Showing 193–204 of 244 results

  • TaC Sputtering Target 3N-6N High Purity Tantalum Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsTaC Sputtering Target 3N-6N High Purity Tantalum Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    TaC (Tantalum Carbide) Sputtering Target

    • Extreme Hardness: TaC coatings provide excellent hardness, making them ideal for cutting tools, wear-resistant coatings, and surfaces exposed to high friction.
    • High Melting Point: With a melting point exceeding 3880°C, TaC is one of the most heat-resistant materials, suitable for high-temperature applications in aerospace and industrial processes.
    • Corrosion Resistance: TaC films offer robust resistance to chemicals, making them ideal for protective coatings in chemically aggressive environments.
    • Electrical Conductivity: TaC has good electrical conductivity, which is advantageous in certain electronic and semiconductor applications.
    • Oxidation Resistance: The oxidation resistance of TaC enhances its performance in environments where exposure to high temperatures and reactive gases is common.
  • TaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsTaN Sputtering Target 3N-6N High Purity Tantalum Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    TaN (Tantalum Nitride) Sputtering Target

    • Excellent Diffusion Barrier: TaN films provide an effective barrier against the diffusion of metals, such as copper, making them crucial for semiconductor devices.
    • High Electrical Resistivity: TaN has a relatively high electrical resistivity, which makes it suitable for thin-film resistors and other resistive applications.
    • Chemical and Thermal Stability: Tantalum Nitride exhibits excellent stability in extreme chemical and thermal environments, ensuring long-lasting performance in harsh conditions.
    • Hardness and Wear Resistance: TaN films offer superior hardness and wear resistance, making them ideal for protective coatings in demanding industrial applications.
    • Corrosion Resistance: TaN is resistant to corrosion, making it suitable for use in environments where exposure to chemicals or moisture is a concern.
  • Terbium Sputtering Target 99.9%-99.9999% High Purity Tb Metal Sputtering Targets 3N-6N CustomizedTerbium Sputtering Target 99.9%-99.9999% High Purity Tb Metal Sputtering Targets 3N-6N Customized

    Tb Terbium Sputtering Target

    Terbium sputtering targets are essential in the production of thin films with unique magnetic and optical properties, making them invaluable in advanced technologies such as magneto-optic devices, magnetic refrigeration, data storage, and high-performance displays. Despite its rarity, terbium’s distinct characteristics offer significant advantages in specialized industrial and technological applications.

  • TeCd Sputtering Target 3N-6N High Purity Tellurium Cadmium Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    TeCd (Tellurium Cadmium) Sputtering Target

    • Excellent Photovoltaic Properties: TeCd, especially CdTe, is widely used in thin-film solar cells due to its excellent light absorption and efficient energy conversion.
    • Infrared Sensitivity: TeCd thin films exhibit high sensitivity to infrared light, making them suitable for infrared detectors and thermal imaging devices.
    • Stable Thin Films: TeCd films are chemically stable and durable, ensuring long-term performance in harsh environmental conditions.
    • Efficient Energy Conversion: TeCd materials offer high energy conversion efficiency, particularly in solar and thermoelectric applications, providing reliable performance in energy devices.
  • Titanium Sputtering Target, 99.9%-99.999% High Purity Ti Sputtering Target CustomizedTitanium Sputtering Target, 99.9%-99.999% High Purity Ti Sputtering Target Customized

    Ti Titanium Sputtering Target

    Titanium (Ti) sputtering targets are widely used in physical vapor deposition (PVD) processes to create thin films and coatings on various substrates. Titanium is known for its high strength-to-weight ratio, excellent corrosion resistance, and ability to form strong bonds with a variety of materials, making it an ideal choice for many industrial applications.

