Showing 13–24 of 27 results

  • MoO2 Sputtering Targets 3N-6N High Purity Molybdenum Dioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    MoO2 (Molybdenum Dioxide) Sputtering Targets

    • High Purity: Guarantees superior film quality and reduces impurities.
    • Excellent Conductivity: Suitable for applications requiring conductive thin films.
    • Thermal Stability: Performs reliably in high-temperature environments.
    • Customizable Specifications: Tailored to specific sputtering system requirements.
    • Versatility: Compatible with various sputtering techniques, including RF and DC.
  • MoO3 Pellets Evaporation Material 4N-6N High Purity Molybdenum Trioxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized - Tinsan Materials

    MoO3 (Molybdenum Trioxide) Pellets Granules Evaporation Materials

    • High Optical Transparency: MoO₃ is transparent in the visible spectrum and is often used in optoelectronic devices that require high transparency and conductivity.
    • Excellent Electrical Conductivity: MoO₃ is often used to improve charge injection in electronic devices, particularly in organic electronic applications.
    • Thermal Stability: It has a high melting point (~795°C), making it suitable for high-temperature evaporation processes.
    • Chemical Properties: MoO₃ is known for its oxidation properties, making it useful in catalysis and other chemical applications.
    • Layer Uniformity: When used in deposition processes, MoO₃ can form highly uniform thin films with excellent adhesion properties.
  • MoO3 Powder 3N-5N High Purity Molybdenum Trioxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.999% Customized - Tinsan Materials

    MoO3 (Molybdenum Trioxide) Powder

    • High Purity: Ensures reliable performance in sensitive applications.
    • Thermal Stability: Withstands high-temperature environments.
    • Oxidizing Agent: Ideal for catalytic and chemical synthesis.
    • Semiconducting Properties: Applicable in electronic devices.
    • Customizable Particle Sizes: Nano to micrometer scales available.
    • Excellent Optical Transparency: Suitable for optical coatings and devices.
  • MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsMoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoO3 (Molybdenum Trioxide) Sputtering Target

    • High Work Function: MoO₃ is known for its high work function, which makes it ideal for applications requiring efficient charge injection or extraction, such as OLEDs and OPVs.
    • Excellent Catalytic Properties: MoO₃ is a robust catalyst, especially in oxidation reactions, making it suitable for industrial chemical processes and catalytic thin films.
    • Electrochromic Behavior: MoO₃’s ability to undergo reversible oxidation-reduction reactions makes it ideal for use in electrochromic devices.
    • Optical Transparency: MoO₃ thin films can be transparent in the visible and near-infrared regions, which is beneficial for optoelectronic devices requiring transparent electrodes or coatings.
  • MoRe Sputtering Targets 99.9%-99.9999% High Purity Molybdenum Rhenium Alloy Sputtering Target 3N-6N Customized - Tinsan Materials

    MoRe (Molybdenum Rhenium) Sputtering Targets

    • High Thermal Stability: Performs exceptionally well in extreme temperature environments.
    • Enhanced Ductility: Improved mechanical performance over pure molybdenum.
    • Excellent Conductivity: Ensures reliable electrical and thermal performance.
    • Customizable Options: Tailored to meet the specific requirements of various deposition systems.
    • Corrosion Resistance: Long-lasting performance in aggressive environments.
  • MoS2 Pellets Evaporation Material 3N-6N High Purity Molybdenum Disulfide Granules Particles for Coating High Pure 99.9%-99.9999% Customize - Tinsan MaterialsMoS2 Pellets Evaporation Material 3N-6N High Purity Molybdenum Disulfide Granules Particles for Coating High Pure 99.9%-99.9999% Customized From Tinsan Materials

    MoS2 (Molybdenum Disulfide) Pellets Granules Evaporation Materials

    • Layered Structure: MoS₂ has a unique layered structure, allowing for exfoliation into single or few layers, making it ideal for 2D material applications.
    • Semiconductor Properties: MoS₂ is a semiconductor with a direct bandgap (~1.8 eV for monolayers), making it suitable for nanoscale transistors and photodetectors.
    • Low Friction Coefficient: Its excellent lubrication properties make MoS₂ ideal for coatings that require low friction and high durability, especially in vacuum or extreme conditions.
    • Thermal Stability: MoS₂ remains stable at high temperatures, ensuring its effectiveness in harsh environments.
    • Corrosion Resistance: MoS₂ provides a protective, corrosion-resistant layer in various applications, extending the life of coated components.
  • MoS2 Sputtering Target 3N-6N High Purity Molybdenum Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsMoS2 Sputtering Target 3N-6N High Purity Molybdenum Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoS2 (Molybdenum Disulfide) Sputtering Target

