Showing 157–168 of 244 results

  • Polytetrafluoroethylene PTFE Sputtering Target 3N-6N High Purity Teflon Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsPolytetrafluoroethylene PTFE Sputtering Target 3N-6N High Purity Teflon Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    PTFE (Polytetrafluoroethylene) Sputtering Targets

    • Chemical Resistance: PTFE is highly resistant to a wide range of chemicals, including acids, bases, and solvents, making it ideal for corrosive applications.
    • Non-Stick Surface: The material’s low surface energy allows for the production of coatings that resist adhesion, which is beneficial in various applications.
    • Electrical Insulation: Excellent dielectric properties make it a great choice for insulating electrical components.
    • High Temperature Resistance: PTFE can withstand a broad temperature range, maintaining its performance even at high temperatures.
    • Durable Coatings: PTFE sputtering targets produce uniform and durable coatings with low friction and high wear resistance.
  • Lead Zirconate Titanate PZT Sputtering Targets 3N-6N High Purity Pb(Zr,Ti)O3 Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLead Zirconate Titanate PZT Sputtering Targets 3N-6N High Purity Pb(Zr,Ti)O3 Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    PZT (Lead Zirconate Titanate or Pb(Zr,Ti)O3) Sputtering Targets

    • High Piezoelectric Coefficient: Enables efficient conversion of mechanical energy to electrical energy and vice versa.
    • Stable Dielectric Properties: Ensures reliable performance in high-frequency applications.
    • Customizable Compositions: Tailored Zr/Ti ratios to meet specific functional requirements.
    • High Purity and Uniformity: Ensures consistent film deposition with minimal defects.
    • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.
  • Rhodium Rh Sputtering Targets 99.9%-99.9999% High Purity Rh Metal Sputtering Target 3N-6N Customized - Tinsan MaterialsRhodium Rh Sputtering Targets 99.9%-99.9999% High Purity Rh Metal Sputtering Target 3N-6N Customize - Tinsan Materials

    Rhodium (Rh) Sputtering Targets

    • Excellent Reflectivity: Ideal for optical and decorative applications.
    • High Corrosion Resistance: Suitable for harsh environments and chemical exposure.
    • Superior Thermal Stability: Ensures performance under high temperatures.
    • High Conductivity: Reliable for electronic applications.
    • Customizable Configurations: Available in various sizes, purities, and bonding options.
  • Ruthenium Sputtering Target, 3N5-4N High Purity Ru Sputtering Target CustomizedRuthenium Sputtering Target, 3N5-4N High Purity Ru Sputtering Target Customized

    Ru Ruthenium Sputtering Target

    Ruthenium (Ru) sputtering targets are used in physical vapor deposition (PVD) processes to create thin films and coatings on various substrates. Ruthenium, a platinum group metal, is valued for its excellent hardness, corrosion resistance, and high melting point, making it ideal for applications in electronics, data storage, and catalysis.

  • Antimony Stibium Sputtering Target, 99.99%-99.999% High Purity Sb Metal Sputtering Targets CustomizedAntimony Stibium Sputtering Target, 99.99%-99.999% High Purity Sb Metal Sputtering Targets Customized

    Sb Antimony Sputtering Target

    • Thickness: The thickness of the stibium coating can be precisely controlled during the sputtering process, allowing for tailored solutions to meet specific application needs.
    • Alloys: Stibium sputtering targets can be produced as pure antimony or in alloyed forms, such as antimony-tin (Sb-Sn) or antimony-lead (Sb-Pb), depending on the desired properties of the thin film.
    • Backing Plates: Stibium targets can be bonded to backing plates made from materials like copper or molybdenum to improve thermal conductivity and mechanical stability during the sputtering process.
  • Sb2O3 Sputtering Target 3N-6N High Purity Antimony Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sb2O3 (Antimony Trioxide) Sputtering Target

    • High Purity: Available in high-purity grades to ensure the production of defect-free thin films, which are essential for optical and electronic applications.
    • Flame Retardant Properties: When deposited as a thin film, Sb₂O₃ enhances the flame retardant capabilities of various materials, particularly polymers and textiles.
    • Optical Transparency: Sb₂O₃ has excellent transparency in the UV and visible light spectrum, making it a suitable material for optical applications.
    • Thermal Stability: Its stability at high temperatures makes it useful in processes where thermal resistance is necessary.
  • Sb2S3 Sputtering Target 3N-6N High Purity Antimony Trisulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sb2S3 (Antimony Trisulfide) Sputtering Target

