Showing 37–47 of 47 results

  • TiO Pellets Evaporation Materials 3N-6N High Purity Titanium Monoxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan MaterialsTiO Pellets Evaporation Materials 3N-6N High Purity Titanium Monoxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customize - Tinsan Materials

    TiO (Titanium Monoxide) Pellets Granules Evaporation Materials

    • High purity (≥99.9% or ≥99.99%).
    • Excellent thermal and chemical stability.
    • Uniform pellet size for consistent performance.
    • Customizable specifications tailored to specific requirements.
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  • TiO Sputtering Targets 2N5-6N High Purity Titanium Monoxide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    TiO (Titanium Monoxide) Sputtering Targets

    • High Purity: Ensures superior film quality and minimal contamination.
    • Stable Properties: Excellent thermal and chemical stability under deposition conditions.
    • Customizable Forms: Available in various sizes and shapes to suit specific system requirements.
    • Versatile Performance: Suitable for a wide range of thin-film applications.
    • Durability: High mechanical strength for extended usability.
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  • TiO2 Pellets Evaporation Material 4N-6N High Purity Titanium Dioxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized - Tinsan Materials

    TiO2 (Titanium Dioxide) Pellets Granules Evaporation Materials

    • High Refractive Index: Offers superior refractive index properties, making it ideal for optical coatings and enhancing light manipulation in optical devices.
    • Broad Transparency Range: Transmits well in the UV, visible, and IR ranges, allowing for applications across a wide spectrum of light.
    • Excellent Hardness and Stability: TiO₂ is chemically inert and provides good hardness, which makes it ideal for durable coatings.
    • Photocatalytic Activity: Exhibits high efficiency in photocatalytic reactions under UV light, useful in environmental cleanup and antibacterial coatings.
    • High Dielectric Constant: Enables its use in microelectronics for creating high-performance dielectric layers in capacitors and transistors.
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  • TiO2 Sputtering Target 3N-6N High Purity Titanium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiO2 Sputtering Target 3N-6N High Purity Titanium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiO2 (Titanium Dioxide) Sputtering Target

    • High Refractive Index: TiO₂ has one of the highest refractive indices among dielectric materials, making it ideal for optical coatings that require light management.
    • Photocatalytic Activity: TiO₂ is highly effective as a photocatalyst, breaking down organic compounds and providing self-cleaning or environmental purification functions.
    • High Dielectric Constant: TiO₂’s excellent dielectric properties make it useful in capacitors and other semiconductor applications requiring stable, insulating layers.
    • Thermal and Chemical Stability: TiO₂ films are stable under high temperatures and resistant to chemical attack, which is important for robust and long-lasting coatings.
    • UV Absorption: TiO₂ effectively absorbs UV light, making it suitable for applications in UV-blocking coatings or as a protective layer in various devices.
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  • TiSb Sputtering Targets 99.5%-99.9999% High Purity Titanium Antimony Alloy Sputtering Target 2N5-6N Customized - Tinsan Materials

    TiSb (Titanium Antimony) Sputtering Targets

    • High Purity: Ensures consistent film quality and reduces defects in deposited layers.
    • Stable Composition: Titanium and antimony alloying for enhanced mechanical and chemical properties.
    • Versatile Applications: Compatible with a wide range of deposition techniques, including PVD and sputtering.
    • Customizable Options: Available in various compositions and dimensions to meet specific requirements.
    • Durability: Resistant to oxidation and corrosion, ensuring longevity during sputtering processes.
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  • TiSi2 Sputtering Targets 3N-6N High Purity Titanium Silicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    TiSi2 (Titanium Silicide) Sputtering Targets

    • High Electrical Conductivity: Enables efficient current flow in thin films.
    • Thermal Stability: Performs well under high-temperature conditions.
    • High Purity: Ensures minimal impurities for precise and reliable deposition.
    • Versatility: Suitable for a wide range of deposition techniques, including magnetron sputtering.
    • Customizable Specifications: Tailored to meet the demands of diverse applications.
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  • TiTe2 Sputtering Targets 3N-6N High Purity Titanium Ditelluride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    TiTe2 (Titanium Ditelluride) Sputtering Targets

