Showing 97–108 of 244 results

  • IWO Sputtering Targets 3N-6N High Purity Indium Tungsten Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan MaterialsIWO Sputtering Targets 3N-6N High Purity Indium Tungsten Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    IWO (Indium Tungsten Oxide) Sputtering Targets

    • High Optical Transparency: Enables the creation of efficient transparent films.
    • Superior Conductivity: Provides excellent electrical performance for electronic applications.
    • Thermal and Chemical Stability: Ensures reliability in high-temperature and reactive environments.
    • Customizable Material Composition: Optimized for specific TCO requirements.
    • Compatibility: Suitable for RF and DC sputtering systems.
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  • Lanthanum Sputtering Target 99.9%-99.9999% High Purity La Metal Sputtering Targets 3N-6N CustomizedLanthanum Sputtering Target 99.9%-99.9999% High Purity La Metal Sputtering Targets 3N-6N Customized

    La Lanthanum Sputtering Target

    Lanthanum sputtering targets are crucial for creating thin films with specific electronic, optical, and catalytic properties, making them valuable in advanced technologies such as semiconductors, optics, superconductors, and energy storage systems. Despite its reactivity, lanthanum’s unique characteristics provide significant advantages in various high-tech industrial and scientific applications.

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  • La2O3 Sputtering Target 3N-6N High Purity Lanthanum Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    La2O3 (Lanthanum Oxide) Sputtering Target

    • High Dielectric Constant: La₂O₃ exhibits a high dielectric constant, making it an excellent material for advanced electronic components, such as gate dielectrics in MOSFETs.
    • High Refractive Index: Its high refractive index makes it ideal for enhancing optical properties in coatings for lenses, filters, and other precision optical devices.
    • Thermal and Chemical Stability: La₂O₃ is highly stable under extreme temperatures and chemically resistant, making it suitable for high-performance applications.
    • Catalytic Efficiency: Lanthanum oxide’s catalytic properties are leveraged in thin films used for environmental and energy applications.
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  • LaAlO3 Sputtering Targets 3N-6N High Purity Lanthanum Aluminate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LaAlO3 (Lanthanum Aluminate) Sputtering Targets

    • High Dielectric Constant: LaAlO₃ has a high dielectric constant (k-value), which enhances its performance in capacitors and other high-k dielectric applications.
    • Thermal Stability: LaAlO₃ exhibits excellent thermal stability, making it ideal for high-temperature processing and devices that operate in extreme environments.
    • Structural Integrity: The perovskite structure of LaAlO₃ contributes to its high mechanical strength and chemical stability, ensuring long-lasting performance in demanding applications.
    • Oxide Electronics: LaAlO₃ is widely used in complex oxide electronics due to its ability to form high-quality interfaces with other materials like SrTiO₃ and LaNiO₃.
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  • LaB6 Sputtering Targets 2N5-6N High Purity Lanthanum Hexaboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan MaterialsLaB6 Sputtering Targets 2N5-6N High Purity Lanthanum Hexaboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customize - Tinsan Materials

    LaB6 (Lanthanum Hexaboride) Sputtering Targets

    • High Thermal Stability: Performs well in high-temperature environments.
    • Superior Electrical Conductivity: Ideal for electronic and thermionic applications.
    • Low Work Function: Enables efficient electron emission.
    • Oxidation Resistance: Long-lasting performance under challenging conditions.
    • Customizable Specifications: Tailored to meet specific application needs.
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  • Lanthanum Lithium Titanate Sputtering Targets 3N-6N High Purity LLT Li3La2Ti3O12 Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Lanthanum Lithium Titanate (LLT, Li3La2Ti3O12) Sputtering Targets

    • Exceptional Ionic Conductivity: Enhances energy transfer in battery technologies.
    • Stable and Durable: Chemically stable under a wide range of operating conditions.
    • High Dielectric Constant: Ideal for electronic and capacitor applications.
    • Customizable: Available in multiple sizes, shapes, and purity levels to meet specific application needs.
    • Compatible: Works efficiently with various sputtering deposition systems.
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  • Li3PO4 Sputtering Targets 3N-6N High Purity Lithium Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Li3PO4 (Lithium Phosphate) Sputtering Targets

