Showing 61–72 of 244 results

  • CuSe Sputtering Targets 2N5-6N High Purity Copper Selenide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    CuSe (Copper Selenide) Sputtering Targets

    • High Purity: Ensures defect-free deposition for precision applications.
    • Good Electrical Conductivity: Suitable for functional and conductive coatings.
    • Stable Performance: Maintains chemical and thermal stability during sputtering processes.
    • Customizable: Available in various dimensions and shapes for compatibility with sputtering systems.
  • Dysprosium Sputtering Target 99.9%-99.9999% High Purity Dy Metal Sputtering Targets 3N-6N Customized - Tinsan MaterialsDysprosium Sputtering Target 99.9%-99.9999% High Purity Dy Metal Sputtering Targets 3N-6N Customized - Tinsan Materials

    Dy Dysprosium Sputtering Target

    • Purity: Typically available in 99.9% or higher purity to ensure excellent thin film quality.
    • Magnetic Properties: Dysprosium enhances the magnetic performance of thin films, making it ideal for applications that require strong and stable magnetic fields.
    • Thermal Stability: Dy thin films maintain stability at high temperatures, making them suitable for use in thermal management applications.
    • Customization: Available in various shapes, such as discs, plates, and cylinders, to meet the needs of different sputtering systems.
  • Tinsan Materials Erbium Sputtering Target 99.9%-99.999% High Purity Er Sputtering Targets 3N-5N CustomizedTinsan Materials Erbium Sputtering Target 99.9%-99.999% High Purity Er Sputtering Targets 3N-5N Customized

    Er Erbium Sputtering Target

    • Material: High-purity Erbium, typically with a purity level of 99.9% (3N) or higher, ensures minimal impurities during the sputtering process.
    • Form: Erbium sputtering targets are commonly available in the form of discs, rectangular plates, or custom shapes, depending on specific application requirements.
    • Density: The target’s density is critical for achieving consistent deposition rates and high-quality thin films.
    • Applications: These targets are used in applications such as optical amplifiers, lasers, telecommunications, and electronic devices.
  • Er2O3 Sputtering Target 3N-6N High Purity Erbium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Er2O3 (Erbium Oxide) Sputtering Target

    • High Infrared Transparency: Er₂O₃ has excellent transparency in the infrared range, making it a critical material for fiber-optic communications, laser systems, and IR detectors.
    • Optical Amplification: The presence of erbium ions in Er₂O₃ allows for efficient optical amplification in the telecommunications band around 1.55 µm, making it ideal for use in EDFAs.
    • Thermal Stability: Er₂O₃ sputtering targets provide thin films that are thermally stable and chemically inert, suitable for high-temperature applications.
    • Customizability: Er₂O₃ sputtering targets can be customized to meet specific deposition needs, including different geometries, sizes, and purity levels for improved thin-film performance.
  • Eu2O3 Sputtering Target 3N-6N High Purity Europium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Eu2O3 (Europium Oxide) Sputtering Target

    • Strong Luminescence: Eu₂O₃ is widely recognized for its luminescent properties, particularly its emission in the red spectrum, making it ideal for use in display technologies and lighting.
    • Stable Thin Films: Europium oxide thin films provide excellent chemical stability and durability, ensuring long-lasting performance in devices exposed to various environmental conditions.
    • Optical Transparency: Eu₂O₃ exhibits good optical transparency in specific wavelengths, enhancing its performance in optical applications, from phosphors to light-emitting devices.
    • High Purity: High-purity Eu₂O₃ targets (up to 99.99%) ensure optimal performance in thin-film deposition processes, especially in high-tech applications such as displays and optoelectronics.
  • Ferrum Sputtering Target, 99.9%-99.999% High Purity Fe Metal Sputtering Targets CustomizedFerrum Sputtering Target, 99.9%-99.999% High Purity Fe Metal Sputtering Targets Customized

    Fe Iron Ferrum Sputtering Target

    Iron (Fe Ferrum) sputtering targets are essential for industries that rely on the unique magnetic, electrical, and structural properties of iron, making them indispensable in magnetic storage, electronics, industrial coatings, and advanced material applications.