    • High Purity: Ensures optimal film quality and performance.
    • Excellent Electrical Conductivity: Suitable for advanced electronic applications.
    • Thermal Stability: Resilient under high-temperature deposition processes.
    • Layered Structure: Ideal for 2D material synthesis and related technologies.
    • Customizable Specifications: Available in tailored sizes, shapes, and configurations.
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  • TiZrHfNb Alloy Target 99.9%-99.9999% High Purity Titanium Zirconium Hafnium Niobium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsTiZrHfNb Alloy Target 99.9%-99.9999% High Purity Titanium Zirconium Hafnium Niobium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    TiZrHfNb (Titanium Zirconium Hafnium Niobium) Alloy Target

    • Superior Mechanical Strength: The combination of titanium, zirconium, hafnium, and niobium results in exceptional mechanical strength, making TiZrHfNb thin films suitable for applications exposed to extreme stress and high temperatures.
    • High Corrosion Resistance: This alloy’s ability to resist oxidation and corrosion, particularly in harsh and high-temperature environments, makes it ideal for aerospace, energy, and medical applications.
    • Thermal Stability: TiZrHfNb alloy thin films retain their structural integrity at elevated temperatures, making them suitable for use in high-heat applications, such as power generation systems and aerospace components.
    • Wear Resistance: The combination of hafnium and niobium in the alloy enhances wear resistance, making it perfect for applications requiring durable coatings, such as industrial tools and mechanical parts.
    • Biocompatibility: TiZrHfNb alloy is biocompatible, making it ideal for medical devices and implants where long-term stability and resistance to body fluids are required.
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  • TiZrHfNbTa Pellets Evaporation Materials 2N-4N High Purity Titanium Zirconium Hafnium Niobium Tantalum Granules High Entropy Alloy (HEA) Particles High Pure 99%-99.99% CustomizedTiZrHfNbTa Pellets Evaporation Materials 2N-4N High Purity Titanium Zirconium Hafnium Niobium Tantalum Granules High Entropy Alloy (HEA) Particles High Pure 99%-99.99% Customize

    TiZrHfNbTa (Titanium Zirconium Hafnium Niobium Tantalum) Pellets Granules Evaporation Materials

    • Exceptional Mechanical Properties: Outstanding strength and ductility even at high temperatures.
    • High-Temperature Stability: Retains structural integrity under extreme thermal conditions.
    • Corrosion and Oxidation Resistance: Suitable for harsh and reactive environments.
    • High Entropy Alloy: Unique multi-element composition for enhanced material performance.
    • Customizable Particle Sizes: Nano to micrometer scales for diverse applications.
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  • WTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan MaterialsWTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    WTi (Tungsten Titanium) Alloy Target

    • High Melting Point: The combination of tungsten and titanium gives the alloy a high melting point, making WTi thin films highly durable and able to withstand extreme temperatures.
    • Oxidation and Corrosion Resistance: WTi thin films resist oxidation and corrosion, making them ideal for environments where materials are exposed to harsh conditions.
    • Excellent Adhesion: WTi thin films exhibit excellent adhesion to various substrates, which is crucial for thin-film performance in semiconductor and microelectronic applications.
    • Good Electrical Conductivity: Tungsten’s inherent conductivity is complemented by titanium, making the alloy an ideal choice for electrical applications, such as in semiconductors and thin-film resistors.
    • Mechanical Strength: The alloy’s mechanical strength ensures that WTi thin films are resistant to wear, making them suitable for use in hard coatings and other demanding applications.
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  • WTi Particles Evaporation Material 2N-6N High Purity Tungsten Titanium Granules Pellets for Coating High Pure 99%-99.9999% Customized - Tinsan Materials

    WTi (Tungsten Titanium) Pellets 5N (99.999%) Granules Evaporation Materials

    • High Hardness: Provides excellent wear resistance, making it suitable for demanding applications.
    • Corrosion Resistance: Offers good resistance to oxidation and chemical corrosion.
    • Thermal Stability: Maintains mechanical properties at elevated temperatures.
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