Showing 13–24 of 26 results

  • Silicon Pellets Evaporation Material 3N-7N High Purity Si Granules Particles for Coating High Pure 99.9%-99.99999% Customized - Tinsan MaterialsSilicon Pellets Evaporation Material 3N-7N High Purity Si Granules Particles for Coating High Pure 99.9%-99.99999% Customize - Tinsan Materials

    Si Silicon Pellets 7N (99.99999%) Granules Evaporation Materials

    • High Purity: Silicon pellets typically have a purity of ≥ 99.9%, ensuring high-quality thin-film deposition with minimal contamination.
    • Semiconductor Properties: Silicon’s intrinsic semiconducting properties make it crucial for electronic and optoelectronic applications.
    • Thermal Stability: Silicon can withstand high temperatures during deposition, providing stable and uniform films.
    • Infrared Transparency: Silicon exhibits excellent transparency in the infrared (IR) range, making it suitable for IR optics and coatings.
    • Easy Evaporation: Silicon pellets are easily evaporated using thermal or electron-beam evaporation techniques, allowing for precise control in thin-film deposition.
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  • Silicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan MaterialsSilicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan Materials

    Si Silicon Sputtering Targets

    • Purity: Silicon sputtering targets are typically available in high purity (99.999% or higher) to ensure high-performance film deposition, particularly in sensitive semiconductor applications.
    • Electrical Properties: Silicon is an intrinsic semiconductor, and thin films made from silicon offer excellent electrical characteristics for electronic and optoelectronic devices.
    • Thermal Conductivity: Silicon’s thermal properties make it ideal for applications where heat dissipation is important, such as in power electronics and solar cells.
    • Customizable Size and Shape: Silicon sputtering targets come in various forms, including discs, plates, and custom shapes to fit different deposition systems.
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  • Si2Te3 Sputtering Targets 2N5-6N High Purity Silicon Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Si2Te3 (Silicon Telluride) Sputtering Targets

    • High Purity: Ensures minimal contamination and consistent deposition performance.
    • Optimal Stoichiometry: Precisely controlled Si and Te ratio for superior material properties.
    • Wide Compatibility: Suitable for various deposition techniques, including PVD and sputtering.
    • Excellent Film Properties: Supports the production of uniform, high-quality thin films.
    • Customizable Options: Flexible sizes and shapes to fit diverse sputtering systems.
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  • Si3N4 Pellets Evaporation Materials 3N-6N High Purity Silicon Nitride Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Pellets Evaporation Materials 3N-6N High Purity Silicon Nitride Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customize - Tinsan Materials

    Si3N4 (Silicon Nitride) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Outstanding thermal and mechanical stability.
    • Uniform pellet size for precise deposition.
    • Customizable sizes and specifications.
    • Superior resistance to oxidation, corrosion, and wear.
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  • Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Sputtering Target

    • High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
    • Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
    • Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
    • Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
    • Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.
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  • SiC Pellets Evaporation Material 3N-6N High Purity Silicon Carbide Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SiC (Silicon Carbide) Pellets Granules Evaporation Materials

    • High Hardness: SiC is one of the hardest materials available, making it ideal for protective coatings and abrasive applications.
    • High Thermal Conductivity: SiC efficiently dissipates heat, making it suitable for high-temperature coatings in optical and electronic devices.
    • Chemical Stability: SiC is highly resistant to corrosion and oxidation, which is beneficial for coatings in harsh environments.
    • Wide Bandgap: In electronics, SiC thin films enable higher efficiency in power management and thermal resistance.
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  • SiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    SiC (Silicon Carbide) Sputtering Targets

