Showing 145–156 of 164 results

  • VO2 Sputtering Target 3N-6N High Purity Vanadium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsVO2 Sputtering Target 3N-6N High Purity Vanadium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    VO2 (Vanadium Dioxide) Sputtering Target

    • Phase Transition: One of the most distinctive features of VO₂ is its reversible phase transition from an insulator to a metal at around 68°C. This enables tunable electrical and optical properties, making it a versatile material in smart applications.
    • Thermochromic Behavior: VO₂’s thermochromic properties are used in energy-efficient coatings that automatically adjust their transparency and reflectivity based on temperature.
    • Optical Properties: VO₂ exhibits unique optical behavior, including changes in reflectivity and transmission with temperature, making it suitable for use in smart windows and optical devices.
    • Electrical Properties: VO₂ switches between insulating and metallic phases, making it useful for electronic switching applications, such as transistors and memory devices.
  • VSi2 Sputtering Targets 3N-6N High Purity Vanadium Disilicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VSi2 (Vanadium Disilicide) Sputtering Targets

    • Superior Electrical Conductivity: VSi₂ is an excellent conductor of electricity, making it ideal for applications where conductive coatings are required.
    • High Thermal Stability: The material maintains its integrity under high temperatures, making it suitable for high-temperature applications.
    • Hardness and Durability: Known for its wear resistance, VSi₂ is used in applications that demand exceptional durability and surface hardness.
    • Corrosion Resistance: Offers good resistance to corrosion, particularly in aggressive environments.
    • Customizable Sizes: Available in various sizes and thicknesses to meet specific application requirements.
  • WC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WC (Tungsten Carbide) Sputtering Target

    • Exceptional Hardness: WC films offer high hardness, contributing to their use in tools and wear-resistant coatings.
    • Thermal Stability: Tungsten Carbide thin films can withstand high temperatures without degrading, making them suitable for high-temperature environments.
    • High Melting Point: WC has a melting point above 2,870°C, ensuring it retains its structural integrity in extreme conditions.
    • Corrosion Resistance: WC coatings provide strong resistance against corrosion, enhancing the longevity of components used in harsh environments.
    • Excellent Adhesion: WC sputtered films adhere well to various substrates, including metals and ceramics, ensuring durability and longevity of the coatings.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    WO3 (Tungsten Trioxide) Sputtering Targets

    • High Melting Point: WO₃ has a high melting point (~1473°C), making it suitable for high-temperature applications.
    • Chemical Stability: WO₃ is chemically stable and resistant to oxidation, ensuring long-term reliability in harsh environments.
    • Transparency Control: WO₃ films can be engineered for transparency modulation, useful in smart glass and energy-efficient windows.
    • High Conductivity: When doped or treated, WO₃ can exhibit increased electrical conductivity for various electronic applications.
  • WS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WS2 (Tungsten Disulfide) Sputtering Target

    • Low Friction Coefficient: WS2 thin films exhibit an extremely low coefficient of friction, which is beneficial for improving the performance of mechanical systems in high-friction environments.
    • Thermal Stability: WS2 coatings maintain their properties at elevated temperatures, making them suitable for high-temperature applications.
    • High Wear Resistance: WS2 offers exceptional wear resistance, extending the operational life of coated components subjected to abrasive conditions.
    • Chemical Inertness: WS2 is resistant to corrosion and oxidation, making it durable in harsh chemical environments.
    • Layered Structure: The unique layered structure of WS2 provides excellent lubricating properties due to the easy shearing between layers.
  • WSi2 Sputtering Targets 2N5-6N High Purity Tungsten Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    WSi2 (Tungsten Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Withstands high-temperature operations.
    • High Electrical Conductivity: Ideal for conductive and resistive layers.
    • Oxidation Resistance: Reliable performance in harsh environments.
    • High Purity: Ensures uniform deposition and minimal contamination.
    • Customizability: Available in various dimensions and purities to suit specific needs.
  • WTe2 Sputtering Targets 2N5-6N High Purity Tungsten Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    WTe2 (Tungsten Telluride) Sputtering Targets

