Showing 13–18 of 18 results
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- High Purity: ≥99.9% purity, ensuring superior performance and reliability in sensitive applications.
- Dielectric Properties: High dielectric constant, making it ideal for capacitor applications and thin film deposition.
- Thermal Stability: Excellent stability under high temperatures, ensuring durability in harsh environments.
- Optical Properties: High refractive index, suitable for use in optical coatings and thin films.
- Fine Powder: Available in various particle sizes to meet different application needs, including nano and micron sizes.
- Chemical Stability: Highly resistant to corrosion, oxidation, and degradation, making it suitable for long-term use in demanding environments.
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- High Dielectric Constant: Ta₂O₅ films exhibit a high dielectric constant, making them ideal for use in capacitors and semiconductor devices requiring high electrical insulation.
- Chemical and Thermal Stability: Ta₂O₅ provides excellent resistance to chemical attack and can withstand high temperatures, making it suitable for applications in harsh environments.
- Optical Transparency: Ta₂O₅ is transparent over a wide range of wavelengths, which makes it an excellent material for optical coatings that require high refractive index and low absorption.
- High Refractive Index: The high refractive index of Ta₂O₅ makes it ideal for optical multilayer coatings used in anti-reflective applications and optical filters.
- Durability: Ta₂O₅ films are known for their mechanical strength and durability, providing a robust protective layer in various high-performance applications.
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- Exceptional Hardness: Provides excellent wear resistance in demanding conditions.
- High Thermal Conductivity: Ensures superior performance in high-temperature applications.
- Oxidation Resistance: Maintains stability in oxidative environments.
- Chemical Stability: Resistant to chemical degradation and corrosion.
- Versatility: Suitable for various industrial and scientific applications.
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- Extreme Hardness: TaC coatings provide excellent hardness, making them ideal for cutting tools, wear-resistant coatings, and surfaces exposed to high friction.
- High Melting Point: With a melting point exceeding 3880°C, TaC is one of the most heat-resistant materials, suitable for high-temperature applications in aerospace and industrial processes.
- Corrosion Resistance: TaC films offer robust resistance to chemicals, making them ideal for protective coatings in chemically aggressive environments.
- Electrical Conductivity: TaC has good electrical conductivity, which is advantageous in certain electronic and semiconductor applications.
- Oxidation Resistance: The oxidation resistance of TaC enhances its performance in environments where exposure to high temperatures and reactive gases is common.
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- Excellent Diffusion Barrier: TaN films provide an effective barrier against the diffusion of metals, such as copper, making them crucial for semiconductor devices.
- High Electrical Resistivity: TaN has a relatively high electrical resistivity, which makes it suitable for thin-film resistors and other resistive applications.
- Chemical and Thermal Stability: Tantalum Nitride exhibits excellent stability in extreme chemical and thermal environments, ensuring long-lasting performance in harsh conditions.
- Hardness and Wear Resistance: TaN films offer superior hardness and wear resistance, making them ideal for protective coatings in demanding industrial applications.
- Corrosion Resistance: TaN is resistant to corrosion, making it suitable for use in environments where exposure to chemicals or moisture is a concern.
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- Exceptional Mechanical Properties: Outstanding strength and ductility even at high temperatures.
- High-Temperature Stability: Retains structural integrity under extreme thermal conditions.
- Corrosion and Oxidation Resistance: Suitable for harsh and reactive environments.
- High Entropy Alloy: Unique multi-element composition for enhanced material performance.
- Customizable Particle Sizes: Nano to micrometer scales for diverse applications.
