Showing 85–96 of 164 results

  • MoTe2 Sputtering Target 3N-6N High Purity Molybdenum Ditelluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoTe2 (Molybdenum Ditelluride) Sputtering Target

    • Phase Tunability: MoTe₂ can transition between semiconducting and metallic phases, offering versatility in different electronic and optoelectronic applications.
    • High Photoresponse: MoTe₂ thin films are highly responsive to light, especially in the infrared spectrum, making them ideal for photodetectors and imaging devices.
    • 2D Material Properties: As a layered material, MoTe₂ offers exceptional flexibility and mechanical properties, enabling its use in cutting-edge flexible electronics.
    • Thermoelectric Efficiency: MoTe₂ is suitable for thermoelectric applications due to its ability to efficiently convert heat into electricity.
  • Nb2O5 Sputtering Targets 3N-6N High Purity Niobium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsNb2O5 Sputtering Targets 3N-6N High Purity Niobium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Nb2O5 (Niobium Pentoxide) Sputtering Targets

    • High Purity: Ensures minimal contamination for precise thin-film deposition.
    • Excellent Stability: Chemically and thermally stable, suitable for demanding applications.
    • High Refractive Index: Ideal for optical coating applications.
    • Customizable: Available in various sizes, shapes, and configurations.
  • NbC (Niobium Carbide) Sputtering Targets

    • High Hardness: Ensures durability and wear resistance in coatings.
    • Thermal Stability: Withstands high-temperature processes without degradation.
    • Corrosion Resistance: Provides protection in harsh environments.
    • Customizable: Available in various sizes, purities, and configurations to meet specific requirements.
  • NbN Sputtering Targets 3N-5N High Purity Niobium Nitride Sputtering Target High Pure 99.9%-99.999% Customized - Tinsan Materials

    NbN Niobium Nitride Sputtering Targets

    • High Purity: NbN sputtering targets are manufactured with purity levels of up to 99.999%, ensuring excellent film consistency and performance in various deposition applications.
    • Electrical Conductivity: Known for its high electrical conductivity, NbN is used in applications requiring efficient electron flow and low resistance.
    • Thermal Stability: Niobium nitride exhibits excellent thermal stability, maintaining performance even at elevated temperatures, making it suitable for high-temperature applications.
    • Corrosion Resistance: NbN films exhibit outstanding resistance to oxidation and chemical wear, making them ideal for applications in harsh environments.
    • Uniformity in Coating: NbN sputtering targets provide excellent film uniformity and density, ensuring reliable coating processes with minimal defects.
    • Hardness: The resulting NbN films are known for their exceptional hardness, making them suitable for tough, abrasive conditions.
  • NbSe2 (Niobium Diselenide) Sputtering Targets

    • High Purity: ≥99.5% purity to ensure high-quality thin-film deposition.
    • Unique Layered Structure: Facilitates superior electronic and optical properties for advanced applications.
    • Superconducting Properties: Ideal for applications in superconducting electronics and quantum computing research.
    • High Stability: Reliable performance under sputtering conditions with excellent chemical stability.
    • Customizable: Tailored sizes and shapes for different deposition setups.
  • NbSi2 Sputtering Targets 2N5-6N High Purity Niobium Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    NbSi2 (Niobium Disilicide) Sputtering Targets

    • High Thermal Stability: Performs reliably in extreme temperatures.
    • Oxidation Resistance: Ideal for protective coatings in harsh environments.
    • Superior Mechanical Strength: Enhances the durability of deposited films.
    • High Purity Standards: Ensures film quality and minimal contamination.
    • Custom Solutions Available: Adaptable to meet specific industrial or research requirements.
  • NbTiO3 Sputtering Target 3N-6N High Purity Niobium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    NbTiO3 (Niobium Titanium Oxide) Sputtering Target

