Showing all 4 results

  • Tm2O3 Pellets Evaporation Materials 3N-6N High Purity Thulium Oxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Tm2O3 (Thulium Oxide) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Excellent thermal stability and chemical resistance.
    • Superior optical properties for laser and optical coatings.
    • Uniform pellet size for consistent deposition results.
    • Customizable to meet specific application requirements.
  • Tm2O3 Powder 3N-5N High Purity Thulium Oxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.999% Customized - Tinsan Materials

    Tm2O3 (Thulium Oxide) Powder

    • High Purity: ≥99.99% (4N), ensuring consistent performance.
    • Unique Optical Properties: Suitable for laser and phosphor applications.
    • Thermal Stability: High melting point and excellent thermal resistance.
    • Chemical Stability: Resistant to oxidation and corrosion.
    • Customizable Particle Sizes: Available in nano and micron grades.
    • Versatility: Supports a wide range of industrial and research applications.
  • Tm2O3 Sputtering Targets 3N-6N High Purity Thulium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    Tm2O3 (Thulium Oxide) Sputtering Targets

    • High Purity: Ensures optimal performance and low impurity levels in thin films.
    • Exceptional Optical Properties: Ideal for laser and photonic applications.
    • Thermal Stability: Suitable for high-temperature processes.
    • Customizable Specifications: Adaptable to diverse application needs.
    • Compatibility: Works with various sputtering systems, including RF and DC.
  • Tm3Fe5O12 Sputtering Targets 2N5-6N High Purity Thulium Iron Garnet Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Tm3Fe5O12 (Thulium Iron Garnet) Sputtering Targets

    • High Purity: Ensures minimal contamination for superior thin-film properties.
    • Precise Stoichiometry: Optimized Tm₃Fe₅O₁₂ composition for consistent results.
    • Magnetic and Optical Excellence: Delivers high-performance film characteristics.
    • Robust Performance: Supports a wide range of deposition techniques.
    • Customizable Options: Tailored specifications for diverse deposition systems.