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  • Erbium Granules Evaporation Material 3N-6N High Purity Metal Er Pellets Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Er Erbium Pellets Granules Evaporation Materials

    • Infrared Absorption and Emission: Erbium’s most notable feature is its strong absorption and emission in the infrared spectrum, particularly around 1.55 microns, making it valuable for optical communication.
    • High Thermal Stability: Erbium is thermally stable, which makes it suitable for deposition processes that require high temperatures.
    • Low Toxicity: Compared to some other rare-earth metals, Erbium is considered to have low toxicity, making it safer for applications in medical devices.
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  • Er Erbium Powder 3N-6N High Purity Er Nanopowder Nano Erbium Powder Nanoparticles High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Er Erbium Powder 5N (99.999%)

    • Optical Properties: Erbium ions (Er³⁺) have characteristic light emission properties, particularly in the near-infrared region (around 1.54 µm), making them ideal for use in fiber optic communication and lasers.
    • High Absorption Cross Section: Erbium has a high absorption cross section, making it highly efficient for use in optical amplifiers and laser systems.
    • Thermal Stability: Erbium compounds and alloys demonstrate excellent thermal stability, making them suitable for high-temperature environments, including nuclear applications.
    • Corrosion Resistance: When alloyed with other metals, erbium enhances corrosion resistance, contributing to the longevity and durability of metal components in various industries.
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  • Tinsan Materials Erbium Sputtering Target 99.9%-99.999% High Purity Er Sputtering Targets 3N-5N CustomizedTinsan Materials Erbium Sputtering Target 99.9%-99.999% High Purity Er Sputtering Targets 3N-5N Customized

    Er Erbium Sputtering Target

    • Material: High-purity Erbium, typically with a purity level of 99.9% (3N) or higher, ensures minimal impurities during the sputtering process.
    • Form: Erbium sputtering targets are commonly available in the form of discs, rectangular plates, or custom shapes, depending on specific application requirements.
    • Density: The target’s density is critical for achieving consistent deposition rates and high-quality thin films.
    • Applications: These targets are used in applications such as optical amplifiers, lasers, telecommunications, and electronic devices.
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  • Er2O3 Pellets Evaporation Materials 3N-6N High Purity Erbium Oxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan MaterialsEr2O3 Pellets Evaporation Materials 3N-6N High Purity Erbium Oxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customize - Tinsan Materials

    Er2O3 (Erbium Oxide) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Outstanding thermal and chemical stability.
    • Superior optical properties for infrared applications.
    • Uniform pellet size for reliable thin-film deposition.
    • Customizable specifications to meet specific requirements.
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  • Er2O3 Powder 3N-6N High Purity Erbium Oxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Er2O3 (Erbium Oxide) Powder

    • High Purity: Guarantees consistent performance in specialized applications.
    • Unique Optical Properties: Displays excellent fluorescence in infrared regions.
    • Thermal Stability: Retains structural integrity at high temperatures.
    • Low Phonon Energy: Ideal for laser and optical amplification.
    • Versatile Applications: Suited for ceramics, glass, and optical devices.
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  • Er2O3 Sputtering Target 3N-6N High Purity Erbium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Er2O3 (Erbium Oxide) Sputtering Target

    • High Infrared Transparency: Er₂O₃ has excellent transparency in the infrared range, making it a critical material for fiber-optic communications, laser systems, and IR detectors.
    • Optical Amplification: The presence of erbium ions in Er₂O₃ allows for efficient optical amplification in the telecommunications band around 1.55 µm, making it ideal for use in EDFAs.
    • Thermal Stability: Er₂O₃ sputtering targets provide thin films that are thermally stable and chemically inert, suitable for high-temperature applications.
    • Customizability: Er₂O₃ sputtering targets can be customized to meet specific deposition needs, including different geometries, sizes, and purity levels for improved thin-film performance.
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