Showing 181–192 of 244 results

  • SnTe Sputtering Targets 2N5-6N High Purity Tin Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SnTe (Tin Telluride) Sputtering Targets

    • High Purity: Reduces impurities, ensuring superior thin-film quality.
    • Stable Composition: Precisely controlled Sn and Te ratio for consistent performance.
    • Excellent Film Properties: Produces smooth, high-density, and defect-free films.
    • Versatile Deposition: Suitable for PVD and other thin-film coating techniques.
    • Customizable Options: Flexible sizes and specifications to fit diverse sputtering systems.
  • Sr3Al2O6 Sputtering Targets 3N-6N High Purity Strontium Aluminate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsSr3Al2O6 Sputtering Targets 3N-6N High Purity Strontium Aluminate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    Sr3Al2O6 (Strontium Aluminate) Sputtering Targets

    • Thermal Stability: Sr₃Al₂O₆ sputtering targets exhibit excellent thermal stability, making them suitable for high-temperature deposition processes.
    • Durability: The material provides strong, durable films that are resistant to wear and tear, enhancing the longevity of devices.
    • High Luminescent Properties: When doped with certain elements, it can act as a phosphorescent material, making it valuable in the display and lighting industries.
    • Versatile Film Properties: It can produce films with excellent uniformity and precise thickness control in sputtering processes.
    • Chemical Resistance: Sr₃Al₂O₆ is chemically stable, contributing to the robustness of coatings and films.
  • SrCoO3 Sputtering Targets 3N-6N High Purity Strontium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsSrCoO3 Sputtering Targets 3N-6N High Purity Strontium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan Materials

    SrCoO3 (Strontium Cobalt Oxide) Sputtering Targets

    • Excellent Electrical Conductivity: Ensures efficient charge transfer in energy devices.
    • Thermal and Chemical Stability: Performs reliably under high-temperature and reactive conditions.
    • High Purity Material: Minimizes impurities for optimal film quality.
    • Versatile Applications: Suitable for complex oxide-based thin-film devices.
    • Customizable Configurations: Various sizes, purities, and bonding options to meet specific requirements.
  • SrMnO3 Sputtering Targets 3N-6N High Purity Strontium Manganite Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrMnO3 (Strontium Manganite) Sputtering Targets

    • High Purity: Ensures low contamination and high film integrity.
    • Superior Density: Achieves consistent sputtering performance and uniform thin films.
    • Customizable Specifications: Available in various sizes, shapes, and densities.
    • Excellent Thermal Stability: Withstands high temperatures for advanced applications.
    • Wide Compatibility: Suitable for different sputtering systems.
  • SrMoO4 (Strontium Molybdate) Sputtering Targets

    • High Purity: Ensures minimal contamination in the deposited thin films.
    • Chemical Stability: Offers long-lasting performance in demanding environments.
    • Customizable: Available in various sizes, shapes, and thicknesses to meet specific requirements.
    • Consistent Quality: Designed for uniform film deposition with optimal density and microstructure.
  • SrNbO3 (Strontium Niobate) Sputtering Targets

    • High Purity: Manufactured with stringent quality controls to ensure material integrity and minimal impurities.
    • Customizable Options: Available in various sizes, thicknesses, and shapes to meet specific deposition requirements.
    • Excellent Physical Properties: Offers reliable electrical and optical performance.
    • Versatile Compatibility: Suitable for advanced sputtering systems.
  • SrRuO3 Sputtering Targets 3N-6N High Purity Strontium Ruthenate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrRuO3 (Strontium Ruthenate) Sputtering Targets

    • High Electrical Conductivity: SrRuO₃ films provide excellent electrical conductivity, making them ideal for use as electrodes and contact layers.
    • Stability: Offers good stability under various operating conditions, making it suitable for use in demanding applications.
    • Magnetic Properties: Exhibits magnetic properties, making it useful in devices that require the integration of magnetic and electronic functions.
    • Compatible with Other Oxides: SrRuO₃ can be easily integrated with other perovskite oxide materials, making it versatile for various electronic applications.
    • High Purity: Available in high-purity grades (≥99.9%) to ensure clean and consistent thin-film deposition.
  • SrSnO3 Sputtering Targets 3N-6N High Purity Strontium Stannate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SrSnO3 (Strontium Stannate) Sputtering Targets

    • High Purity: Ensures superior film quality and uniform deposition.
    • Optimal Conductivity: Suitable for advanced optoelectronic devices.
    • Customization: Available in various sizes, shapes, and compositions to meet specific requirements.
    • Stability: Excellent thermal and chemical stability for long-lasting performance.
  • SrTiO3 Sputtering Targets 3N-6N High Purity Strontium Titanate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan MaterialsSrTiO3 Sputtering Targets 3N-6N High Purity Strontium Titanate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SrTiO3 (Strontium Titanate) Sputtering Targets

    • High Purity: Typically ≥99.9% for superior film quality and performance
    • Excellent Dielectric Properties: Ideal for high-frequency electronic applications
    • Perovskite Structure: Ensures compatibility with complex oxide thin films
    • Customizable: Available in various sizes and shapes to suit specific requirements
    • Durability: High thermal and chemical stability for long-term use
  • SrVO3 Sputtering Targets 2N5-6N High Purity Strontium Vanadate Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrVO3 (Strontium Vanadate) Sputtering Targets

    • High Conductivity: Excellent electrical conductivity makes SrVO₃ ideal for applications requiring transparent conductive materials.
    • High Purity: Available in ≥99.5% purity, ensuring high-quality thin-film deposition.
    • Stable Sputtering Performance: Reliable and consistent sputtering performance with minimal target degradation.
    • Optical Transparency: Ideal for optoelectronic devices requiring both electrical conductivity and optical transparency.
    • Customization: Targets can be made in various sizes and shapes to meet specific deposition system requirements.
  • Tantalum Sputtering Targets 99.9%-99.9999% High Purity Ta Metal Sputtering Target 3N-6N Customized - Tinsan MaterialsTantalum Sputtering Targets 99.9%-99.9999% High Purity Ta Metal Sputtering Target 3N-6N Customize - Tinsan Materials

    Ta Tantalum Sputtering Targets

    • High Purity: Ensures contamination-free thin films for critical applications.
    • Corrosion Resistance: Withstands harsh chemical environments.
    • High Melting Point: Stable under extreme thermal conditions.
    • Superior Electrical Conductivity: Suitable for advanced electronic devices.
    • Customizable Options: Adaptable to specific design and operational requirements.
  • Ta2O5 Sputtering Target 3N-6N High Purity Tantalum Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTa2O5 Sputtering Target 3N-6N High Purity Tantalum Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    Ta2O5 (Tantalum Pentoxide) Sputtering Target

    • High Dielectric Constant: Ta₂O₅ films exhibit a high dielectric constant, making them ideal for use in capacitors and semiconductor devices requiring high electrical insulation.
    • Chemical and Thermal Stability: Ta₂O₅ provides excellent resistance to chemical attack and can withstand high temperatures, making it suitable for applications in harsh environments.
    • Optical Transparency: Ta₂O₅ is transparent over a wide range of wavelengths, which makes it an excellent material for optical coatings that require high refractive index and low absorption.
    • High Refractive Index: The high refractive index of Ta₂O₅ makes it ideal for optical multilayer coatings used in anti-reflective applications and optical filters.
    • Durability: Ta₂O₅ films are known for their mechanical strength and durability, providing a robust protective layer in various high-performance applications.