Showing 121–132 of 244 results

  • MoLa Alloy Target 99.9%-99.9999% High Purity Molybdenum Lanthanum Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsMoLa Alloy Target 99.9%-99.9999% High Purity Molybdenum Lanthanum Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    MoLa (Molybdenum Lanthanum) Alloy Target

    • High Thermal Stability: The MoLa alloy has excellent resistance to deformation and oxidation at high temperatures, ensuring reliability in demanding thermal environments.
    • Enhanced Ductility: The addition of lanthanum oxide improves the ductility of molybdenum, making the alloy easier to process and form into thin films without compromising its strength.
    • Oxidation Resistance: MoLa exhibits outstanding resistance to oxidation, especially at elevated temperatures, providing long-term stability and durability.
    • Improved Machinability: The lanthanum content enhances the machinability of molybdenum, allowing for more precise fabrication of sputtering targets and thin-film coatings.
  • MoNb Alloy Target 99.9%-99.9999% High Purity Molybdenum Niobium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsMoNb Alloy Target 99.9%-99.9999% High Purity Molybdenum Niobium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    MoNb (Molybdenum Niobium) Alloy Target

    • High Mechanical Strength: The combination of molybdenum and niobium results in an alloy with high tensile strength, making it suitable for demanding structural applications.
    • Thermal Stability: MoNb alloys maintain their mechanical properties at elevated temperatures, making them ideal for high-temperature applications, such as coatings for turbine components.
    • Corrosion Resistance: The alloy exhibits excellent resistance to oxidation and corrosion, ensuring long-term performance in harsh environments.
    • Low Density: Compared to pure molybdenum, the addition of niobium reduces the density of the alloy, enhancing its performance in weight-sensitive applications.
    • Customizable Composition: The molybdenum-to-niobium ratio can be tailored to optimize the properties of the alloy for specific applications, whether enhancing strength, thermal stability, or corrosion resistance.
  • MoO2 Sputtering Targets 3N-6N High Purity Molybdenum Dioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    MoO2 (Molybdenum Dioxide) Sputtering Targets

    • High Purity: Guarantees superior film quality and reduces impurities.
    • Excellent Conductivity: Suitable for applications requiring conductive thin films.
    • Thermal Stability: Performs reliably in high-temperature environments.
    • Customizable Specifications: Tailored to specific sputtering system requirements.
    • Versatility: Compatible with various sputtering techniques, including RF and DC.
  • MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsMoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoO3 (Molybdenum Trioxide) Sputtering Target

    • High Work Function: MoO₃ is known for its high work function, which makes it ideal for applications requiring efficient charge injection or extraction, such as OLEDs and OPVs.
    • Excellent Catalytic Properties: MoO₃ is a robust catalyst, especially in oxidation reactions, making it suitable for industrial chemical processes and catalytic thin films.
    • Electrochromic Behavior: MoO₃’s ability to undergo reversible oxidation-reduction reactions makes it ideal for use in electrochromic devices.
    • Optical Transparency: MoO₃ thin films can be transparent in the visible and near-infrared regions, which is beneficial for optoelectronic devices requiring transparent electrodes or coatings.
  • MoRe Sputtering Targets 99.9%-99.9999% High Purity Molybdenum Rhenium Alloy Sputtering Target 3N-6N Customized - Tinsan Materials

    MoRe (Molybdenum Rhenium) Sputtering Targets

    • High Thermal Stability: Performs exceptionally well in extreme temperature environments.
    • Enhanced Ductility: Improved mechanical performance over pure molybdenum.
    • Excellent Conductivity: Ensures reliable electrical and thermal performance.
    • Customizable Options: Tailored to meet the specific requirements of various deposition systems.
    • Corrosion Resistance: Long-lasting performance in aggressive environments.
  • MoS2 Sputtering Target 3N-6N High Purity Molybdenum Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsMoS2 Sputtering Target 3N-6N High Purity Molybdenum Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoS2 (Molybdenum Disulfide) Sputtering Target

    • Layered Structure: MoS2 has a unique layered structure that contributes to its mechanical, electrical, and tribological properties, making it an excellent candidate for advanced coatings and devices.
    • Semiconducting Properties: MoS2 is a semiconductor with a direct bandgap in its monolayer form, offering high performance in electronic devices such as transistors and photodetectors.
    • Low Friction Coefficient: As a solid lubricant, MoS2 provides a low friction coefficient, making it useful in harsh environments where liquid lubricants are impractical.
    • High Thermal and Chemical Stability: MoS2 films exhibit excellent thermal and chemical stability, enabling their use in high-temperature environments and chemically aggressive conditions.
  • MoSe2 Sputtering Targets 3N-6N High Purity Molybdenum Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsMoSe2 Sputtering Targets 3N-6N High Purity Molybdenum Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    MoSe2 (Molybdenum Diselenide) Sputtering Targets