    • High Optical Absorption: Sb₂S₃ is known for its strong absorption in the visible and near-infrared regions, making it ideal for photovoltaic and optoelectronic applications.
    • Environmentally Friendly: Sb₂S₃ is composed of elements that are abundant and less toxic compared to other heavy metals used in similar applications.
    • Tunability: The bandgap of Sb₂S₃ can be tuned by modifying deposition parameters, allowing for control over its optical and electronic properties in thin films.
    • Thermoelectric Properties: Sb₂S₃ is being explored for its potential to generate electrical energy from thermal gradients, offering promise in energy-harvesting devices.
  • Sb2Se3 Sputtering Target 3N-6N High Purity Antimony Selenide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSb2Se3 Sputtering Target 3N-6N High Purity Antimony Selenide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sb2Se3 (Antimony Selenide) Sputtering Target

    • High Absorption Coefficient: Sb₂Se₃ has a high absorption coefficient, which makes it effective for thin-film solar cells and light-harvesting applications.
    • Bandgap: The material has a bandgap around 1.1 to 1.3 eV, ideal for photovoltaic devices aimed at capturing sunlight efficiently.
    • Non-Toxic and Earth-Abundant: Sb₂Se₃ offers an environmentally friendlier and more sustainable alternative to other thin-film materials like cadmium-based compounds.
    • Stable Crystal Structure: Sb₂Se₃ thin films exhibit a stable orthorhombic crystal structure, which contributes to their robustness in various electronic and energy-related applications.
  • Sb2Te3 Sputtering Target 3N-6N High Purity Antimony Telluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSb2Te3 Sputtering Target 3N-6N High Purity Antimony Telluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sb2Te3 (Antimony Telluride) Sputtering Target

    • High Thermoelectric Efficiency: Sb₂Te₃ exhibits excellent thermoelectric performance with a high figure of merit (ZT) near room temperature, making it one of the most effective materials for energy conversion and cooling applications.
    • Phase-Change Properties: Its ability to rapidly switch between different phases with thermal cycling makes Sb₂Te₃ ideal for memory devices such as phase-change random-access memory (PCRAM).
    • Topological Insulator Properties: Sb₂Te₃ is used in cutting-edge research into topological insulators, with potential applications in quantum computing and advanced electronics.
    • Customizable Thin Films: Sputtering targets allow for controlled deposition of Sb₂Te₃ films with tailored thickness, composition, and properties for specific device requirements.
  • Scandium Sputtering Target 99.99%-99.9999% High Purity Sc Metal Sputtering Targets CustomizedScandium Sputtering Target 99.99%-99.9999% High Purity Sc Metal Sputtering Targets Customized

    Sc Scandium Sputtering Target

    Scandium sputtering targets are essential in applications that require lightweight, high-performance coatings, particularly in the semiconductor, aerospace, and advanced materials sectors. Despite its rarity, scandium’s unique properties make it a valuable material for cutting-edge technologies.

  • Sc2O3 Sputtering Target 3N-6N High Purity Scandium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSc2O3 Sputtering Target 3N-6N High Purity Scandium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sc2O3 (Scandium Oxide) Sputtering Target

    • High Dielectric Constant: Sc₂O₃ is known for its high dielectric constant, making it useful in capacitors and semiconductor devices.
    • Thermal Stability: Sc₂O₃ maintains its properties even at elevated temperatures, making it suitable for harsh environments.
    • Optical Transparency: Sc₂O₃ is transparent across a wide range of wavelengths, from UV to IR, which is beneficial in optical coatings and devices.
    • Corrosion Resistance: Sc₂O₃ thin films are highly resistant to chemical corrosion, enhancing the longevity of coated surfaces.
  • Selenium Sputtering Target 99.9%-99.9999% High Purity Se Metal Sputtering Targets 3N-6N Customized - Tinsan MaterialsSelenium Sputtering Target 99.9%-99.9999% High Purity Se Metal Sputtering Targets 3N-6N Customized - Tinsan Materials

    Se Selenium Sputtering Targets

    • Purity: High-purity selenium (typically 99.9% or higher) ensures the quality of the deposited films and consistent performance.
    • Photoconductivity: Selenium is highly photoconductive, making it ideal for optoelectronic and photovoltaic applications.
    • Customizable Size and Shape: Selenium sputtering targets are available in different forms, including discs, plates, and custom shapes, to fit a variety of PVD systems.
    • Thermal and Electrical Properties: Selenium films offer excellent thermal and electrical properties, crucial for semiconductor and photovoltaic devices.