Showing 73–84 of 164 results

  • Mg3Bi2 Sputtering Target 3N-6N High Purity Magnesium Bismuth Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Mg3Bi2 (Magnesium Bismuth) Sputtering Target

    • High Thermoelectric Efficiency: Magnesium Bismuth is recognized for its high Seebeck coefficient and low thermal conductivity, making it an efficient material for thermoelectric applications.
    • Low-Temperature Thermoelectrics: Mg3Bi2 is particularly effective at lower temperatures, which makes it suitable for a wide range of thermoelectric devices that operate in ambient conditions.
    • Customizable Film Properties: The thin films produced using Mg3Bi2 targets can be tailored in terms of thickness and crystallinity, allowing for optimization in various applications.
    • Chemical Stability: Magnesium Bismuth films exhibit good stability, ensuring reliable performance over time in demanding environments.
  • MgF2 Sputtering Target 3N-6N High Purity Magnesium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Vacuum PVD Coating - Tinsan MaterialsMgF2 Sputtering Target 3N-6N High Purity Magnesium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Vacuum PVD Coating - Tinsan Materials

    MgF2 (Magnesium Fluoride) Sputtering Target

    • Broad Transparency Range: MgF₂ has excellent transmission across UV, visible, and IR spectra, making it an ideal material for high-performance optical coatings.
    • Low Refractive Index: The low refractive index of MgF₂ helps reduce light reflection, enabling its use in anti-reflective coatings for various optical applications.
    • High Hardness and Durability: Magnesium Fluoride films are known for their hardness and resistance to scratching, making them suitable for protective coatings in high-durability environments.
    • Chemical and Environmental Stability: MgF₂ coatings are chemically inert and stable under extreme temperature conditions, enhancing their use in both optical and electronic applications.
  • MgO Sputtering Targets 3N-6N High Purity Magnesium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsMgO Sputtering Targets 3N-6N High Purity Magnesium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    MgO (Magnesium Oxide) Sputtering Targets

    • High Purity: Guarantees consistent and reliable thin-film quality.
    • Thermal Stability: Performs exceptionally under high-temperature conditions.
    • Excellent Dielectric Properties: Ideal for insulating layers in electronic devices.
    • Wide Optical Transparency: Operates effectively across UV, visible, and IR spectra.
    • Customizable Options: Available in various shapes, sizes, and specifications.
  • MnO2 Sputtering Target 3N-6N High Purity Manganese Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom - Tinsan MaterialsMnO2 Sputtering Target 3N-6N High Purity Manganese Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom - Tinsan Materials

    MnO2 (Manganese Dioxide) Sputtering Target

    • High Purity: Available in high-purity grades, ensuring clean and efficient thin-film deposition with minimal contamination.
    • Good Electrochemical Properties: MnO₂ thin films are known for their excellent electrochemical behavior, making them ideal for energy storage applications.
    • Thermal Stability: MnO₂ exhibits stability at high temperatures, making it suitable for thin-film processes that require heat resistance.
    • Wide Range of Applications: The material is versatile, with applications ranging from energy storage and catalysis to optical coatings and sensors.
  • MnTe Sputtering Targets 99.9%-99.9999% High Purity Manganese Telluride Sputtering Target 3N-6N Customized - Tinsan Materials

    MnTe (Manganese Telluride) Sputtering Targets

    • Semiconducting Properties: MnTe exhibits semiconductor behavior, making it suitable for a variety of electronic and optoelectronic applications.
    • Magnetic Properties: With ferromagnetic behavior, MnTe is essential for applications in spintronics and magnetic sensors.
    • Thermoelectric Efficiency: The material has promising thermoelectric properties, offering potential in energy harvesting and cooling applications.
    • High Purity: MnTe sputtering targets are available in high-purity grades, ensuring the production of clean, high-performance thin films.
    • Chemical Stability: MnTe thin films offer chemical stability in various environments, which is critical for long-lasting and reliable device performance.
  • Mo2C Sputtering Targets 2N5-5N High Purity Molybdenum Carbide Ceramic Sputtering Target High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan MaterialsMo2C Sputtering Targets 2N5-5N High Purity Molybdenum Carbide Ceramic Sputtering Target High Pure 99.5%-99.999% Customize for Thin Film Deposition - Tinsan Materials

