Showing 109–120 of 244 results

  • LiTaO3 Sputtering Targets 3N-6N High Purity Lithium Tantalate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsLiTaO3 Sputtering Targets 3N-6N High Purity Lithium Tantalate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    LiTaO3 (Lithium Tantalate) Sputtering Targets

    • High Purity: Ensures minimal impurities for superior thin-film quality.
    • Exceptional Piezoelectric Properties: Ideal for high-performance acoustic and vibrational devices.
    • Stable Electro-Optic Behavior: Suitable for high-precision optical applications.
    • Customizable Specifications: Tailored to meet unique system requirements.
    • Durable and Reliable: Manufactured for consistent sputtering performance.
  • LiV3O8 Sputtering Targets 3N-6N High Purity Lithium Vanadium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsLiV3O8 Sputtering Targets 3N-6N High Purity Lithium Vanadium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    LiV3O8 (Lithium Vanadium Oxide) Sputtering Targets

    • High Purity: Ensures consistent and reliable thin-film deposition.
    • Superior Electrochemical Performance: Supports high energy density and stability.
    • Customizable Options: Available in various sizes, shapes, and purity levels.
    • Durable and Stable: Delivers reliable performance in demanding environments.
    • Scalability: Suitable for both research-scale and industrial-scale applications.
  • Mg3Bi2 Sputtering Target 3N-6N High Purity Magnesium Bismuth Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Mg3Bi2 (Magnesium Bismuth) Sputtering Target

    • High Thermoelectric Efficiency: Magnesium Bismuth is recognized for its high Seebeck coefficient and low thermal conductivity, making it an efficient material for thermoelectric applications.
    • Low-Temperature Thermoelectrics: Mg3Bi2 is particularly effective at lower temperatures, which makes it suitable for a wide range of thermoelectric devices that operate in ambient conditions.
    • Customizable Film Properties: The thin films produced using Mg3Bi2 targets can be tailored in terms of thickness and crystallinity, allowing for optimization in various applications.
    • Chemical Stability: Magnesium Bismuth films exhibit good stability, ensuring reliable performance over time in demanding environments.
  • MgF2 Sputtering Target 3N-6N High Purity Magnesium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Vacuum PVD Coating - Tinsan MaterialsMgF2 Sputtering Target 3N-6N High Purity Magnesium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Vacuum PVD Coating - Tinsan Materials

    MgF2 (Magnesium Fluoride) Sputtering Target

    • Broad Transparency Range: MgF₂ has excellent transmission across UV, visible, and IR spectra, making it an ideal material for high-performance optical coatings.
    • Low Refractive Index: The low refractive index of MgF₂ helps reduce light reflection, enabling its use in anti-reflective coatings for various optical applications.
    • High Hardness and Durability: Magnesium Fluoride films are known for their hardness and resistance to scratching, making them suitable for protective coatings in high-durability environments.
    • Chemical and Environmental Stability: MgF₂ coatings are chemically inert and stable under extreme temperature conditions, enhancing their use in both optical and electronic applications.
  • MgO Sputtering Targets 3N-6N High Purity Magnesium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsMgO Sputtering Targets 3N-6N High Purity Magnesium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    MgO (Magnesium Oxide) Sputtering Targets

    • High Purity: Guarantees consistent and reliable thin-film quality.
    • Thermal Stability: Performs exceptionally under high-temperature conditions.
    • Excellent Dielectric Properties: Ideal for insulating layers in electronic devices.
    • Wide Optical Transparency: Operates effectively across UV, visible, and IR spectra.
    • Customizable Options: Available in various shapes, sizes, and specifications.
  • Manganese Sputtering Target, 99.9%-99.999% High Purity Mn Metal Sputtering Targets CustomizedManganese Sputtering Target, 99.9%-99.999% High Purity Mn Metal Sputtering Targets Customized

    Mn Manganese Sputtering Target

    Manganese (Mn) sputtering targets are essential for industries that rely on magnetic properties, wear resistance, and corrosion resistance, making them indispensable in electronics, magnetic storage, metallurgy, and catalytic applications.

