Showing 217–228 of 246 results

  • V2O5 Sputtering Target 3N-6N High Purity Vanadium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsV2O5 Sputtering Target 3N-6N High Purity Vanadium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    V2O5 (Vanadium Pentoxide) Sputtering Target

    • Electrochromic Properties: V₂O₅ is a well-known electrochromic material, enabling the dynamic control of optical properties in thin films.
    • High Oxidation State: Vanadium pentoxide has a high oxidation state, which enhances its catalytic and electrochemical performance in various applications.
    • Thermal Stability: V₂O₅ is stable at high temperatures, making it suitable for thin-film applications that require resistance to heat.
    • Multifunctional: V₂O₅ is versatile and can be used in applications ranging from energy storage to optical and gas-sensing devices.
  • VC Sputtering Targets 2N5-6N High Purity Vanadium Carbide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Carbide (VC) Sputtering Targets

    • Exceptional Hardness: Provides outstanding resistance to abrasion and wear.
    • Chemical Stability: Maintains performance in harsh and reactive environments.
    • High Thermal Conductivity: Efficiently dissipates heat in critical applications.
    • Uniform Deposition: Ensures consistent film quality with minimal defects.
    • Customizable Options: Available in various sizes and purities for specialized applications.
  • VN Sputtering Targets 3N-6N High Purity Vanadium Nitride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Nitride (VN) Sputtering Targets

    • High hardness and wear resistance, ideal for demanding environments
    • Excellent corrosion resistance, prolonging the life of components
    • Stable and consistent film quality for precise deposition
    • Suitable for high-temperature and high-performance applications
    • Enhanced durability in harsh operational conditions
    • Compatible with various sputtering systems and deposition techniques
  • VB2 Sputtering Targets 2N5-6N High Purity Vanadium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VB2 (Vanadium Diboride) Sputtering Targets

    • Exceptional Hardness: VB₂ coatings provide unmatched surface durability and wear resistance.
    • High Electrical Conductivity: Ensures efficient conductivity for electronic applications.
    • Thermal Stability: Retains structural integrity under high-temperature conditions, making it suitable for extreme environments.
    • Chemical Stability: Resists corrosion in aggressive chemical and environmental conditions.
    • Customizable Dimensions: Tailored to specific application needs with a range of sizes and shapes available.
  • VO2 Sputtering Target 3N-6N High Purity Vanadium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsVO2 Sputtering Target 3N-6N High Purity Vanadium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    VO2 (Vanadium Dioxide) Sputtering Target

    • Phase Transition: One of the most distinctive features of VO₂ is its reversible phase transition from an insulator to a metal at around 68°C. This enables tunable electrical and optical properties, making it a versatile material in smart applications.
    • Thermochromic Behavior: VO₂’s thermochromic properties are used in energy-efficient coatings that automatically adjust their transparency and reflectivity based on temperature.
    • Optical Properties: VO₂ exhibits unique optical behavior, including changes in reflectivity and transmission with temperature, making it suitable for use in smart windows and optical devices.
    • Electrical Properties: VO₂ switches between insulating and metallic phases, making it useful for electronic switching applications, such as transistors and memory devices.
  • VSi2 Sputtering Targets 3N-6N High Purity Vanadium Disilicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VSi2 (Vanadium Disilicide) Sputtering Targets

    • Superior Electrical Conductivity: VSi₂ is an excellent conductor of electricity, making it ideal for applications where conductive coatings are required.
    • High Thermal Stability: The material maintains its integrity under high temperatures, making it suitable for high-temperature applications.
    • Hardness and Durability: Known for its wear resistance, VSi₂ is used in applications that demand exceptional durability and surface hardness.
    • Corrosion Resistance: Offers good resistance to corrosion, particularly in aggressive environments.
    • Customizable Sizes: Available in various sizes and thicknesses to meet specific application requirements.
  • Tungsten Sputtering Target, 99.9%-99.9999% High Purity W Metal Sputtering Targets CustomizedTungsten Sputtering Target, 99.9%-99.9999% High Purity W Metal Sputtering Targets Customized

    W Tungsten Sputtering Target

    Tungsten sputtering targets are indispensable in industries that demand materials with high thermal and electrical conductivity, exceptional strength, and stability at extreme temperatures. These properties make tungsten a critical material in electronics, aerospace, energy, and medical applications.

  • WC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WC (Tungsten Carbide) Sputtering Target

    • Exceptional Hardness: WC films offer high hardness, contributing to their use in tools and wear-resistant coatings.
    • Thermal Stability: Tungsten Carbide thin films can withstand high temperatures without degrading, making them suitable for high-temperature environments.
    • High Melting Point: WC has a melting point above 2,870°C, ensuring it retains its structural integrity in extreme conditions.
    • Corrosion Resistance: WC coatings provide strong resistance against corrosion, enhancing the longevity of components used in harsh environments.
    • Excellent Adhesion: WC sputtered films adhere well to various substrates, including metals and ceramics, ensuring durability and longevity of the coatings.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    WO3 (Tungsten Trioxide) Sputtering Targets

    • High Melting Point: WO₃ has a high melting point (~1473°C), making it suitable for high-temperature applications.
    • Chemical Stability: WO₃ is chemically stable and resistant to oxidation, ensuring long-term reliability in harsh environments.
    • Transparency Control: WO₃ films can be engineered for transparency modulation, useful in smart glass and energy-efficient windows.
    • High Conductivity: When doped or treated, WO₃ can exhibit increased electrical conductivity for various electronic applications.
  • WS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WS2 (Tungsten Disulfide) Sputtering Target

    • Low Friction Coefficient: WS2 thin films exhibit an extremely low coefficient of friction, which is beneficial for improving the performance of mechanical systems in high-friction environments.
    • Thermal Stability: WS2 coatings maintain their properties at elevated temperatures, making them suitable for high-temperature applications.
    • High Wear Resistance: WS2 offers exceptional wear resistance, extending the operational life of coated components subjected to abrasive conditions.
    • Chemical Inertness: WS2 is resistant to corrosion and oxidation, making it durable in harsh chemical environments.
    • Layered Structure: The unique layered structure of WS2 provides excellent lubricating properties due to the easy shearing between layers.
  • WSi2 Sputtering Targets 2N5-6N High Purity Tungsten Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    WSi2 (Tungsten Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Withstands high-temperature operations.
    • High Electrical Conductivity: Ideal for conductive and resistive layers.
    • Oxidation Resistance: Reliable performance in harsh environments.
    • High Purity: Ensures uniform deposition and minimal contamination.
    • Customizability: Available in various dimensions and purities to suit specific needs.
  • WTe2 Sputtering Targets 2N5-6N High Purity Tungsten Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    WTe2 (Tungsten Telluride) Sputtering Targets

    • High Purity: Ensures superior thin-film quality with minimal impurities.
    • Layered Structure: Supports the formation of ultra-thin films with excellent properties.
    • Stable Composition: Reliable and consistent deposition outcomes.
    • Versatile Application: Compatible with various sputtering systems and techniques.
    • Customizable Options: Tailored targets for specific research and industrial requirements.