    Mo2C (Molybdenum Carbide) Sputtering Targets

    • High purity: Ensures superior film quality with minimal contamination.
    • Outstanding hardness: Provides durability for mechanical applications.
    • Thermal stability: Ideal for high-temperature environments.
    • Customizable dimensions: Available in a variety of sizes, shapes, and thicknesses to meet specific project requirements.
    • High deposition efficiency: Optimized for uniform thin-film production.
  • MoB2 Sputtering Targets 2N5-5N High Purity Molybdenum Diboride Ceramic Sputtering Target High Pure 99.5%-99.999% Customized - Tinsan Materials

    MoB2 (Molybdenum Diboride) Sputtering Targets

    • High Hardness: Provides robust protective coatings for enhanced durability.
    • Thermal and Chemical Stability: Ensures excellent performance in harsh environments.
    • Electrical Conductivity: Suitable for electronic applications requiring conductive thin films.
    • Customizable Options: Available in various dimensions and configurations for specific needs.
    • Consistent Quality: Manufactured to deliver uniform deposition rates and film properties.
  • MoO2 Sputtering Targets 3N-6N High Purity Molybdenum Dioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    MoO2 (Molybdenum Dioxide) Sputtering Targets

    • High Purity: Guarantees superior film quality and reduces impurities.
    • Excellent Conductivity: Suitable for applications requiring conductive thin films.
    • Thermal Stability: Performs reliably in high-temperature environments.
    • Customizable Specifications: Tailored to specific sputtering system requirements.
    • Versatility: Compatible with various sputtering techniques, including RF and DC.
  • MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsMoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoO3 (Molybdenum Trioxide) Sputtering Target

    • High Work Function: MoO₃ is known for its high work function, which makes it ideal for applications requiring efficient charge injection or extraction, such as OLEDs and OPVs.
    • Excellent Catalytic Properties: MoO₃ is a robust catalyst, especially in oxidation reactions, making it suitable for industrial chemical processes and catalytic thin films.
    • Electrochromic Behavior: MoO₃’s ability to undergo reversible oxidation-reduction reactions makes it ideal for use in electrochromic devices.
    • Optical Transparency: MoO₃ thin films can be transparent in the visible and near-infrared regions, which is beneficial for optoelectronic devices requiring transparent electrodes or coatings.
  • MoS2 Sputtering Target 3N-6N High Purity Molybdenum Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsMoS2 Sputtering Target 3N-6N High Purity Molybdenum Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoS2 (Molybdenum Disulfide) Sputtering Target

    • Layered Structure: MoS2 has a unique layered structure that contributes to its mechanical, electrical, and tribological properties, making it an excellent candidate for advanced coatings and devices.
    • Semiconducting Properties: MoS2 is a semiconductor with a direct bandgap in its monolayer form, offering high performance in electronic devices such as transistors and photodetectors.
    • Low Friction Coefficient: As a solid lubricant, MoS2 provides a low friction coefficient, making it useful in harsh environments where liquid lubricants are impractical.
    • High Thermal and Chemical Stability: MoS2 films exhibit excellent thermal and chemical stability, enabling their use in high-temperature environments and chemically aggressive conditions.
  • MoSe2 Sputtering Targets 3N-6N High Purity Molybdenum Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsMoSe2 Sputtering Targets 3N-6N High Purity Molybdenum Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    MoSe2 (Molybdenum Diselenide) Sputtering Targets

    • High Purity: Ensures superior thin-film quality and device performance.
    • Layered Structure: Facilitates easy exfoliation and 2D material synthesis.
    • Stable Chemical Composition: Provides consistent results across various deposition processes.
    • Excellent Optical and Electrical Properties: Ideal for advanced electronics and optoelectronics.
    • Custom Configurations: Available in tailored sizes, shapes, and thicknesses for specific requirements.
  • MoSi2-Sputtering-Targets-2N5-6N-High-Purity-Molybdenum-Disilicide-Ceramic-Sputtering-Target-High-Pure-99.5-99.9999-Customized-for-Thin-film-Deposition-Tinsan-Materials

    MoSi2 (Molybdenum Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Operates efficiently in high-temperature environments.
    • High Purity Levels: Ensures superior film quality with minimal defects.
    • Oxidation Resistance: Suitable for protective coatings in harsh conditions.
    • Electrical Conductivity: Ideal for use in electronic and semiconductor applications.
    • Customizable Options: Targets tailored to specific industrial or research needs.