    • High Purity: Ensures superior thin-film quality with minimal impurities.
    • Layered Structure: Supports the formation of ultra-thin films with excellent properties.
    • Stable Composition: Reliable and consistent deposition outcomes.
    • Versatile Application: Compatible with various sputtering systems and techniques.
    • Customizable Options: Tailored targets for specific research and industrial requirements.
  • Y2O3 Sputtering Target 3N-6N High Purity Yttrium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsY2O3 Sputtering Target 3N-6N High Purity Yttrium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Y2O3 (Yttrium Oxide) Sputtering Target

    • High Thermal Stability: Y₂O₃ maintains stability even at high temperatures, making it suitable for applications that require heat resistance.
    • Wide Bandgap: Its wide bandgap allows Y₂O₃ to function effectively as an insulator and dielectric in electronic devices.
    • Excellent Optical Properties: Y₂O₃ exhibits high transmittance in the visible and infrared ranges, making it ideal for optical coatings and laser technologies.
    • Corrosion Resistance: Y₂O₃ offers excellent resistance to chemical corrosion, making it valuable in environments where exposure to aggressive chemicals is common.
  • Y3Fe5O12 Yttrium Iron Garnet Sputtering Targets 3N-6N High Purity YIG Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsY3Fe5O12 Yttrium Iron Garnet Sputtering Targets 3N-6N High Purity YIG Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    Y3Fe5O12 (Yttrium Iron Garnet / YIG) Sputtering Targets

    • Excellent Magnetic Properties: High-quality films with strong magneto-optic effects.
    • Dielectric Stability: Low-loss properties for microwave and optical applications.
    • Thermal Resistance: Operates reliably under high temperatures.
    • High Purity: Ensures consistent film quality and performance.
    • Customizable: Tailored compositions and dimensions to meet specific requirements.
  • Yb2O3 Sputtering Target 3N-6N High Purity Ytterbium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Yb2O3 (Ytterbium Oxide) Sputtering Target

    • High Optical Transparency: Yb₂O₃ provides excellent transparency in the infrared region, making it ideal for IR optics and laser systems.
    • Thermal and Chemical Stability: Ytterbium Oxide is thermally and chemically stable, which ensures longevity and performance in high-temperature and chemically harsh environments.
    • High Purity and Low Defects: Yb₂O₃ sputtering targets are available in high-purity grades (up to 99.999%), ensuring low defect densities in the deposited thin films, critical for applications in optics and electronics.
    • Rare-Earth Material: As a rare-earth oxide, Yb₂O₃ possesses unique electronic properties, making it highly valuable for specific applications in advanced technology.
  • YF3 Sputtering Targets 3N-6N High Purity Yttrium Trifluoride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsYF3 Sputtering Targets 3N-6N High Purity Yttrium Trifluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    YF3 (Yttrium Trifluoride) Sputtering Targets

    • Low Refractive Index: YF₃ films offer a low refractive index, making them ideal for anti-reflective coatings and optical thin films.
    • High Purity: Available in ≥99.9% purity, ensuring clean deposition and minimal contamination in thin-film applications.
    • Chemical Resistance: Resistant to acid and alkali, making it suitable for harsh environments.
    • Optical Transparency: High optical transparency in the UV and visible spectra, enhancing the performance of optical coatings.
    • Durability: Offers excellent mechanical properties and resistance to environmental degradation, ensuring long-term stability.
  • Zn3Sb2 Sputtering Targets 3N-6N High Purity Zinc Antimony Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsZn3Sb2 Sputtering Targets 3N-6N High Purity Zinc Antimony Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Zn3Sb2 (Zinc Antimony) Sputtering Targets

    • Thermoelectric Properties: Zn₃Sb₂ is known for its high thermoelectric efficiency, making it an excellent material for energy conversion applications.
    • High Purity: Available in various purity grades, ensuring the production of high-quality thin films.
    • Stable Deposition: Consistent film quality and performance, ideal for advanced manufacturing processes.
    • Durability: Offers excellent thermal stability, reducing the risk of material degradation during deposition and application.
    • Wide Application Range: Suitable for a variety of industries, including semiconductor, energy, and sensing technologies.