Showing 1–12 of 39 results

  • Pure Silver Metal Sputtering Target, 99.99%-99.999% High Purity Ag Sputtering Target CustomizedPure Silver Metal Sputtering Target, 99.99%-99.999% High Purity Ag Sputtering Target Customized

    Ag Silver Sputtering Target

    Silver (Ag) sputtering targets are used in physical vapor deposition (PVD) processes to deposit thin films of silver onto various substrates. Silver is renowned for its outstanding electrical conductivity, reflectivity, and antimicrobial properties, making it a popular choice in a wide range of industries, including electronics, optics, and healthcare.

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  • Aluminium Sputtering Target, 99.9%-99.9999% High Purity Al Metal Sputtering Targets CustomizedAluminium Sputtering Target, 99.9%-99.9999% High Purity Al Metal Sputtering Targets Customized

    Al Aluminium Sputtering Target

    Aluminum (Al) sputtering targets are essential for industries that rely on high conductivity, reflectivity, and corrosion resistance, making them indispensable in electronics, optics, aerospace, and packaging applications.

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  • High Purity Au Gold Sputtering Target 99.99%-99.999% Plate Gold 4N-5N Round Gold for Magnetron CoatingHigh Purity Au Gold Sputtering Target 99.99%-99.999% Plate Gold 4N-5N

    Au Gold Sputtering Target

    Gold (Au) sputtering target is a very important material of semiconductor, it’s used for depositing gold thin film on the surface of semiconductor chips, to form ohmic contact film, electrode or other films, it can form various metallic films system. Most of gold oxide film system can be used for manufacturing LED, microwave communication device, widely applied in spaceflight, aviation, semiconductor chips and Solar Cells.

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  • Boron Sputtering Target, 99.9%-99.99% High Purity B Sputtering Target CustomizedBoron Sputtering Target, 99.9%-99.99% High Purity B Sputtering Target Customized

    B Boron Sputtering Target

    Boron (B) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, particularly sputtering, to deposit thin films of boron onto various substrates. These targets are widely used in industries such as electronics, optics, and materials science due to boron’s unique properties.

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  • Barium Sputtering Target, 99.9% High Purity Ba Sputtering Target Customized

    Ba Barium Sputtering Target

    Barium (Ba) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, particularly sputtering, to create thin films on various substrates. Barium targets are typically used in the production of optical coatings, semiconductor devices, and other advanced materials due to their unique properties.

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  • Bismuth Sputtering Target, 99.99%-99.999% High Purity Bi Metal Sputtering Target CustomizedBismuth Sputtering Target, 99.99%-99.999% High Purity Bi Metal Sputtering Target Customized

    Bi Bismuth Sputtering Target

    Bismuth (Bi) is a unique metal known for its low toxicity, high density, and distinct electronic properties, making it valuable in specific electronic, optical, and magnetic applications. Bismuth (Bi) sputtering targets are essential for industries requiring specialized thin films with unique electronic, optical, and magnetic properties, particularly in advanced electronics, superconductors, and optical devices.

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  • Calcium Sputtering Target, 99.95%-99.999% High Purity Ca Sputtering Target Customized

    Ca Calcium Sputtering Target

    Calcium (Ca) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, specifically sputtering, to create thin films of calcium on various substrates. These targets are essential in various advanced technologies, including electronics, optics, and materials science, due to calcium’s unique properties.

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  • Cerium Magnetron Sputtering Target 99.9%-99.9999% High Purity Ce Metal Sputtering Targets 3N-6N Customized - Tinsan Materials

    Ce Cerium Sputtering Target

    • Purity: Available at 99.9% or higher purity to ensure optimal film quality and performance.
    • Oxidation-Reduction Properties: Cerium’s ability to switch between oxidation states (Ce³⁺ and Ce⁴⁺) makes it ideal for catalytic and energy applications.
    • Customizable Size and Shape: Cerium sputtering targets are available in various forms such as discs, plates, and cylinders to suit different deposition systems.
    • Thermal Stability: Cerium films offer high thermal stability, making them suitable for high-temperature applications like fuel cells and catalytic converters.
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  • Cobalt Sputtering Target 99.9%-99.9999% High Purity Co Metal Sputtering Targets CustomizedCobalt Sputtering Target 99.9%-99.9999% High Purity Co Metal Sputtering Targets Customized

    Co Cobalt Sputtering Target

    • Purity: Cobalt sputtering targets are typically available in high purity levels, such as 99.95% (3N5) or higher, ensuring the deposition of high-quality, consistent films.
    • Shapes and Sizes: These targets are available in various forms, including discs, plates, and custom shapes, to suit different sputtering systems and specific application requirements.
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  • Copper Sputtering Target, 99.9%-99.9999% High Purity Cuprum Cu Metal Sputtering Target CustomizedCopper Sputtering Target, 99.9%-99.9999% High Purity Cuprum Cu Metal Sputtering Target Customized

    Cu Copper Sputtering Target

    Copper (Cu) is highly valued for its excellent electrical conductivity, thermal conductivity, and corrosion resistance, making it a key material in a variety of industries, including electronics, semiconductors, and energy. Copper (Cu) sputtering targets are essential for industries that require highly conductive, thermally efficient, and corrosion-resistant coatings, making them indispensable in electronics, semiconductors, energy, and decorative applications.

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  • Dysprosium Sputtering Target 99.9%-99.9999% High Purity Dy Metal Sputtering Targets 3N-6N Customized - Tinsan MaterialsDysprosium Sputtering Target 99.9%-99.9999% High Purity Dy Metal Sputtering Targets 3N-6N Customized - Tinsan Materials

    Dy Dysprosium Sputtering Target

    • Purity: Typically available in 99.9% or higher purity to ensure excellent thin film quality.
    • Magnetic Properties: Dysprosium enhances the magnetic performance of thin films, making it ideal for applications that require strong and stable magnetic fields.
    • Thermal Stability: Dy thin films maintain stability at high temperatures, making them suitable for use in thermal management applications.
    • Customization: Available in various shapes, such as discs, plates, and cylinders, to meet the needs of different sputtering systems.
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  • Tinsan Materials Erbium Sputtering Target 99.9%-99.999% High Purity Er Sputtering Targets 3N-5N CustomizedTinsan Materials Erbium Sputtering Target 99.9%-99.999% High Purity Er Sputtering Targets 3N-5N Customized

    Er Erbium Sputtering Target

    • Material: High-purity Erbium, typically with a purity level of 99.9% (3N) or higher, ensures minimal impurities during the sputtering process.
    • Form: Erbium sputtering targets are commonly available in the form of discs, rectangular plates, or custom shapes, depending on specific application requirements.
    • Density: The target’s density is critical for achieving consistent deposition rates and high-quality thin films.
    • Applications: These targets are used in applications such as optical amplifiers, lasers, telecommunications, and electronic devices.
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