Showing 25–29 of 29 results

  • SiO2 Pellets Evaporation Material 4N-6N High Purity Silicon Dioxide Granules Particles for Coating High Pure 99.99%-99.9999% Customize - Tinsan MaterialsSiO2 Pellets Evaporation Material 4N-6N High Purity Silicon Dioxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized From Tinsan Materials

    SiO2 (Silicon Dioxide) Pellets Granules Evaporation Materials

    • High Transparency: SiO2 is transparent across a wide spectral range, from UV to IR, making it ideal for optical applications.
    • Excellent Insulating Properties: With high dielectric strength and low electrical conductivity, SiO2 is a perfect insulator for microelectronics and semiconductor applications.
    • High Melting Point: SiO2 has a melting point of approximately 1,713°C, making it suitable for high-temperature deposition processes.
    • Chemical Stability: SiO2 is highly resistant to most acids, bases, and solvents, offering long-lasting protective coatings.
    • Mechanical Strength: It provides excellent hardness and durability, ensuring the stability and longevity of thin films.
  • SiO2 Sputtering Target 99.9%-99.9999% High Purity Silicon Dioxide Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan MaterialsSiO2 Sputtering Target 99.9%-99.9999% High Purity Silicon Dioxide Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan Materials

    SiO2 (Silicon Dioxide) Sputtering Targets

    • Excellent Insulator: SiO₂ has a high dielectric strength, making it a perfect insulating material for electronic devices and integrated circuits.
    • High Optical Transparency: SiO₂ is highly transparent in the UV, visible, and near-IR regions, making it suitable for optical coatings and protective layers.
    • Chemical Stability: SiO₂ exhibits strong chemical resistance, ensuring that deposited films are durable and stable under harsh environmental conditions.
    • Thermal Stability: Silicon Dioxide can withstand high temperatures, making it reliable for use in applications that involve thermal stress.
    • Hardness: SiO₂ provides a protective layer that is scratch-resistant and durable, making it ideal for surface coatings.
  • TiSi2 Sputtering Targets 3N-6N High Purity Titanium Silicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    TiSi2 (Titanium Silicide) Sputtering Targets

    • High Electrical Conductivity: Enables efficient current flow in thin films.
    • Thermal Stability: Performs well under high-temperature conditions.
    • High Purity: Ensures minimal impurities for precise and reliable deposition.
    • Versatility: Suitable for a wide range of deposition techniques, including magnetron sputtering.
    • Customizable Specifications: Tailored to meet the demands of diverse applications.
  • VSi2 Sputtering Targets 3N-6N High Purity Vanadium Disilicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VSi2 (Vanadium Disilicide) Sputtering Targets

    • Superior Electrical Conductivity: VSi₂ is an excellent conductor of electricity, making it ideal for applications where conductive coatings are required.
    • High Thermal Stability: The material maintains its integrity under high temperatures, making it suitable for high-temperature applications.
    • Hardness and Durability: Known for its wear resistance, VSi₂ is used in applications that demand exceptional durability and surface hardness.
    • Corrosion Resistance: Offers good resistance to corrosion, particularly in aggressive environments.
    • Customizable Sizes: Available in various sizes and thicknesses to meet specific application requirements.
  • WSi2 Sputtering Targets 2N5-6N High Purity Tungsten Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    WSi2 (Tungsten Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Withstands high-temperature operations.
    • High Electrical Conductivity: Ideal for conductive and resistive layers.
    • Oxidation Resistance: Reliable performance in harsh environments.
    • High Purity: Ensures uniform deposition and minimal contamination.
    • Customizability: Available in various dimensions and purities to suit specific needs.