    • High Purity: Guarantees low contamination for critical applications.
    • Chemical Stability: Resistant to degradation, ensuring durable coatings.
    • Superior Ionic Conductivity: Optimal for battery and energy storage films.
    • Consistent Deposition: Ensures uniform and reliable thin-film performance.
    • Customizable Dimensions: Adaptable to different sputtering systems and requirements.
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  • Li4Ti5O12 Sputtering Target 3N-6N High Purity Lithium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLi4Ti5O12 Sputtering Target 3N-6N High Purity Lithium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Li4Ti5O12 (Lithium Titanium Oxide) Sputtering Target

    • High Stability: Li₄Ti₅O₁₂ has excellent chemical and structural stability, making it an ideal material for long-lasting energy storage devices.
    • Low Volume Expansion: This material shows minimal expansion and contraction during charge/discharge cycles, improving battery longevity.
    • Thermal Safety: Li₄Ti₅O₁₂ has a high thermal stability, reducing the risk of overheating in energy storage devices.
    • Fast Charging Capability: The material is recognized for its fast charge/discharge properties, making it suitable for high-performance batteries.
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  • LiCoO2 Sputtering Target 3N-6N High Purity Lithium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiCoO2 Sputtering Target 3N-6N High Purity Lithium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiCoO2 (Lithium Cobalt Oxide) Sputtering Target

    • High Energy Density: LiCoO₂ has a high theoretical energy density, making it an ideal material for battery cathodes, especially in high-performance applications like electric vehicles and portable electronics.
    • Stable Structure: The layered crystal structure of LiCoO₂ contributes to its stable electrochemical performance, which is crucial for the long-term operation of lithium-ion batteries.
    • Excellent Cycling Performance: LiCoO₂ can undergo many charge and discharge cycles without significant degradation, ensuring reliable performance in rechargeable battery systems.
    • Thin Film Deposition: LiCoO₂ sputtering targets allow for the precise deposition of thin films in applications requiring uniform coatings, such as in thin-film batteries and microelectronics.
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  • LiF Sputtering Target 3N-6N High Purity Lithium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiF (Lithium Fluoride) Sputtering Target

    • High Optical Transparency: LiF has high optical transparency in the UV, visible, and infrared regions, making it an excellent material for optical coatings and components.
    • Wide Bandgap: LiF has a wide bandgap (~13.6 eV), which makes it an excellent insulating material in electronic and optoelectronic applications.
    • Low Absorption: LiF thin films exhibit low absorption across a broad spectral range, making them ideal for applications where minimal light loss is required.
    • Chemical Stability: LiF is chemically stable and resistant to moisture, which contributes to its durability in harsh environments and long-lasting performance in thin-film coatings.
    • Insulating Properties: LiF has excellent insulating properties, which are beneficial for electronic and optoelectronic devices where electrical isolation is needed.
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  • LiFePO4 Sputtering Targets 3N-6N High Purity Lithium Iron Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiFePO4 Sputtering Targets 3N-6N High Purity Lithium Iron Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    LiFePO4 (Lithium Iron Phosphate) Sputtering Targets

    • High Purity: Ensures minimal impurities, delivering superior film quality.
    • Thermal Stability: Provides consistent performance under varying conditions.
    • Safety Profile: Stable chemistry reduces risks of thermal runaway.
    • Customizable Dimensions: Tailored to fit a range of sputtering systems.
    • Reliable Deposition: Delivers uniform and high-quality thin films.
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  • LiNbO3 Sputtering Target 3N-6N High Purity Lithium Niobate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiNbO3 Sputtering Target 3N-6N High Purity Lithium Niobate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiNbO3 (Lithium Niobate) Sputtering Target

    • High Electro-optic Coefficient: LiNbO₃ has a high electro-optic coefficient, enabling efficient modulation of light in waveguides, modulators, and telecommunications devices.
    • Excellent Piezoelectric Properties: LiNbO₃’s strong piezoelectric response makes it ideal for use in SAW devices, sensors, and actuators, providing high sensitivity and control.
    • Nonlinear Optical Capabilities: LiNbO₃ is widely used for frequency conversion and other nonlinear optical applications due to its strong nonlinear optical response.
    • Ferroelectric Behavior: LiNbO₃’s ferroelectric properties are valuable in memory devices and data storage, enabling the development of non-volatile memory technologies.
    • Stable and Durable Thin Films: LiNbO₃ thin films exhibit high thermal and chemical stability, making them suitable for use in demanding environments and high-performance applications.
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