    • High Purity: Ensures superior thin-film quality and device performance.
    • Layered Structure: Facilitates easy exfoliation and 2D material synthesis.
    • Stable Chemical Composition: Provides consistent results across various deposition processes.
    • Excellent Optical and Electrical Properties: Ideal for advanced electronics and optoelectronics.
    • Custom Configurations: Available in tailored sizes, shapes, and thicknesses for specific requirements.
  • MoSi2-Sputtering-Targets-2N5-6N-High-Purity-Molybdenum-Disilicide-Ceramic-Sputtering-Target-High-Pure-99.5-99.9999-Customized-for-Thin-film-Deposition-Tinsan-Materials

    MoSi2 (Molybdenum Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Operates efficiently in high-temperature environments.
    • High Purity Levels: Ensures superior film quality with minimal defects.
    • Oxidation Resistance: Suitable for protective coatings in harsh conditions.
    • Electrical Conductivity: Ideal for use in electronic and semiconductor applications.
    • Customizable Options: Targets tailored to specific industrial or research needs.
  • MoTa Alloy Target 99.9%-99.9999% High Purity Molybdenum Tantalum Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsMoTa Alloy Target 99.9%-99.9999% High Purity Molybdenum Tantalum Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    MoTa (Molybdenum Tantalum) Alloy Target

    • High Mechanical Strength: The combination of molybdenum and tantalum results in an alloy with excellent tensile strength, making it ideal for demanding structural applications.
    • Thermal Stability: MoTa alloys maintain their mechanical properties at elevated temperatures, making them suitable for high-temperature applications, such as coatings for turbine components.
    • Oxidation and Corrosion Resistance: The alloy exhibits outstanding resistance to oxidation and corrosion, ensuring long-term performance in harsh environments.
    • Customizable Composition: The molybdenum-to-tantalum ratio can be tailored to optimize the properties of the alloy for specific applications, enhancing strength, thermal stability, or corrosion resistance.
  • MoTe2 Sputtering Target 3N-6N High Purity Molybdenum Ditelluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoTe2 (Molybdenum Ditelluride) Sputtering Target

    • Phase Tunability: MoTe₂ can transition between semiconducting and metallic phases, offering versatility in different electronic and optoelectronic applications.
    • High Photoresponse: MoTe₂ thin films are highly responsive to light, especially in the infrared spectrum, making them ideal for photodetectors and imaging devices.
    • 2D Material Properties: As a layered material, MoTe₂ offers exceptional flexibility and mechanical properties, enabling its use in cutting-edge flexible electronics.
    • Thermoelectric Efficiency: MoTe₂ is suitable for thermoelectric applications due to its ability to efficiently convert heat into electricity.
  • MoZrTi Alloy Target 99.95%-99.9999% High Purity Molybdenum Zirconium Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    MoZrTi (Molybdenum Zirconium Titanium) Alloy Target

    • High Corrosion Resistance: The addition of zirconium and titanium enhances the alloy’s resistance to corrosion, making it suitable for harsh environments, including semiconductor processing and aerospace applications.
    • Thermal Stability: Molybdenum’s high melting point, combined with the stability of zirconium and titanium, allows MoZrTi thin films to maintain performance at elevated temperatures.
    • Electrical Conductivity: MoZrTi alloy thin films provide good electrical conductivity, ideal for applications in electronic devices such as transistors and semiconductors.
    • Mechanical Strength: The alloy offers a combination of strength and toughness, ensuring durability in wear-resistant coatings and industrial components.
    • Oxidation Resistance: MoZrTi thin films resist oxidation, which is critical for maintaining performance over long periods, particularly in high-temperature and oxidative environments.
  • Niobium Sputtering Targets 99.9%-99.9999% High Purity Nb Metal Sputtering Target 3N-6N Customized for Thin Film Deposition - Tinsan MaterialsNiobium Sputtering Targets 99.9%-99.999% High Purity Nb Metal Sputtering Target 3N-6N Customized for Thin Film Deposition - Tinsan Materials

    Nb Niobium Sputtering Targets

    • High Purity: Available in purities up to 99.95% to ensure superior film quality.
    • Excellent Durability: Resistant to thermal and mechanical stress during deposition processes.
    • Custom Shapes and Sizes: Adaptable to meet diverse equipment requirements.
    • Consistent Performance: Ensures uniform sputtering rates and film deposition.
    • Corrosion Resistance: Ideal for harsh environmental conditions.