  • MnO2 Sputtering Target 3N-6N High Purity Manganese Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom - Tinsan MaterialsMnO2 Sputtering Target 3N-6N High Purity Manganese Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom - Tinsan Materials

    MnO2 (Manganese Dioxide) Sputtering Target

    • High Purity: Available in high-purity grades, ensuring clean and efficient thin-film deposition with minimal contamination.
    • Good Electrochemical Properties: MnO₂ thin films are known for their excellent electrochemical behavior, making them ideal for energy storage applications.
    • Thermal Stability: MnO₂ exhibits stability at high temperatures, making it suitable for thin-film processes that require heat resistance.
    • Wide Range of Applications: The material is versatile, with applications ranging from energy storage and catalysis to optical coatings and sensors.
  • MnTe Sputtering Targets 99.9%-99.9999% High Purity Manganese Telluride Sputtering Target 3N-6N Customized - Tinsan Materials

    MnTe (Manganese Telluride) Sputtering Targets

    • Semiconducting Properties: MnTe exhibits semiconductor behavior, making it suitable for a variety of electronic and optoelectronic applications.
    • Magnetic Properties: With ferromagnetic behavior, MnTe is essential for applications in spintronics and magnetic sensors.
    • Thermoelectric Efficiency: The material has promising thermoelectric properties, offering potential in energy harvesting and cooling applications.
    • High Purity: MnTe sputtering targets are available in high-purity grades, ensuring the production of clean, high-performance thin films.
    • Chemical Stability: MnTe thin films offer chemical stability in various environments, which is critical for long-lasting and reliable device performance.
  • Molybdenum Sputtering Target 99.9%-99.9999% High Purity Mo Metal Sputtering Targets CustomizedMolybdenum Sputtering Target 99.9%-99.9999% High Purity Mo Metal Sputtering Targets Customized

    Mo Molybdenum Sputtering Target

    Molybdenum sputtering targets play a crucial role in industries that require high-performance, heat-resistant, and conductive coatings. Their application in semiconductors, solar cells, flat panel displays, and aerospace components highlights the versatility and importance of molybdenum in modern technology.

  • Mo2C Sputtering Targets 2N5-5N High Purity Molybdenum Carbide Ceramic Sputtering Target High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan MaterialsMo2C Sputtering Targets 2N5-5N High Purity Molybdenum Carbide Ceramic Sputtering Target High Pure 99.5%-99.999% Customize for Thin Film Deposition - Tinsan Materials

    Mo2C (Molybdenum Carbide) Sputtering Targets

    • High purity: Ensures superior film quality with minimal contamination.
    • Outstanding hardness: Provides durability for mechanical applications.
    • Thermal stability: Ideal for high-temperature environments.
    • Customizable dimensions: Available in a variety of sizes, shapes, and thicknesses to meet specific project requirements.
    • High deposition efficiency: Optimized for uniform thin-film production.
  • MoB2 Sputtering Targets 2N5-5N High Purity Molybdenum Diboride Ceramic Sputtering Target High Pure 99.5%-99.999% Customized - Tinsan Materials

    MoB2 (Molybdenum Diboride) Sputtering Targets

    • High Hardness: Provides robust protective coatings for enhanced durability.
    • Thermal and Chemical Stability: Ensures excellent performance in harsh environments.
    • Electrical Conductivity: Suitable for electronic applications requiring conductive thin films.
    • Customizable Options: Available in various dimensions and configurations for specific needs.
    • Consistent Quality: Manufactured to deliver uniform deposition rates and film properties.
  • MoCu Alloy Target 99.9%-99.9999% High Purity Molybdenum Cuprum Copper Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsMoCu Alloy Target 99.9%-99.9999% High Purity Molybdenum Cuprum Copper Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    MoCu (Molybdenum Copper) Alloy Target

    • High Thermal Conductivity: Copper’s excellent thermal conductivity ensures effective heat dissipation in thin-film coatings, crucial for applications in electronics and thermal management systems.
    • Mechanical Strength: Molybdenum contributes strength and rigidity to the MoCu alloy, ensuring mechanical stability in high-temperature and high-stress applications.
    • Corrosion Resistance: The MoCu alloy provides good resistance to corrosion, making it suitable for use in environments where materials are exposed to moisture, chemicals, or harsh conditions.
    • Low Thermal Expansion: The alloy’s combination of molybdenum and copper results in low thermal expansion, reducing the risk of film cracking or damage under thermal stress.
    • Customizable Composition: The ratio of molybdenum to copper can be tailored to optimize the thermal, electrical, and mechanical properties to meet specific application requirements.