  • Fe2O3 Sputtering Target 3N-6N High Purity Ferrum Iron Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Fe2O3 (Iron Oxide) Sputtering Target

    • High Purity: Fe₂O₃ sputtering targets are available in high-purity formulations to ensure optimal thin film quality for precise applications.
    • Magnetic Properties: The material exhibits ferrimagnetism, making it suitable for magnetic thin films and spintronic applications.
    • Semiconductor Properties: As a semiconductor, Fe₂O₃ is used in photocatalysis and solar cells, where it can absorb sunlight and drive photoelectrochemical reactions.
    • Environmental Stability: Fe₂O₃ is chemically stable and exhibits good performance in a range of environmental conditions, enhancing its use in sensors and energy applications.
  • Fe3O4 Sputtering Targets 3N-6N High Purity Magnetite Magnetic Iron Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsFe3O4 Sputtering Target 3N-6N High Purity Magnetite Magnetic Iron Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Fe3O4 (Magnetite / Iron Oxide) Sputtering Targets

    • High Purity: Guarantees consistent deposition and minimal contamination in thin films.
    • Strong Magnetic Properties: Provides excellent performance in magnetic and spintronic devices.
    • High Electrical Conductivity: Enhances the functionality of conductive thin films.
    • Customizable Dimensions: Manufactured to meet the requirements of diverse sputtering systems.
    • Versatile Material: Suitable for applications ranging from electronics to biomedical engineering.
  • FeCoCrNiMn Alloy Target 99.9%-99.9999% High Purity Ferrum Cobalt Chromium Nickel Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeCoCrNiMn (Ferrum Cobalt Chromium Nickel Manganese) Alloy Target

    • High Entropy Alloy: The near-equal combination of five elements offers unique mechanical and thermal properties, including high strength, excellent wear resistance, and thermal stability.
    • Corrosion Resistance: The alloy’s thin films offer exceptional resistance to oxidation and corrosion, even in harsh environments.
    • Magnetic Properties: FeCoCrNiMn alloy sputtering targets produce films with strong magnetic properties, ideal for magnetic and electronic devices.
    • Customizable Size and Shape: FeCoCrNiMn alloy sputtering targets are available in discs, plates, or custom shapes to meet the requirements of different deposition systems.
  • FeCoTa Alloy Target 99.95%-99.9999% High Purity Ferrum Cobalt Tantalum Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    FeCoTa (Iron Cobalt Tantalum) Alloy Target

    • High Magnetic Saturation: The FeCoTa alloy offers excellent magnetic properties, including high magnetic saturation and low coercivity, making it ideal for use in data storage devices and other applications requiring strong and stable magnetic fields.
    • Thermal Stability: The addition of tantalum enhances the alloy’s thermal stability, allowing FeCoTa thin films to perform reliably in high-temperature environments, such as aerospace and power electronics.
    • Wear Resistance: Tantalum in the alloy also contributes to increased wear resistance, ensuring that the thin films maintain their integrity under mechanical stress and prolonging their lifespan.
    • Corrosion Resistance: The alloy exhibits good resistance to corrosion, making it suitable for applications in harsh or outdoor environments.
    • Customizable Composition: The ratio of Fe, Co, and Ta can be adjusted to optimize magnetic and physical properties for specific applications.
  • FeCr Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Chromium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsFeCr Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Chromium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeCr (Iron Chromium) Alloy Target

    • Corrosion Resistance: The high chromium content in FeCr alloys provides excellent resistance to corrosion, making the alloy ideal for environments exposed to moisture, chemicals, or harsh conditions.
    • Magnetic Properties: FeCr alloys offer stable magnetic properties, making them suitable for use in various magnetic storage and electronic devices.
    • High-Temperature Stability: FeCr thin films maintain their mechanical strength and performance even at elevated temperatures, making them useful for applications in energy, aerospace, and other industries requiring heat-resistant coatings.
    • Wear Resistance: The wear resistance of FeCr thin films ensures long-lasting durability for coated components, reducing wear and tear in mechanical systems and industrial tools.
    • Customizable Composition: The ratio of iron to chromium can be adjusted to optimize the properties such as corrosion resistance, magnetic performance, or wear resistance, based on the application’s specific requirements.
  • FeGa Sputtering Targets 99.9%-99.9999% High Purity Ferrum Iron Gallium Alloy Sputtering Target 3N-6N Customized for Thin Film Deposition - Tinsan Materials

    FeGa (Iron-Gallium) Sputtering Targets

    • High Magnetostriction: FeGa alloys exhibit superior magnetostrictive properties, providing enhanced performance in functional films.
    • Customizable Compositions: Available in various iron-gallium ratios to meet specific application requirements.
    • High Purity: Ensures consistent and reliable thin-film deposition with minimal contamination.
    • Excellent Magnetic Properties: Combines strength and magnetic responsiveness for advanced thin-film applications.
    • Durable and Stable: Provides robust and long-lasting performance in challenging environments.