Showing 241–246 of 246 results

  • ZnTe Sputtering Targets 3N-6N High Purity Zinc Telluride Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Films Deposition - Tinsan Materials

    ZnTe (Zinc Telluride) Sputtering Targets

    • Optoelectronic Properties: ZnTe is highly valued for its ability to efficiently emit light, making it a key material in optoelectronics and LEDs.
    • High Purity: Available in various purity levels (99.9%, 99.99%, and higher) to ensure high-quality thin films.
    • Thermal Stability: ZnTe maintains its properties under high-temperature conditions, making it suitable for high-performance applications.
    • Customizable Sizes: Available in different diameters and thicknesses for a wide range of sputtering systems.
    • Wide Application Range: Ideal for use in numerous industries, including renewable energy, communications, and infrared sensing.
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  • Zirconium Sputtering Target, 99.9%-99.999% High Purity Zr Metal Sputtering Targets CustomizedZirconium Sputtering Target, 99.9%-99.999% High Purity Zr Metal Sputtering Targets Customized

    Zr Zirconium Sputtering Target

    Zirconium sputtering targets are critical for industries that require materials with exceptional corrosion resistance, high-temperature stability, and biocompatibility, making them indispensable in electronics, aerospace, nuclear, and medical applications.

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  • ZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    ZrB2 (Zirconium Diboride) Sputtering Target

    • High Hardness: ZrB₂ is an extremely hard material, making it ideal for wear-resistant and protective coatings.
    • Thermal Stability: ZrB₂ sputtering targets produce thin films that can withstand high temperatures, making them suitable for use in harsh environments.
    • High Thermal Conductivity: ZrB₂ has excellent thermal conductivity, which is advantageous for heat management in high-performance coatings.
    • Chemical Resistance: ZrB₂ thin films are resistant to chemical attack, especially in high-temperature, corrosive environments.
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  • ZrC Sputtering Target 3N-6N High Purity Zirconium Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    ZrC (Zirconium Carbide) Sputtering Target

    • High Hardness: ZrC is known for its extreme hardness, which contributes to the durability and wear resistance of coatings.
    • Excellent Thermal Conductivity: ZrC is highly conductive, making it suitable for thermal management applications.
    • High Melting Point: ZrC’s melting point of approximately 3,540°C ensures that it performs well in high-temperature environments.
    • Chemical Stability: ZrC films are resistant to oxidation and chemical corrosion, extending the lifespan of coated surfaces.
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  • ZrN Sputtering Target 3N-6N High Purity Zirconium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsZrN Sputtering Target 3N-6N High Purity Zirconium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    ZrN (Zirconium Nitride) Sputtering Target

    • High Hardness: ZrN films exhibit high hardness, making them ideal for protective coatings on cutting tools and wear-resistant applications.
    • Corrosion and Oxidation Resistance: ZrN provides excellent resistance to chemical corrosion and oxidation, ensuring longevity and performance in harsh environments.
    • Golden Color: ZrN coatings have a gold-like appearance, making them popular for decorative purposes.
    • High Thermal Stability: ZrN sputtering targets produce films that can withstand high temperatures, making them suitable for aerospace and semiconductor applications.
    • Good Electrical Conductivity: ZrN is electrically conductive, which allows it to be used in some electronic and microelectronic applications.
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  • ZrO2 Sputtering Target 3N-6N High Purity Zirconium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsZrO2 Sputtering Target 3N-6N High Purity Zirconium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    ZrO2 (Zirconium Dioxide) Sputtering Target

    • High Refractive Index: ZrO₂ has a high refractive index, making it ideal for optical coatings where enhanced light control and reflection properties are needed.
    • Dielectric Properties: ZrO₂ exhibits a high dielectric constant, which is critical for its use in electronic and semiconductor applications.
    • Thermal Stability: ZrO₂ can withstand extreme temperatures, making it suitable for use in high-temperature coatings and thermal barrier applications.
    • Wear Resistance: ZrO₂ films provide excellent hardness and wear resistance, extending the life of coated components in industrial and aerospace environments.
    • Corrosion Resistance: The chemical inertness of ZrO₂ makes it resistant to corrosion, which is important in applications exposed to harsh chemicals or environmental conditions.
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