Showing 73–84 of 244 results

  • FeHf Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Hafnium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsFeHf Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Hafnium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeHf (Iron Hafnium) Alloy Target

    • Magnetic Stability: FeHf alloys offer stable magnetic properties that make them suitable for use in a variety of magnetic devices, especially in high-temperature or harsh environments.
    • Oxidation Resistance: The addition of hafnium significantly improves the alloy’s resistance to oxidation, making FeHf thin films suitable for applications exposed to elevated temperatures and oxidative conditions.
    • High Strength: FeHf alloy thin films provide excellent mechanical strength, ensuring long-term durability and reliability in high-stress environments.
    • Thermal Stability: FeHf alloys maintain their structural integrity and performance even at high temperatures, making them ideal for applications in electronics, aerospace, and industrial settings.
    • Corrosion Resistance: The alloy’s resistance to corrosion allows it to perform well in harsh environments, protecting components from degradation due to moisture, chemicals, and other corrosive elements.
  • FeMn Alloy Target 99.9%-99.9999% High Purity Ferrum Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsFeMn Alloy Target 99.9%-99.9999% High Purity Ferrum Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeMn (Iron Manganese) Alloy Target

    • Magnetic Properties: FeMn alloys exhibit useful magnetic properties, including antiferromagnetism, which makes them suitable for use in a variety of magnetic devices, sensors, and memory technologies.
    • Corrosion Resistance: The alloy provides excellent resistance to corrosion, making it ideal for use in environments exposed to moisture, chemicals, and other corrosive agents.
    • Wear Resistance: FeMn alloy thin films enhance the wear resistance of components, making them more durable under mechanical stress and wear, especially in industrial and mechanical applications.
    • Customizable Composition: The ratio of iron to manganese can be adjusted to tailor the magnetic, mechanical, and corrosion-resistant properties of the thin films for specific applications.
    • High Strength: FeMn thin films exhibit high mechanical strength, making them ideal for applications where both durability and protection are required, especially in harsh environments.
  • FTO Sputtering Targets 3N-6N High Purity Fluorine-doped Tin Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    FTO (Fluorine-doped Tin Oxide) Sputtering Targets

    • High Transparency: Excellent light transmission in the visible spectrum.
    • Superior Conductivity: Low sheet resistance for high-performance electrical applications.
    • Thermal Stability: Performs reliably under high temperatures.
    • Chemical Resistance: Highly resistant to environmental and chemical degradation.
    • Customizable Options: Adaptable to diverse deposition system requirements.
  • GaS Sputtering Target 3N-6N High Purity Gallium Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    GaS (Gallium Sulfide) Sputtering Target

    • Wide Bandgap: GaS possesses a wide bandgap of about 2.5 eV, making it suitable for UV and visible light applications.
    • High Purity: GaS targets are available in high-purity forms to ensure the quality and performance of the deposited films.
    • Layered Structure: The layered nature of GaS allows for easy mechanical exfoliation, enabling the production of high-quality monolayers and thin films.
    • Thermal Stability: GaS exhibits good thermal stability, maintaining its properties during high-temperature processing.
    • Good Electrical Conductivity: GaS is a good electrical conductor, making it valuable in electronic applications.
  • Tinsan Materials Gadolinium Sputtering Target 99.9%-99.9999% High Purity Gd Metal Sputtering Targets 3N-6N CustomizedTinsan Materials Gadolinium Sputtering Target 99.9%-99.9999% High Purity Gd Metal Sputtering Targets 3N-6N Customized

    Gd Gadolinium Sputtering Target

    • Purity: Typically available at 99.9% or higher purity to ensure optimal film quality and performance.
    • Customizable Size and Shape: Gadolinium sputtering targets are available in various forms, such as discs, plates, or cylinders, tailored to specific deposition systems.
    • Magnetic Properties: Gadolinium’s strong magnetic characteristics are highly desirable in magnetic thin films.
    • Oxidation Resistance: Gadolinium can be coated or alloyed to prevent oxidation during sputtering.
  • Gd2O3 Sputtering Target 3N-6N High Purity Gadolinium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsGd2O3 Sputtering Target 3N-6N High Purity Gadolinium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Gd2O3 (Gadolinium Oxide) Sputtering Target

