Showing 25–36 of 164 results

  • CoO Sputtering Target 3N-7N High Purity Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized for VacuumPVD Coating - Tinsan MaterialsCoO Sputtering Target 3N-7N High Purity Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized for VacuumPVD Coating - Tinsan Materials

    CoO (Cobalt Oxide) Sputtering Target

    • Antiferromagnetic Properties: CoO exhibits antiferromagnetic behavior, which is useful in magnetic storage applications and spintronics.
    • High Stability: Cobalt Oxide is thermally and chemically stable, making it suitable for applications in harsh environments, including high-temperature energy storage and catalysis.
    • Catalytic Activity: CoO’s catalytic properties make it an important material for fuel cells and chemical reactors, especially in energy and environmental applications.
    • Semiconductor Characteristics: CoO has semiconducting properties, with applications in optoelectronics, sensors, and energy devices.
  • Cr2O3 Sputtering Target 3N-6N High Purity Chromium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsCr2O3 Sputtering Target 3N-6N High Purity Chromium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    Cr2O3 (Chromium Oxide) Sputtering Target

    • High Hardness: Chromium oxide produces extremely hard coatings that are resistant to scratching, wear, and corrosion, ideal for industrial and mechanical applications.
    • Chemical Resistance: Cr₂O₃ coatings are chemically inert and resist oxidation and corrosion, making them useful in harsh chemical environments.
    • Thermal Stability: Chromium oxide has excellent thermal stability, allowing it to maintain its protective properties even at elevated temperatures.
    • High IR Absorption: Due to its absorption properties in the infrared spectrum, Cr₂O₃ sputtering targets are used in coatings for IR sensors and optical devices.
  • Cr3C2 Sputtering Targets 2N5-6N High Purity Chromium Carbide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Cr3C2 (Chromium Carbide) Sputtering Targets

    • Exceptional Hardness: Ensures long-lasting and wear-resistant coatings.
    • High Corrosion Resistance: Protects against oxidation and chemical exposure.
    • Thermal Stability: Reliable performance in high-temperature conditions.
    • High Purity: Supports defect-free deposition for critical applications.
    • Versatile Applications: Applicable in multiple industries, including aerospace and automotive.
  • CrB2 Sputtering Targets 2N5-6N High Purity Chromium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    CrB2 (Chromium Diboride) Sputtering Targets

    • Superior Hardness: Produces coatings with excellent wear resistance.
    • High Thermal Stability: Ideal for high-temperature environments.
    • Corrosion Resistance: Protects components exposed to harsh conditions.
    • High Purity: Ensures consistent deposition and defect-free thin films.
    • Customizable Design: Available in various sizes and configurations to suit diverse sputtering systems.
  • CrN Sputtering Targets 2N5-6N High Purity Chromium Nitride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    CrN (Chromium Nitride) Sputtering Targets

    • High Hardness: Enhances wear resistance for durable applications.
    • Corrosion Resistant: Protects against harsh environmental conditions.
    • Thermally Stable: Maintains integrity under high temperatures.
    • Excellent Adhesion: Forms strong bonds with a variety of substrates.
    • Customizable: Available in a range of sizes, shapes, and purity levels.
  • CrSi2 Sputtering Targets 2N5-6N High Purity Chromium Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    CrSi2 (Chromium Disilicide) Sputtering Targets

    • High Purity: Ensures the production of defect-free thin films with superior properties.
    • Thermal Stability: Withstands high-temperature processes without degradation.
    • Excellent Conductivity: Suitable for electronic and optoelectronic applications.
    • Customizable Design: Available in a variety of shapes and sizes to fit specific sputtering systems.
    • Durable Material: Resistant to oxidation and corrosion for reliable long-term use.
  • Cu2O Sputtering Target 3N-6N High Purity Cuprous Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsCu2O Sputtering Target 3N-6N High Purity Cuprous Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Cu2O (Cuprous Oxide) Sputtering Target

    • Semiconductor Properties: Cu₂O is a p-type semiconductor with a direct bandgap, making it ideal for optoelectronic applications like solar cells and sensors.
    • High Purity: High-purity Cu₂O sputtering targets are available to ensure efficient and precise deposition of thin films with minimal impurities.
    • Environmentally Friendly: Cu₂O is a non-toxic, earth-abundant material, which makes it a sustainable choice for eco-friendly applications, especially in solar energy.
    • Cost-effective: Compared to other materials, Cu₂O is affordable, making it attractive for large-scale applications such as photovoltaic cells.
  • Cu2S Sputtering Target 3N-6N High Purity Cuprum Copper Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsCu2S Sputtering Target 3N-6N High Purity Cuprum Copper Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Cu2S (Copper Sulfide) Sputtering Target

