Showing 145–156 of 244 results

  • NiCuTi Alloy Target 99.9%-99.9999% High Purity Nickel Cuprum Copper Titanium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiCuTi Alloy Target 99.9%-99.9999% High Purity Nickel Cuprum Copper Titanium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiCuTi (Nickel Copper Titanium) Alloy Target

    • High Electrical Conductivity: NiCuTi alloy sputtering targets deliver excellent electrical conductivity, making them ideal for use in electronic devices requiring efficient current flow and minimal energy loss.
    • Corrosion Resistance: The addition of copper and titanium enhances the alloy’s ability to resist corrosion, particularly in environments exposed to chemicals, moisture, and salts.
    • Enhanced Mechanical Strength: Titanium in the alloy improves the mechanical strength and wear resistance of NiCuTi thin films, making them suitable for applications requiring durability and high-stress tolerance.
    • Thermal Stability: NiCuTi alloy thin films maintain their properties at high temperatures, making them suitable for aerospace and industrial applications involving elevated temperatures.
    • Customizable Composition: The ratio of nickel, copper, and titanium in the alloy can be tailored to meet specific requirements, such as improving wear resistance or optimizing corrosion protection.
  • NiFe Alloy Target 99.9%-99.9999% High Purity Nickel Ferrum Iron Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiFe Alloy Target 99.9%-99.9999% High Purity Nickel Ferrum Iron Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiFe (Nickel Iron) Alloy Target

    • Soft Magnetic Properties: NiFe alloys are known for their high magnetic permeability, low coercivity, and low core loss, making them ideal for use in magnetic applications such as sensors, inductors, and transformers.
    • Corrosion Resistance: The alloy’s composition provides excellent resistance to corrosion and oxidation, ensuring long-term stability and durability in harsh environments.
    • High Electrical Conductivity: NiFe alloy sputtering targets offer good electrical conductivity, which is critical in electronic applications requiring efficient current flow and minimal energy loss.
    • Low Magnetic Coercivity: NiFe alloys exhibit low coercivity, meaning that they require minimal energy to magnetize and demagnetize, making them efficient in switching applications and data storage devices.
    • Customizable Magnetic Properties: The ratio of nickel to iron can be adjusted to optimize the magnetic properties of the thin film for specific applications, such as enhancing permeability or reducing magnetic hysteresis.
  • NiFeCo Sputtering Targets 99.9%-99.9999% High Purity Nickel Iron Cobalt Alloy Sputtering Target 3N-6N Customized - Tinsan Materials

    NiFeCo (Nickel Iron Cobalt) Sputtering Targets

    • Magnetic Properties: Excellent for creating films with high permeability and magnetization.
    • High Purity: Ensures minimal contamination and precise film deposition.
    • Durability: Resistant to corrosion and wear, enhancing the lifespan of the coated components.
    • Versatility in Applications: Suitable for a wide range of industrial applications in electronics and sensors.
    • Customization: Custom compositions and sizes available to meet specific requirements.
  • NiO Sputtering Target 3N-6N High Purity Nickel Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsNiO Sputtering Target 3N-6N High Purity Nickel Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    NiO (Nickel Oxide) Sputtering Target

    • Semiconducting Properties: NiO is a p-type semiconductor with excellent electrical characteristics, making it suitable for use in electronic devices and energy storage systems.
    • Optical Transparency: NiO films exhibit optical transparency in the visible range, making them ideal for use in transparent conductive films and display technologies.
    • High Thermal Stability: NiO sputtering targets offer good thermal stability, allowing them to withstand high-temperature processing in various applications.
    • Corrosion Resistance: NiO films provide excellent corrosion resistance, making them useful for protective coatings in chemically aggressive environments.
    • Catalytic Activity: NiO has good catalytic properties, which are utilized in sensors and catalytic applications for gas detection and environmental monitoring.
  • NiPt Alloy Target 99.9%-99.9999% High Purity Nickel Platinum Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiPt Alloy Target 99.9%-99.9999% High Purity Nickel Platinum Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiPt (Nickel Platinum) Alloy Target

    • Corrosion Resistance: Platinum significantly enhances the alloy’s resistance to oxidation and corrosion, making NiPt thin films ideal for use in harsh environments, including chemical processing and marine applications.
    • Electrical Conductivity: NiPt alloys have excellent electrical conductivity, ensuring reliable performance in electronic devices, particularly in semiconductors and ICs.
    • Thermal Stability: NiPt alloy sputtering targets provide coatings that can withstand high temperatures, making them suitable for applications in energy, aerospace, and industrial machinery.
    • Catalytic Activity: The addition of platinum provides superior catalytic activity, making NiPt alloys useful in fuel cells, chemical reactions, and exhaust gas treatments.
    • Magnetic Properties: Nickel contributes to the alloy’s magnetic characteristics, which are valuable in electronic and magnetic storage applications.
    • Customizable Composition: The ratio of nickel to platinum can be adjusted to fine-tune the properties of the alloy to suit specific needs, whether for enhanced corrosion resistance, conductivity, or magnetic performance.
  • NiTi Alloy Target 99.9%-99.9999% High Purity Nickel Titanium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiTi Alloy Target 99.9%-99.9999% High Purity Nickel Titanium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiTi (Nickel Titanium) Alloy Target

