Showing 133–144 of 244 results

  • Nb2O5 Sputtering Targets 3N-6N High Purity Niobium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsNb2O5 Sputtering Targets 3N-6N High Purity Niobium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Nb2O5 (Niobium Pentoxide) Sputtering Targets

    • High Purity: Ensures minimal contamination for precise thin-film deposition.
    • Excellent Stability: Chemically and thermally stable, suitable for demanding applications.
    • High Refractive Index: Ideal for optical coating applications.
    • Customizable: Available in various sizes, shapes, and configurations.
  • NbC (Niobium Carbide) Sputtering Targets

    • High Hardness: Ensures durability and wear resistance in coatings.
    • Thermal Stability: Withstands high-temperature processes without degradation.
    • Corrosion Resistance: Provides protection in harsh environments.
    • Customizable: Available in various sizes, purities, and configurations to meet specific requirements.
  • NbN Sputtering Targets 3N-5N High Purity Niobium Nitride Sputtering Target High Pure 99.9%-99.999% Customized - Tinsan Materials

    NbN Niobium Nitride Sputtering Targets

    • High Purity: NbN sputtering targets are manufactured with purity levels of up to 99.999%, ensuring excellent film consistency and performance in various deposition applications.
    • Electrical Conductivity: Known for its high electrical conductivity, NbN is used in applications requiring efficient electron flow and low resistance.
    • Thermal Stability: Niobium nitride exhibits excellent thermal stability, maintaining performance even at elevated temperatures, making it suitable for high-temperature applications.
    • Corrosion Resistance: NbN films exhibit outstanding resistance to oxidation and chemical wear, making them ideal for applications in harsh environments.
    • Uniformity in Coating: NbN sputtering targets provide excellent film uniformity and density, ensuring reliable coating processes with minimal defects.
    • Hardness: The resulting NbN films are known for their exceptional hardness, making them suitable for tough, abrasive conditions.
  • NbSe2 (Niobium Diselenide) Sputtering Targets

    • High Purity: ≥99.5% purity to ensure high-quality thin-film deposition.
    • Unique Layered Structure: Facilitates superior electronic and optical properties for advanced applications.
    • Superconducting Properties: Ideal for applications in superconducting electronics and quantum computing research.
    • High Stability: Reliable performance under sputtering conditions with excellent chemical stability.
    • Customizable: Tailored sizes and shapes for different deposition setups.
  • NbSi2 Sputtering Targets 2N5-6N High Purity Niobium Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    NbSi2 (Niobium Disilicide) Sputtering Targets

    • High Thermal Stability: Performs reliably in extreme temperatures.
    • Oxidation Resistance: Ideal for protective coatings in harsh environments.
    • Superior Mechanical Strength: Enhances the durability of deposited films.
    • High Purity Standards: Ensures film quality and minimal contamination.
    • Custom Solutions Available: Adaptable to meet specific industrial or research requirements.
  • NbTiO3 Sputtering Target 3N-6N High Purity Niobium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    NbTiO3 (Niobium Titanium Oxide) Sputtering Target

    • High Dielectric Constant: NbTiO₃ has a high dielectric constant, making it ideal for capacitors and other electronic components requiring high energy density.
    • Ferroelectric Properties: The ferroelectric nature of NbTiO₃ enables its use in memory devices and sensors that need stable, reliable performance under varying conditions.
    • Optical Transparency: NbTiO₃ thin films provide excellent optical transparency, ensuring their application in optoelectronic devices and displays.
    • Chemical and Thermal Stability: NbTiO₃ films are highly stable in both chemical and thermal environments, ensuring long-lasting performance in demanding applications.
  • Tinsan Materials Neodymium Sputtering Target 99.9%-99.999% High Purity Nd Metal Sputtering Targets 3N-5N CustomizedTinsan Materials Neodymium Sputtering Target 99.9%-99.999% High Purity Nd Metal Sputtering Targets 3N-5N Customized

    Nd Neodymium Sputtering Target

    • Purity: High purity (99.9% or higher) is critical to ensure the quality and performance of the deposited film.
    • Shape and Size: These targets are available in different shapes, such as discs, plates, and cylinders, with customizable dimensions to fit specific sputtering systems.
    • Density and Grain Size: Neodymium targets are manufactured with high density and controlled grain size to improve sputtering efficiency and consistency.
    • Magnetic Properties: Neodymium is ferromagnetic, making it ideal for applications requiring magnetic properties.
  • Nd2O3 Sputtering Target 3N-6N High Purity Neodymium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Nd2O3 (Neodymium Oxide) Sputtering Target