    • High Purity: Available in high-purity levels to ensure the quality of thin films for sensitive electronic and optical applications.
    • Magnetic Properties: Gd₂O₃ exhibits strong magnetic behavior, making it suitable for applications in magnetic storage and spintronic devices.
    • High-k Dielectric: Its high dielectric constant makes Gd₂O₃ ideal for use in semiconductor devices as a gate dielectric material.
    • Thermal Stability: Gd₂O₃ is thermally stable, maintaining its structural integrity and properties during high-temperature processes.
  • GeS Sputtering Targets 3N-6N High Purity Germanium Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    GeS (Germanium Sulfide) Sputtering Targets

    • Semiconducting properties: GeS is a semiconductor with excellent electrical conductivity, ideal for use in electronic and optoelectronic applications.
    • Optical performance: The material exhibits specific optical properties that make it suitable for optoelectronic and sensor devices.
    • High purity: GeS sputtering targets are available in high purity for optimal thin film quality.
    • Customizable: Can be tailored for various applications, with flexibility in composition, size, and target specifications.
  • GeSbTe Sputtering Targets 4N-7N High Purity Germanium Antimony Telluride Ceramic Sputtering Target High Pure 99.99%-99.99999% Customized - Tinsan Materials

    GeSbTe (Germanium Antimony Telluride) Sputtering Targets

    • Phase-change properties: GeSbTe materials can change from an amorphous to a crystalline state, making them suitable for high-speed data storage.
    • High thermal stability: Provides reliable performance under a wide range of temperatures.
    • Good electrical and optical properties: Offers optimal conductivity and transparency needed for memory and optical devices.
    • Customization: Available in various compositions and dimensions, meeting specific application requirements.
  • GeSe2 Sputtering Target 99.9%-99.9999% High Purity Germanium Selenium Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan Materials

    GeSe2 (Germanium Selenium) Sputtering Targets

    • Infrared Transparency: GeSe₂ offers excellent transmission in the infrared spectrum, making it suitable for IR optics and photonic applications.
    • Phase-Change Properties: GeSe₂ is a key material in phase-change memory technology, providing the ability to switch between different states under thermal or electrical stimuli.
    • Chemical and Thermal Stability: GeSe₂ thin films exhibit strong chemical resistance and can withstand high temperatures, ensuring longevity and performance in harsh conditions.
    • High Refractive Index: GeSe₂ has a high refractive index, making it suitable for optical applications requiring materials with specific light-bending capabilities.
  • GZO Sputtering Targets 3N-6N High Purity Gallium-doped Zinc Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    GZO (Gallium-doped Zinc Oxide) Sputtering Targets

    • Transparent Conductivity: GZO has a high optical transparency in the visible range while maintaining excellent electrical conductivity.
    • High Carrier Mobility: Gallium doping improves the carrier mobility in the Zinc Oxide structure, leading to enhanced performance in electrical applications.
    • Low Resistivity: The addition of Gallium significantly reduces the resistivity of the material, making it suitable for transparent electrodes.
    • Durability: GZO sputtering targets provide long-lasting performance in deposition processes, ensuring high-quality thin films with uniform characteristics.
    • Versatility: Suitable for both DC and RF sputtering techniques, making them versatile for different deposition equipment.
  • HfB2 Sputtering Targets 2N5-6N High Purity Hafnium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan MaterialsHfB2 Sputtering Targets 2N5-6N High Purity Hafnium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customize - Tinsan Materials

    HfB2 (Hafnium Diboride) Sputtering Targets

    • High Purity: Ensures reliable deposition results with minimal impurities.
    • Thermal Resistance: Outstanding stability under extreme temperatures.
    • High Hardness: Provides superior durability for wear-resistant coatings.
    • Electrical Conductivity: Suitable for conductive thin-film applications.
    • Custom Configurations: Flexible options to meet specific deposition requirements.
  • HfC Sputtering Targets 2N5-5N High Purity Hafnium Carbide Ceramic Sputtering Target High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    HfC (Hafnium Carbide) Sputtering Targets

    • High Purity: Available in purities of 99.5% or higher to ensure optimal film quality.
    • Thermal Stability: Exceptional resistance to high temperatures and thermal stress.
    • Mechanical Strength: High hardness and excellent wear resistance.
    • Oxidation Resistance: Stable in extreme environments.