    • Shape Memory Effect: NiTi alloys can return to their original shape after deformation when exposed to a certain temperature, making them highly valuable in applications requiring memory or actuation.
    • Superelasticity: NiTi alloys exhibit significant elastic deformation, which allows them to absorb and release mechanical stress, ideal for flexible and resilient components.
    • Corrosion Resistance: NiTi has excellent resistance to corrosion, making it suitable for biomedical devices and components exposed to harsh environments.
    • Biocompatibility: NiTi alloys are biocompatible, making them safe for use in medical applications, particularly in implantable devices.
    • Wear Resistance: The hardness and durability of NiTi alloys provide long-lasting wear resistance in protective thin films.
    • Thermal Stability: NiTi films maintain their unique mechanical properties even at varying temperatures, ensuring consistent performance in diverse conditions.
  • NiV Alloy Target 99.9%-99.9999% High Purity Nickel Vanadium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiV Alloy Target 99.9%-99.9999% High Purity Nickel Vanadium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiV (Nickel Vanadium) Alloy Target

    • High Strength: NiV alloys exhibit exceptional mechanical strength, making them suitable for applications requiring durability and performance under stress.
    • Corrosion Resistance: The addition of vanadium enhances the corrosion resistance of nickel, making NiV targets suitable for use in harsh environments and extending the life of thin films.
    • Good Electrical Conductivity: NiV alloys maintain good electrical conductivity, which is essential for electronic and electrical applications.
    • Versatility: The properties of NiV alloys can be tailored by adjusting the composition, allowing for customization to meet specific application requirements.
  • NiW Alloy Target 99.9%-99.9999% High Purity Nickel Tungsten Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiW Alloy Target 99.9%-99.9999% High Purity Nickel Tungsten Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiW (Nickel Tungsten) Alloy Target

    • Hardness and Durability: NiW alloys offer exceptional hardness and durability, making them ideal for wear-resistant coatings that protect mechanical parts and tools from wear and abrasion.
    • Corrosion Resistance: NiW thin films provide strong resistance to corrosion, particularly in harsh environments exposed to moisture, chemicals, or high salinity, extending the service life of components.
    • Thermal Stability: The alloy maintains its mechanical and chemical properties at elevated temperatures, making NiW thin films suitable for high-temperature applications in various industries.
    • Magnetic Properties: The nickel content in NiW alloys provides magnetic characteristics that are useful in certain electronic and magnetic storage applications.
    • Customizable Composition: The ratio of nickel to tungsten can be customized to fine-tune the properties of the thin film for specific applications, such as increasing hardness, wear resistance, or corrosion protection.
  • Lead Pb Sputtering Target 99.9%-99.9999% High Purity Pb Metal Sputtering Targets CustomizedLead Pb Sputtering Target 99.9%-99.9999% High Purity Pb Metal Sputtering Targets Customized

    Pb Lead Sputtering Target

    • Thickness: The thickness of the lead coating can be precisely controlled during the sputtering process, allowing for tailored solutions to meet specific application needs.
    • Alloys: Lead sputtering targets can be produced as pure lead or in alloyed forms, such as lead-tin (Pb-Sn) or lead-silver (Pb-Ag), depending on the desired properties of the thin film.
    • Backing Plates: Lead targets can be bonded to backing plates made from materials like copper or aluminum to improve thermal conductivity and mechanical stability during the sputtering process.
  • PbTe Sputtering Targets 3N-6N High Purity Lead Telluride Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsPbTe Sputtering Targets 3N-6N High Purity Lead Telluride Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    PbTe Lead Telluride Sputtering Targets

    • High Purity: Up to 99.99% for superior film quality.
    • Customizable Dimensions: Available in various sizes and shapes to fit specific equipment.
    • Excellent Performance: Delivers consistent and uniform thin films.
    • Thermoelectric and IR Applications: Suitable for deposition in advanced electronics and sensor systems.
  • Palladium Sputtering Target, 99.95%-99.99% High Purity Pd Sputtering Target CustomizedPalladium Sputtering Target, 99.95%-99.99% High Purity Pd Sputtering Target Customized

    Pd Palladium Sputtering Target

    Palladium (Pd) sputtering targets are widely used in physical vapor deposition (PVD) processes to create thin films and coatings for various high-tech applications. Palladium, a precious metal in the platinum group, is known for its excellent catalytic properties, high conductivity, and strong resistance to corrosion and oxidation.

  • Praseodymium Sputtering Target 99.9%-99.9999% High Purity Pr Metal Sputtering Targets 3N-6N Customized

    Pr Praseodymium Sputtering Target

    Praseodymium sputtering targets are essential for creating thin films with specialized magnetic, optical, and electrical properties, making them valuable in advanced technological applications such as permanent magnets, lasers, display technologies, and specialized alloys. Despite its rarity, praseodymium’s unique characteristics offer significant benefits in cutting-edge industrial and scientific applications.