    • High Dielectric Constant: NbTiO₃ has a high dielectric constant, making it ideal for capacitors and other electronic components requiring high energy density.
    • Ferroelectric Properties: The ferroelectric nature of NbTiO₃ enables its use in memory devices and sensors that need stable, reliable performance under varying conditions.
    • Optical Transparency: NbTiO₃ thin films provide excellent optical transparency, ensuring their application in optoelectronic devices and displays.
    • Chemical and Thermal Stability: NbTiO₃ films are highly stable in both chemical and thermal environments, ensuring long-lasting performance in demanding applications.
  • Nd2O3 Sputtering Target 3N-6N High Purity Neodymium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Nd2O3 (Neodymium Oxide) Sputtering Target

    • Magnetic Properties: Neodymium oxide exhibits magnetic behavior, making it valuable in magneto-optic devices and sensors where control of magnetic fields is required.
    • Optical Transparency: Nd₂O₃ thin films offer optical transparency in the infrared range, making them ideal for optical coatings and filters in laser and photonic devices.
    • High Refractive Index: The high refractive index of Nd₂O₃ allows for efficient control of light in optical applications, especially in the IR spectrum.
    • Chemical Stability: Nd₂O₃ is highly stable in various chemical environments, ensuring durability and performance in industrial and research applications.
  • NiO Sputtering Target 3N-6N High Purity Nickel Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsNiO Sputtering Target 3N-6N High Purity Nickel Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    NiO (Nickel Oxide) Sputtering Target

    • Semiconducting Properties: NiO is a p-type semiconductor with excellent electrical characteristics, making it suitable for use in electronic devices and energy storage systems.
    • Optical Transparency: NiO films exhibit optical transparency in the visible range, making them ideal for use in transparent conductive films and display technologies.
    • High Thermal Stability: NiO sputtering targets offer good thermal stability, allowing them to withstand high-temperature processing in various applications.
    • Corrosion Resistance: NiO films provide excellent corrosion resistance, making them useful for protective coatings in chemically aggressive environments.
    • Catalytic Activity: NiO has good catalytic properties, which are utilized in sensors and catalytic applications for gas detection and environmental monitoring.
  • PbTe Sputtering Targets 3N-6N High Purity Lead Telluride Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsPbTe Sputtering Targets 3N-6N High Purity Lead Telluride Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    PbTe Lead Telluride Sputtering Targets

    • High Purity: Up to 99.99% for superior film quality.
    • Customizable Dimensions: Available in various sizes and shapes to fit specific equipment.
    • Excellent Performance: Delivers consistent and uniform thin films.
    • Thermoelectric and IR Applications: Suitable for deposition in advanced electronics and sensor systems.
  • Polytetrafluoroethylene PTFE Sputtering Target 3N-6N High Purity Teflon Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsPolytetrafluoroethylene PTFE Sputtering Target 3N-6N High Purity Teflon Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    PTFE (Polytetrafluoroethylene) Sputtering Targets

    • Chemical Resistance: PTFE is highly resistant to a wide range of chemicals, including acids, bases, and solvents, making it ideal for corrosive applications.
    • Non-Stick Surface: The material’s low surface energy allows for the production of coatings that resist adhesion, which is beneficial in various applications.
    • Electrical Insulation: Excellent dielectric properties make it a great choice for insulating electrical components.
    • High Temperature Resistance: PTFE can withstand a broad temperature range, maintaining its performance even at high temperatures.
    • Durable Coatings: PTFE sputtering targets produce uniform and durable coatings with low friction and high wear resistance.
  • Lead Zirconate Titanate PZT Sputtering Targets 3N-6N High Purity Pb(Zr,Ti)O3 Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLead Zirconate Titanate PZT Sputtering Targets 3N-6N High Purity Pb(Zr,Ti)O3 Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    PZT (Lead Zirconate Titanate or Pb(Zr,Ti)O3) Sputtering Targets

    • High Piezoelectric Coefficient: Enables efficient conversion of mechanical energy to electrical energy and vice versa.
    • Stable Dielectric Properties: Ensures reliable performance in high-frequency applications.
    • Customizable Compositions: Tailored Zr/Ti ratios to meet specific functional requirements.
    • High Purity and Uniformity: Ensures consistent film deposition with minimal defects.
    • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.