Showing 217–228 of 244 results

  • VN Sputtering Targets 3N-6N High Purity Vanadium Nitride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Nitride (VN) Sputtering Targets

    • High hardness and wear resistance, ideal for demanding environments
    • Excellent corrosion resistance, prolonging the life of components
    • Stable and consistent film quality for precise deposition
    • Suitable for high-temperature and high-performance applications
    • Enhanced durability in harsh operational conditions
    • Compatible with various sputtering systems and deposition techniques
  • VB2 Sputtering Targets 2N5-6N High Purity Vanadium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VB2 (Vanadium Diboride) Sputtering Targets

    • Exceptional Hardness: VB₂ coatings provide unmatched surface durability and wear resistance.
    • High Electrical Conductivity: Ensures efficient conductivity for electronic applications.
    • Thermal Stability: Retains structural integrity under high-temperature conditions, making it suitable for extreme environments.
    • Chemical Stability: Resists corrosion in aggressive chemical and environmental conditions.
    • Customizable Dimensions: Tailored to specific application needs with a range of sizes and shapes available.
  • VO2 Sputtering Target 3N-6N High Purity Vanadium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsVO2 Sputtering Target 3N-6N High Purity Vanadium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    VO2 (Vanadium Dioxide) Sputtering Target

    • Phase Transition: One of the most distinctive features of VO₂ is its reversible phase transition from an insulator to a metal at around 68°C. This enables tunable electrical and optical properties, making it a versatile material in smart applications.
    • Thermochromic Behavior: VO₂’s thermochromic properties are used in energy-efficient coatings that automatically adjust their transparency and reflectivity based on temperature.
    • Optical Properties: VO₂ exhibits unique optical behavior, including changes in reflectivity and transmission with temperature, making it suitable for use in smart windows and optical devices.
    • Electrical Properties: VO₂ switches between insulating and metallic phases, making it useful for electronic switching applications, such as transistors and memory devices.
  • VSi2 Sputtering Targets 3N-6N High Purity Vanadium Disilicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VSi2 (Vanadium Disilicide) Sputtering Targets

    • Superior Electrical Conductivity: VSi₂ is an excellent conductor of electricity, making it ideal for applications where conductive coatings are required.
    • High Thermal Stability: The material maintains its integrity under high temperatures, making it suitable for high-temperature applications.
    • Hardness and Durability: Known for its wear resistance, VSi₂ is used in applications that demand exceptional durability and surface hardness.
    • Corrosion Resistance: Offers good resistance to corrosion, particularly in aggressive environments.
    • Customizable Sizes: Available in various sizes and thicknesses to meet specific application requirements.
  • Tungsten Sputtering Target, 99.9%-99.9999% High Purity W Metal Sputtering Targets CustomizedTungsten Sputtering Target, 99.9%-99.9999% High Purity W Metal Sputtering Targets Customized

    W Tungsten Sputtering Target

    Tungsten sputtering targets are indispensable in industries that demand materials with high thermal and electrical conductivity, exceptional strength, and stability at extreme temperatures. These properties make tungsten a critical material in electronics, aerospace, energy, and medical applications.

  • WC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WC (Tungsten Carbide) Sputtering Target

    • Exceptional Hardness: WC films offer high hardness, contributing to their use in tools and wear-resistant coatings.
    • Thermal Stability: Tungsten Carbide thin films can withstand high temperatures without degrading, making them suitable for high-temperature environments.
    • High Melting Point: WC has a melting point above 2,870°C, ensuring it retains its structural integrity in extreme conditions.
    • Corrosion Resistance: WC coatings provide strong resistance against corrosion, enhancing the longevity of components used in harsh environments.
    • Excellent Adhesion: WC sputtered films adhere well to various substrates, including metals and ceramics, ensuring durability and longevity of the coatings.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    WO3 (Tungsten Trioxide) Sputtering Targets

    • High Melting Point: WO₃ has a high melting point (~1473°C), making it suitable for high-temperature applications.
    • Chemical Stability: WO₃ is chemically stable and resistant to oxidation, ensuring long-term reliability in harsh environments.
    • Transparency Control: WO₃ films can be engineered for transparency modulation, useful in smart glass and energy-efficient windows.
    • High Conductivity: When doped or treated, WO₃ can exhibit increased electrical conductivity for various electronic applications.
  • WS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WS2 (Tungsten Disulfide) Sputtering Target

    • Low Friction Coefficient: WS2 thin films exhibit an extremely low coefficient of friction, which is beneficial for improving the performance of mechanical systems in high-friction environments.
    • Thermal Stability: WS2 coatings maintain their properties at elevated temperatures, making them suitable for high-temperature applications.
    • High Wear Resistance: WS2 offers exceptional wear resistance, extending the operational life of coated components subjected to abrasive conditions.
    • Chemical Inertness: WS2 is resistant to corrosion and oxidation, making it durable in harsh chemical environments.
    • Layered Structure: The unique layered structure of WS2 provides excellent lubricating properties due to the easy shearing between layers.
  • WSi2 Sputtering Targets 2N5-6N High Purity Tungsten Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    WSi2 (Tungsten Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Withstands high-temperature operations.
    • High Electrical Conductivity: Ideal for conductive and resistive layers.
    • Oxidation Resistance: Reliable performance in harsh environments.
    • High Purity: Ensures uniform deposition and minimal contamination.
    • Customizability: Available in various dimensions and purities to suit specific needs.
  • WTe2 Sputtering Targets 2N5-6N High Purity Tungsten Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    WTe2 (Tungsten Telluride) Sputtering Targets

    • High Purity: Ensures superior thin-film quality with minimal impurities.
    • Layered Structure: Supports the formation of ultra-thin films with excellent properties.
    • Stable Composition: Reliable and consistent deposition outcomes.
    • Versatile Application: Compatible with various sputtering systems and techniques.
    • Customizable Options: Tailored targets for specific research and industrial requirements.
  • WTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan MaterialsWTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    WTi (Tungsten Titanium) Alloy Target

    • High Melting Point: The combination of tungsten and titanium gives the alloy a high melting point, making WTi thin films highly durable and able to withstand extreme temperatures.
    • Oxidation and Corrosion Resistance: WTi thin films resist oxidation and corrosion, making them ideal for environments where materials are exposed to harsh conditions.
    • Excellent Adhesion: WTi thin films exhibit excellent adhesion to various substrates, which is crucial for thin-film performance in semiconductor and microelectronic applications.
    • Good Electrical Conductivity: Tungsten’s inherent conductivity is complemented by titanium, making the alloy an ideal choice for electrical applications, such as in semiconductors and thin-film resistors.
    • Mechanical Strength: The alloy’s mechanical strength ensures that WTi thin films are resistant to wear, making them suitable for use in hard coatings and other demanding applications.
  • Yttrium Sputtering Target 99.9%-99.9999% High Purity Yttrium Y Metal Sputtering Targets CustomizedYttrium Sputtering Target 99.9%-99.9999% High Purity Yttrium Y Metal Sputtering Targets Customized

    Y Yttrium Sputtering Target

    Yttrium sputtering targets are essential for producing thin films with high thermal stability, excellent corrosion resistance, and unique electronic or optical properties. Their applications in semiconductors, superconductors, optoelectronics, and advanced materials highlight yttrium’s importance in cutting-edge technology.