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  • Barium Sputtering Target, 99.9% High Purity Ba Sputtering Target Customized

    Ba Barium Sputtering Target

    Barium (Ba) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, particularly sputtering, to create thin films on various substrates. Barium targets are typically used in the production of optical coatings, semiconductor devices, and other advanced materials due to their unique properties.

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  • BaTiO3 Pellets Evaporation Materials 3N-6N High Purity Barium Titanate Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    BaTiO3 (Barium Titanate / Barium Titanium Oxide) Pellets Granules Evaporation Materials

    • High purity (≥99.99%).
    • Outstanding dielectric and ferroelectric properties.
    • Suitable for thin-film deposition techniques such as PVD.
    • Uniform pellet size for consistent results in industrial and research settings.
    • Custom sizes and packaging available.
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  • BaTiO3 Sputtering Target 3N-7N High Purity Barium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan Materials

    BaTiO3 (Barium Titanium Oxide) Sputtering Target

    • High Dielectric Constant: BaTiO₃ is known for its exceptionally high dielectric constant, making it ideal for capacitors and electro-optic applications.
    • Ferroelectric and Piezoelectric Properties: The material exhibits both ferroelectric and piezoelectric behaviors, making it suitable for memory devices, sensors, and actuators.
    • Excellent Thermal Stability: BaTiO₃ maintains good thermal stability, ensuring reliable performance in high-temperature environments.
    • High Purity and Low Defects: BaTiO₃ sputtering targets are available in high-purity grades (up to 99.999%), ensuring low defect densities in the deposited thin films, which is crucial for advanced electronic applications.
    • Custom Composition: Barium Titanate can be tailored with dopants to modify its electrical and thermal properties, optimizing performance for specific applications.
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  • BST Sputtering Target 3N-6N High Purity Barium Strontium Titanium BaSrTiO3 Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsBST Sputtering Target 3N-6N High Purity Barium Strontium Titanium BaSrTiO3 Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    BST (BaSrTiO3 Barium Strontium Titanium) Sputtering Target

    • High Dielectric Constant: BST has an exceptionally high dielectric constant, which can be adjusted by varying the Ba/Sr ratio, making it ideal for capacitive applications.
    • Tunable Properties: The dielectric constant of BST is voltage-tunable, which is valuable in applications that require adjustable electronic properties, such as tunable filters or phased array antennas.
    • Ferroelectric and Pyroelectric: BST exhibits both ferroelectric and pyroelectric properties, making it useful in memory devices and sensors.
    • Thermal Stability: BST thin films maintain good stability under high temperatures, which is important for applications in electronics and microwave systems.
    • Customizable Composition: The Ba/Sr ratio can be tailored to optimize specific properties, such as tunability, dielectric constant, and thermal stability, for different applications.
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