    • Layered Structure: MoS2 has a unique layered structure that contributes to its mechanical, electrical, and tribological properties, making it an excellent candidate for advanced coatings and devices.
    • Semiconducting Properties: MoS2 is a semiconductor with a direct bandgap in its monolayer form, offering high performance in electronic devices such as transistors and photodetectors.
    • Low Friction Coefficient: As a solid lubricant, MoS2 provides a low friction coefficient, making it useful in harsh environments where liquid lubricants are impractical.
    • High Thermal and Chemical Stability: MoS2 films exhibit excellent thermal and chemical stability, enabling their use in high-temperature environments and chemically aggressive conditions.
  • MoSe2 Sputtering Targets 3N-6N High Purity Molybdenum Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsMoSe2 Sputtering Targets 3N-6N High Purity Molybdenum Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    MoSe2 (Molybdenum Diselenide) Sputtering Targets

    • High Purity: Ensures superior thin-film quality and device performance.
    • Layered Structure: Facilitates easy exfoliation and 2D material synthesis.
    • Stable Chemical Composition: Provides consistent results across various deposition processes.
    • Excellent Optical and Electrical Properties: Ideal for advanced electronics and optoelectronics.
    • Custom Configurations: Available in tailored sizes, shapes, and thicknesses for specific requirements.
  • MoSi2 Powder 2N-5N High Purity Molybdenum Disilicide Nanopowder Nano Powder Nanoparticles High Pure 99%-99.999% Customized - Tinsan Materials

    MoSi2 (Molybdenum Disilicide) Powder

    • High Melting Point: Excellent stability at temperatures up to 1900°C.
    • Superior Oxidation Resistance: Forms a protective silica (SiO₂) layer at high temperatures.
    • Good Electrical Conductivity: Suitable for heating element production.
    • Corrosion Resistance: Performs well in oxidative and corrosive environments.
    • Low Density: Lightweight yet durable for advanced material designs.
  • MoSi2-Sputtering-Targets-2N5-6N-High-Purity-Molybdenum-Disilicide-Ceramic-Sputtering-Target-High-Pure-99.5-99.9999-Customized-for-Thin-film-Deposition-Tinsan-Materials

    MoSi2 (Molybdenum Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Operates efficiently in high-temperature environments.
    • High Purity Levels: Ensures superior film quality with minimal defects.
    • Oxidation Resistance: Suitable for protective coatings in harsh conditions.
    • Electrical Conductivity: Ideal for use in electronic and semiconductor applications.
    • Customizable Options: Targets tailored to specific industrial or research needs.
  • MoTa Alloy Target 99.9%-99.9999% High Purity Molybdenum Tantalum Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsMoTa Alloy Target 99.9%-99.9999% High Purity Molybdenum Tantalum Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    MoTa (Molybdenum Tantalum) Alloy Target

    • High Mechanical Strength: The combination of molybdenum and tantalum results in an alloy with excellent tensile strength, making it ideal for demanding structural applications.
    • Thermal Stability: MoTa alloys maintain their mechanical properties at elevated temperatures, making them suitable for high-temperature applications, such as coatings for turbine components.
    • Oxidation and Corrosion Resistance: The alloy exhibits outstanding resistance to oxidation and corrosion, ensuring long-term performance in harsh environments.
    • Customizable Composition: The molybdenum-to-tantalum ratio can be tailored to optimize the properties of the alloy for specific applications, enhancing strength, thermal stability, or corrosion resistance.
  • MoTe2 Sputtering Target 3N-6N High Purity Molybdenum Ditelluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoTe2 (Molybdenum Ditelluride) Sputtering Target

    • Phase Tunability: MoTe₂ can transition between semiconducting and metallic phases, offering versatility in different electronic and optoelectronic applications.
    • High Photoresponse: MoTe₂ thin films are highly responsive to light, especially in the infrared spectrum, making them ideal for photodetectors and imaging devices.
    • 2D Material Properties: As a layered material, MoTe₂ offers exceptional flexibility and mechanical properties, enabling its use in cutting-edge flexible electronics.
    • Thermoelectric Efficiency: MoTe₂ is suitable for thermoelectric applications due to its ability to efficiently convert heat into electricity.