  • Ti2O3 Sputtering Targets 3N-6N High Purity Titanium(III) Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Ti2O3 (Titanium(III) Oxide) Sputtering Targets

    • High Purity: Ensures uniform film deposition with minimal contamination.
    • Excellent Optical Properties: Provides transparency and reflectivity for optical applications.
    • Electrical Conductivity: Suitable for applications requiring conductive thin films.
    • Durable and Stable: Resistant to chemical and thermal degradation, ensuring long-lasting performance.
    • Versatile Compatibility: Can be used with various sputtering systems and processes.
  • Ti3O5 Sputtering Targets 2N5-6N High Purity Titanium Oxide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Ti3O5 (Titanium Oxide) Sputtering Targets

    • High Purity: Ensures consistent and reliable thin-film quality.
    • Stable Performance: Exceptional thermal and chemical stability for demanding applications.
    • Customizable Configurations: Available in various sizes and forms to suit diverse deposition systems.
    • Optical Clarity: Produces transparent coatings with excellent optical properties.
    • Durability: High resistance to mechanical stress and environmental degradation.
  • TiAl Alloy Target 99.9%-99.9999% High Purity Titanium Aluminium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsTiAl Alloy Target 99.9%-99.9999% High Purity Titanium Aluminium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    TiAl (Titanium Aluminium) Alloy Target

    • High Strength-to-Weight Ratio: TiAl alloys combine the lightweight nature of aluminum with the strength of titanium, making them ideal for thin films in high-performance applications.
    • Corrosion and Oxidation Resistance: TiAl films provide excellent resistance to corrosion and oxidation, ensuring durability and longevity in harsh environments.
    • Thermal Stability: TiAl alloys can withstand high temperatures without losing mechanical properties, making them suitable for applications in high-temperature environments.
    • Good Adhesion: TiAl thin films exhibit excellent adhesion to substrates, which is crucial for semiconductor and coating applications where film integrity is vital.
    • Wear Resistance: The addition of titanium improves the hardness and wear resistance of TiAl coatings, contributing to extended tool life and enhanced component durability.
  • TiB2 Sputtering Targets 2N5-5N High Purity Titanium Diboride Ceramic Sputtering Target High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan MaterialsTiB2 Sputtering Targets 2N5-5N High Purity Titanium Diboride Ceramic Sputtering Targets High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    TiB2 (Titanium Diboride) Sputtering Targets

    • Exceptional Hardness: Provides superior durability and wear resistance.
    • High Thermal Stability: Performs well under extreme temperatures.
    • Electrical Conductivity: Suitable for electronic applications requiring conductive layers.
    • Corrosion Resistance: Withstands harsh chemical environments.
    • High Purity: Ensures consistent thin-film quality and reliable performance.
  • TiC Sputtering Target 3N-6N High Purity Titanium Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiC Sputtering Target 3N-6N High Purity Titanium Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiC (Titanium Carbide) Sputtering Target

    • High Hardness: TiC coatings provide excellent hardness, making them suitable for wear-resistant applications like cutting tools and dies.
    • Corrosion Resistance: TiC films resist oxidation and corrosion, providing a protective barrier in harsh environments, including high-temperature applications.
    • Thermal Stability: TiC has high thermal stability, making it ideal for coatings in high-temperature operations such as aerospace and automotive components.
    • Electrical Conductivity: TiC exhibits good electrical conductivity, making it suitable for certain electronic and semiconductor applications where conductivity is critical.
    • Chemical Resistance: TiC coatings offer chemical resistance, providing protective layers against corrosive agents and harsh chemicals.
  • TiN Sputtering Target 3N-6N High Purity Titanium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiN Sputtering Target 3N-6N High Purity Titanium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiN (Titanium Nitride) Sputtering Target

    • High Hardness: TiN coatings are known for their exceptional hardness, making them ideal for cutting tools and components subject to high friction and stress.
    • Corrosion Resistance: TiN provides excellent protection against corrosion and oxidation, extending the lifespan of coated parts and tools.
    • High Temperature Stability: TiN remains stable at high temperatures, making it suitable for applications in high-temperature environments such as aerospace or industrial machinery.
    • Good Electrical Conductivity: TiN is conductive and is often used in microelectronics as a barrier or adhesion layer in integrated circuits.
    • Gold-Like Appearance: TiN has a bright gold color, making it popular for decorative applications and coatings in architectural elements and consumer products.
  • SnS Sputtering Targets 3N-6N High Purity Tin Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Tin Sulfide (SnS) Sputtering Targets

    • High Purity: ≥ 99.9% purity ensures consistent and high-quality film deposition.
    • Optoelectronic Properties: Exhibits excellent absorption coefficients and semiconducting behavior.
    • Environmentally Friendly: Non-toxic and abundant material for sustainable applications.
    • Customizable Formulations: Tailored compositions to meet specific research and industrial needs.
    • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.