Showing 169–180 of 244 results

  • Silicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan MaterialsSilicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan Materials

    Si Silicon Sputtering Targets

    • Purity: Silicon sputtering targets are typically available in high purity (99.999% or higher) to ensure high-performance film deposition, particularly in sensitive semiconductor applications.
    • Electrical Properties: Silicon is an intrinsic semiconductor, and thin films made from silicon offer excellent electrical characteristics for electronic and optoelectronic devices.
    • Thermal Conductivity: Silicon’s thermal properties make it ideal for applications where heat dissipation is important, such as in power electronics and solar cells.
    • Customizable Size and Shape: Silicon sputtering targets come in various forms, including discs, plates, and custom shapes to fit different deposition systems.
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  • Si2Te3 Sputtering Targets 2N5-6N High Purity Silicon Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Si2Te3 (Silicon Telluride) Sputtering Targets

    • High Purity: Ensures minimal contamination and consistent deposition performance.
    • Optimal Stoichiometry: Precisely controlled Si and Te ratio for superior material properties.
    • Wide Compatibility: Suitable for various deposition techniques, including PVD and sputtering.
    • Excellent Film Properties: Supports the production of uniform, high-quality thin films.
    • Customizable Options: Flexible sizes and shapes to fit diverse sputtering systems.
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  • Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Sputtering Target

    • High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
    • Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
    • Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
    • Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
    • Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.
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  • SiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    SiC (Silicon Carbide) Sputtering Targets

    • Exceptional Hardness: Ideal for durable, wear-resistant coatings.
    • High Thermal Stability: Performs well under extreme temperatures.
    • Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
    • Chemical Resistance: Resilient to corrosive environments.
    • Customizable Configurations: Available in various sizes, purities, and bonding options.
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  • SiO Sputtering Targets 3N-6N High Purity Silicon Monoxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SiO (Silicon Monoxide) Sputtering Targets

    • High Purity: Ensures superior film quality and consistent performance.
    • Wide Optical Transparency: Suitable for coatings across UV, visible, and IR ranges.
    • Stable and Durable: High thermal and chemical stability for demanding processes.
    • Customizable Options: Available in various sizes, purities, and configurations.
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  • SiO2 Sputtering Target 99.9%-99.9999% High Purity Silicon Dioxide Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan MaterialsSiO2 Sputtering Target 99.9%-99.9999% High Purity Silicon Dioxide Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan Materials

    SiO2 (Silicon Dioxide) Sputtering Targets

    • Excellent Insulator: SiO₂ has a high dielectric strength, making it a perfect insulating material for electronic devices and integrated circuits.
    • High Optical Transparency: SiO₂ is highly transparent in the UV, visible, and near-IR regions, making it suitable for optical coatings and protective layers.
    • Chemical Stability: SiO₂ exhibits strong chemical resistance, ensuring that deposited films are durable and stable under harsh environmental conditions.
    • Thermal Stability: Silicon Dioxide can withstand high temperatures, making it reliable for use in applications that involve thermal stress.
    • Hardness: SiO₂ provides a protective layer that is scratch-resistant and durable, making it ideal for surface coatings.
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  • Sm2O3 Sputtering Targets 3N-6N High Purity Samarium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    Sm2O3 (Samarium Oxide) Sputtering Targets

    • High Purity: Ensures minimal contamination for reliable thin-film deposition.
    • Thermal Stability: Suitable for high-temperature processes.
    • Excellent Magnetic Properties: Ideal for magnetics and spintronic applications.
    • Optical Performance: High transparency in specific wavelength ranges.
    • Custom Configurations: Available in various sizes and purity levels.
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  • Sn Tin Sputtering Targets 99.9%-99.9999% High Purity Sn Stannum Metal Sputtering Targets 3N-6N Customized - Tinsan MaterialsSn Tin Sputtering Targets 99.9%-99.9999% High Purity Sn Metal Sputtering Targets 3N-6N Customized

    Sn Tin Sputtering Targets

    • High Purity: Typically available in purities of 99.9% (3N) to 99.9999% (6N), ensuring high-quality deposition with minimal impurities.
    • Good Conductivity: Tin is an excellent conductor of electricity, making it ideal for electronic and semiconductor applications.
    • Corrosion Resistance: Exhibits resistance to oxidation and corrosion, ensuring durable and stable coatings.
    • Low Melting Point: Tin has a relatively low melting point (232°C), facilitating efficient sputtering processes.
    • Versatility: Suitable for creating uniform films in a range of applications, including electronic, decorative, and optical coatings.
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  • SnO2 Sputtering Target 3N-6N High Purity Tin Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSnO2 Sputtering Target 3N-6N High Purity Tin Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SnO2 (Tin Oxide) Sputtering Target

    • High Transparency: SnO2 films are highly transparent in the visible light spectrum, making them suitable for optoelectronic applications like transparent conductive films.
    • Good Conductivity: Despite its transparency, SnO2 has good electrical conductivity, essential for its role in electrodes and gas sensors.
    • Wide Bandgap: SnO2 is a wide-bandgap semiconductor, giving it excellent performance in high-temperature environments and under high-voltage conditions.
    • Chemical Stability: Tin oxide is chemically stable, ensuring that films remain durable and resistant to corrosion in various conditions.
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  • SnS2 Sputtering Target 3N-6N High Purity Tin Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SnS2 (Tin Disulfide) Sputtering Target

    • Semiconductor Properties: SnS₂ has a direct bandgap, making it suitable for absorbing light and generating charge carriers, ideal for photovoltaic and optoelectronic applications.
    • High Absorption Coefficient: SnS₂ thin films exhibit high optical absorption, making them effective in solar energy harvesting applications.
    • Environmentally Friendly: Tin and sulfur are abundant and non-toxic elements, making SnS₂ a more environmentally benign material compared to some other semiconductor compounds.
    • Layered Structure: The layered crystal structure of SnS₂ allows for good ion intercalation in energy storage devices and provides opportunities for 2D material applications.
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  • SnSe Sputtering Targets 3N-6N High Purity Tin Selenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SnSe (Tin Selenide) Sputtering Targets

    • High Purity: ≥ 99.99% purity for optimal thin-film deposition.
    • Layered Crystal Structure: Supports efficient film formation and exfoliation.
    • Exceptional Thermoelectric Performance: High Seebeck coefficient and low thermal conductivity.
    • Broad Application Range: Versatile for electronic, photovoltaic, and thermoelectric uses.
    • Customizable Options: Available in various sizes, shapes, and bonding configurations.
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  • SnSe2 Sputtering Targets 3N-6N High Purity Tin Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsSnSe2 Sputtering Targets 3N-6N High Purity Tin Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan Materials

    SnSe2 (Tin Diselenide) Sputtering Targets

    • High Purity: ≥ 99.99% purity ensures consistent and efficient thin-film deposition.
    • Layered Structure: Promotes easy exfoliation and high-quality thin-film production.
    • Exceptional Optical and Electrical Properties: High carrier mobility and excellent absorption coefficients.
    • Thermoelectric Efficiency: Strong performance in thermal-to-electric energy conversion.
    • Customizable Options: Tailored sizes and shapes to suit diverse applications.
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