    • Magnetic Properties: Neodymium oxide exhibits magnetic behavior, making it valuable in magneto-optic devices and sensors where control of magnetic fields is required.
    • Optical Transparency: Nd₂O₃ thin films offer optical transparency in the infrared range, making them ideal for optical coatings and filters in laser and photonic devices.
    • High Refractive Index: The high refractive index of Nd₂O₃ allows for efficient control of light in optical applications, especially in the IR spectrum.
    • Chemical Stability: Nd₂O₃ is highly stable in various chemical environments, ensuring durability and performance in industrial and research applications.
  • Nickel Sputtering Target 99.9%-99.9999% High Purity Ni Metal Sputtering Targets CustomizedNickel Sputtering Target 99.9%-99.9999% High Purity Ni Metal Sputtering Targets Customized

    Ni Nickel Sputtering Target

    • Thickness: The thickness of the nickel coating can be precisely controlled during the sputtering process, allowing for customized solutions to meet specific application needs.
    • Alloys: Nickel sputtering targets can be produced as pure nickel or in alloyed forms, such as nickel-cobalt (Ni-Co) or nickel-chromium (Ni-Cr), depending on the desired properties of the thin film.
    • Backing Plates: Nickel targets can be bonded to backing plates made from materials like copper or molybdenum to improve thermal conductivity and mechanical stability during the sputtering process.
  • NiCr Alloy Target 99.9%-99.9999% High Purity Nickel Chromium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiCr Alloy Target 99.9%-99.9999% High Purity Nickel Chromium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiCr (Nickel Chromium) Alloy Target

    • High Electrical Resistivity: NiCr alloy is valued for its stable and reliable electrical resistivity, making it ideal for resistive coatings in electronic devices.
    • Oxidation and Corrosion Resistance: Chromium in the alloy provides excellent resistance to oxidation and corrosion, especially at elevated temperatures, ensuring longevity in harsh conditions.
    • Thermal Stability: NiCr retains its mechanical and electrical properties under extreme heat, making it suitable for applications involving high temperatures, such as heating elements.
    • Customizable Composition: The ratio of nickel and chromium can be adjusted to optimize properties like electrical conductivity or resistance to oxidation, depending on the specific application.
  • NiCrSi Alloy Target 99.9%-99.9999% High Purity Nickel Chromium Silicon Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiCrSi Alloy Target 99.9%-99.9999% High Purity Nickel Chromium Silicon Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiCrSi (Nickel Chromium Silicon) Alloy Target

    • High Electrical Resistivity: The NiCrSi alloy has a stable electrical resistivity, making it ideal for thin-film resistor applications and other electronics requiring consistent electrical performance.
    • Corrosion and Oxidation Resistance: The combination of nickel and chromium provides excellent resistance to corrosion and oxidation, even at elevated temperatures.
    • Thermal Stability: The NiCrSi alloy retains its mechanical and electrical properties at high temperatures, ensuring reliable performance in thermal management systems and high-temperature applications.
    • Customizable Composition: The nickel, chromium, and silicon content can be adjusted to fine-tune the properties of the alloy for specific applications, including optimizing resistivity or corrosion resistance.
  • NiCu Alloy Target 99.9%-99.9999% High Purity Nickel Cuprum Copper Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiCu Alloy Target 99.9%-99.9999% High Purity Nickel Cuprum Copper Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiCu (Nickel Copper) Alloy Target

    • High Electrical Conductivity: NiCu alloy sputtering targets offer excellent electrical conductivity, making them ideal for thin films in electronic devices where efficient current flow is essential.
    • Corrosion Resistance: The combination of nickel and copper provides strong corrosion resistance, allowing the thin films to withstand exposure to chemicals and harsh environments, such as marine and industrial settings.
    • Magnetic Properties: NiCu alloys exhibit useful magnetic properties, which can be tailored for specific applications such as sensors, transformers, and other magnetic devices.
    • Thermal Stability: NiCu alloy thin films maintain their structural integrity at elevated temperatures, making them suitable for high-temperature applications in aerospace and industrial settings.
    • Customizable Composition: The ratio of nickel to copper can be adjusted to optimize the properties of the thin film for specific applications, such as enhancing conductivity or corrosion resistance.