform Deposition: Ensures consistent film quality with minimal defects.
    • Customizable Options: Available in various sizes and purities for specialized applications.
  • VN Sputtering Targets 3N-6N High Purity Vanadium Nitride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Nitride (VN) Sputtering Targets

    • High hardness and wear resistance, ideal for demanding environments
    • Excellent corrosion resistance, prolonging the life of components
    • Stable and consistent film quality for precise deposition
    • Suitable for high-temperature and high-performance applications
    • Enhanced durability in harsh operational conditions
    • Compatible with various sputtering systems and deposition techniques
  • VB2 Sputtering Targets 2N5-6N High Purity Vanadium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VB2 (Vanadium Diboride) Sputtering Targets

    • Exceptional Hardness: VB₂ coatings provide unmatched surface durability and wear resistance.
    • High Electrical Conductivity: Ensures efficient conductivity for electronic applications.
    • Thermal Stability: Retains structural integrity under high-temperature conditions, making it suitable for extreme environments.
    • Chemical Stability: Resists corrosion in aggressive chemical and environmental conditions.
    • Customizable Dimensions: Tailored to specific application needs with a range of sizes and shapes available.