    • Exceptional Hardness: Ideal for durable, wear-resistant coatings.
    • High Thermal Stability: Performs well under extreme temperatures.
    • Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
    • Chemical Resistance: Resilient to corrosive environments.
    • Customizable Configurations: Available in various sizes, purities, and bonding options.
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  • SiO Pellets Evaporation Material 3N-6N High Purity Silicon Monoxide Granules Particles for Coating High Pure 99.9%-99.9999% Customize - Tinsan MaterialsSiO Pellets Evaporation Material 3N-6N High Purity Silicon Monoxide Granules Particles for Coating High Pure 99.9%-99.9999% Customized From Tinsan Materials

    SiO (Silicon Monoxide) Pellets Granules Evaporation Materials

    • High Purity: SiO pellets are typically manufactured with a purity of 99.9% or higher to ensure high-quality film deposition.
    • Transparency in UV and Visible Range: SiO has good transmission properties in both the UV and visible light spectrum, making it suitable for optical applications.
    • Hard and Durable Coating: Coatings formed from SiO are known for their hardness and durability, providing a protective layer for sensitive optical and electronic devices.
    • Excellent Adhesion: SiO films exhibit strong adhesion to substrates, which is crucial for long-lasting coatings.
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  • SiO Sputtering Targets 3N-6N High Purity Silicon Monoxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SiO (Silicon Monoxide) Sputtering Targets

    • High Purity: Ensures superior film quality and consistent performance.
    • Wide Optical Transparency: Suitable for coatings across UV, visible, and IR ranges.
    • Stable and Durable: High thermal and chemical stability for demanding processes.
    • Customizable Options: Available in various sizes, purities, and configurations.
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  • SiO2 Pellets Evaporation Material 4N-6N High Purity Silicon Dioxide Granules Particles for Coating High Pure 99.99%-99.9999% Customize - Tinsan MaterialsSiO2 Pellets Evaporation Material 4N-6N High Purity Silicon Dioxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized From Tinsan Materials

    SiO2 (Silicon Dioxide) Pellets Granules Evaporation Materials

    • High Transparency: SiO2 is transparent across a wide spectral range, from UV to IR, making it ideal for optical applications.
    • Excellent Insulating Properties: With high dielectric strength and low electrical conductivity, SiO2 is a perfect insulator for microelectronics and semiconductor applications.
    • High Melting Point: SiO2 has a melting point of approximately 1,713°C, making it suitable for high-temperature deposition processes.
    • Chemical Stability: SiO2 is highly resistant to most acids, bases, and solvents, offering long-lasting protective coatings.
    • Mechanical Strength: It provides excellent hardness and durability, ensuring the stability and longevity of thin films.
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  • SiO2 Sputtering Target 99.9%-99.9999% High Purity Silicon Dioxide Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan MaterialsSiO2 Sputtering Target 99.9%-99.9999% High Purity Silicon Dioxide Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan Materials

    SiO2 (Silicon Dioxide) Sputtering Targets

    • Excellent Insulator: SiO₂ has a high dielectric strength, making it a perfect insulating material for electronic devices and integrated circuits.
    • High Optical Transparency: SiO₂ is highly transparent in the UV, visible, and near-IR regions, making it suitable for optical coatings and protective layers.
    • Chemical Stability: SiO₂ exhibits strong chemical resistance, ensuring that deposited films are durable and stable under harsh environmental conditions.
    • Thermal Stability: Silicon Dioxide can withstand high temperatures, making it reliable for use in applications that involve thermal stress.
    • Hardness: SiO₂ provides a protective layer that is scratch-resistant and durable, making it ideal for surface coatings.
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  • TiSi2 Sputtering Targets 3N-6N High Purity Titanium Silicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    TiSi2 (Titanium Silicide) Sputtering Targets

    • High Electrical Conductivity: Enables efficient current flow in thin films.
    • Thermal Stability: Performs well under high-temperature conditions.
    • High Purity: Ensures minimal impurities for precise and reliable deposition.
    • Versatility: Suitable for a wide range of deposition techniques, including magnetron sputtering.
    • Customizable Specifications: Tailored to meet the demands of diverse applications.
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