    • Semiconductor Properties: Cu₂S has p-type semiconductor properties, making it suitable for various electronic and photovoltaic applications.
    • Good Optical Absorption: Cu₂S efficiently absorbs light, especially in the visible and near-infrared regions, making it ideal for solar cell applications.
    • High Conductivity: Cu₂S exhibits good electrical conductivity, which is useful in applications that require conductive thin films.
    • Thermal and Chemical Stability: Copper(I) Sulfide is thermally stable and resistant to certain chemicals, ensuring durability in harsh environments.
  • Cu2Se Sputtering Targets 2N5-6N High Purity Copper(I) Selenide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan MaterialsCu2Se Sputtering Targets 2N5-6N High Purity Copper(I) Selenide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customize - Tinsan Materials

    Cu2Se (Copper(I) Selenide) Sputtering Targets

    • High Purity: ≥99.5% purity for optimal thin-film quality.
    • Stable Composition: Ensures consistent performance during sputtering.
    • Excellent Electrical Conductivity: Suitable for functional thin-film coatings.
    • Thermal and Chemical Stability: Performs reliably under various sputtering conditions.
    • Customizable: Adaptable to specific equipment and application requirements.
  • CuInGaSe CIGS Ceramic Target 99.9%-99.99999% High Purity Cuprum Copper Indium Gallium Selenium Ceramic Sputtering Targets 3N-7N Customized - Tinsan MaterialsCuInGaSe CIGS Ceramic Target 99.9%-99.99999% High Purity Cuprum Copper Indium Gallium Selenium Ceramic Sputtering Targets 3N-7N Customized - Tinsan Materials

    CuInGaSe CIGS (Copper Indium Gallium Selenium) Ceramic Targets

    • High Solar Conversion Efficiency: CuInGaSe (CIGS) thin films exhibit high energy conversion efficiency, particularly in thin-film photovoltaic cells, making them an ideal choice for modern solar technology.
    • Wide Bandgap Tunability: The presence of gallium allows for tuning the bandgap, which improves the absorption spectrum and efficiency of solar cells.
    • Lightweight and Flexible: CIGS thin-film solar panels are lighter and more flexible compared to traditional silicon-based panels, enabling their use in various applications, from portable devices to large-scale installations.
    • Excellent Absorption Properties: CIGS thin films offer superior absorption of sunlight across a wide range of wavelengths, making them more effective at capturing solar energy, even in diffuse or low-light conditions.
    • Stable in Harsh Conditions: CuInGaSe thin films provide stability and performance reliability in a range of environmental conditions, ensuring long-lasting performance in solar panels.
  • CuO Sputtering Target 3N-6N High Purity Cuprum Copper Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    CuO (Copper Oxide) Sputtering Target

    • Narrow Bandgap: CuO is a p-type semiconductor with a narrow bandgap (~1.2-1.7 eV), making it suitable for absorbing visible light, ideal for solar energy and semiconductor applications.
    • High Absorption: CuO exhibits excellent light absorption in the visible range, enhancing its efficiency in photovoltaic cells and other optical applications.
    • Chemical Stability: CuO thin films are highly stable, offering long-lasting performance in various environmental conditions.
    • Customizable: CuO sputtering targets can be tailored in size, shape, and purity to fit specific deposition systems and applications.
  • CuS Sputtering Target 3N-6N High Purity Cuprum Copper Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsCuS Sputtering Target 3N-6N High Purity Cuprum Copper Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    CuS (Copper Sulfide) Sputtering Target

    • Semiconductor Properties: CuS is a p-type semiconductor, making it suitable for applications in photovoltaics and semiconductor devices.
    • High Absorption: Copper Sulfide has strong light absorption characteristics, especially in the visible spectrum, making it ideal for solar energy applications.
    • Customizable: CuS sputtering targets can be customized in terms of size, purity, and bonding options to meet specific deposition requirements.
    • High Chemical Stability: CuS is chemically stable, which ensures the longevity and durability of the deposited thin films.