Showing 1–12 of 16 results

  • CoCrW Alloy Target 99.95%-99.9999% High Purity Cobalt Chromium Tungsten Alloy Sputtering Targets 3N5-6N Customized - Tinsan MaterialsCoCrW Alloy Target 99.95%-99.9999% High Purity Cobalt Chromium Tungsten Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    CoCrW (Cobalt Chromium Tungsten) Alloy Target

    • Wear Resistance: CoCrW alloy provides excellent resistance to wear and abrasion, making it ideal for coatings on components subjected to mechanical stress and friction.
    • Corrosion Resistance: The addition of chromium enhances the alloy’s resistance to corrosion, while tungsten improves hardness and durability, ensuring long-lasting performance in harsh environments.
    • High-Temperature Stability: Cobalt and tungsten offer high thermal stability, allowing CoCrW thin films to retain their properties at elevated temperatures, making them suitable for high-heat applications such as in aerospace and power generation.
    • Biocompatibility: CoCrW alloys are biocompatible, making them a preferred choice for medical applications such as orthopedic implants and surgical instruments.
    • Excellent Hardness: The combination of tungsten and cobalt increases the hardness of the alloy, providing durable, wear-resistant coatings for industrial tools and components.
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  • FeW Pellets Evaporation Materials 2N-5N High Purity Iron Tungsten Alloy Granules Particles for Coatings High Pure 99%-99.999% Customized - Tinsan Materials

    FeW (Iron Tungsten) Pellets Granules Evaporation Materials

    • High Hardness: Ensures excellent wear resistance for industrial applications.
    • Thermal Stability: Performs reliably under high-temperature environments.
    • Corrosion Resistance: Excellent chemical stability in harsh conditions.
    • Customizable Compositions: FeW ratios tailored to specific application requirements.
    • Versatile Particle Sizes: Available in nano to micrometer scales for diverse uses.
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  • IWO Sputtering Targets 3N-6N High Purity Indium Tungsten Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan MaterialsIWO Sputtering Targets 3N-6N High Purity Indium Tungsten Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    IWO (Indium Tungsten Oxide) Sputtering Targets

    • High Optical Transparency: Enables the creation of efficient transparent films.
    • Superior Conductivity: Provides excellent electrical performance for electronic applications.
    • Thermal and Chemical Stability: Ensures reliability in high-temperature and reactive environments.
    • Customizable Material Composition: Optimized for specific TCO requirements.
    • Compatibility: Suitable for RF and DC sputtering systems.
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  • NiW Alloy Target 99.9%-99.9999% High Purity Nickel Tungsten Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiW Alloy Target 99.9%-99.9999% High Purity Nickel Tungsten Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiW (Nickel Tungsten) Alloy Target

    • Hardness and Durability: NiW alloys offer exceptional hardness and durability, making them ideal for wear-resistant coatings that protect mechanical parts and tools from wear and abrasion.
    • Corrosion Resistance: NiW thin films provide strong resistance to corrosion, particularly in harsh environments exposed to moisture, chemicals, or high salinity, extending the service life of components.
    • Thermal Stability: The alloy maintains its mechanical and chemical properties at elevated temperatures, making NiW thin films suitable for high-temperature applications in various industries.
    • Magnetic Properties: The nickel content in NiW alloys provides magnetic characteristics that are useful in certain electronic and magnetic storage applications.
    • Customizable Composition: The ratio of nickel to tungsten can be customized to fine-tune the properties of the thin film for specific applications, such as increasing hardness, wear resistance, or corrosion protection.
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  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    Tungsten Trioxide (WO3) Sputtering Targets

    • High Purity: Ensures consistent film quality and performance.
    • Customizable Dimensions: Available in a variety of sizes and shapes to meet specific requirements.
    • Excellent Durability: Suitable for high-temperature and high-power sputtering processes.
    • Uniformity: Enables consistent thin-film deposition for advanced technologies.
    • Eco-Friendly Applications: Ideal for energy-efficient devices like smart windows.
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  • Tungsten Pellets Evaporation Material 3N5-6N High Purity Metal W Granules Particles for Coating High Pure 99.95%-99.9999% Customized - Tinsan Materials

    W Tungsten Pellets Granules Evaporation Materials

    • High Purity: Ensures optimal performance in sensitive applications.
    • High Melting Point: Allows for use in high-temperature environments without degradation.
    • Excellent Electrical Conductivity: Ideal for applications requiring effective electrical connections.
    • Thermal Stability: Maintains performance under varying temperature conditions.
    • Robustness: Provides durability and reliability in demanding applications.
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  • Tungsten Sputtering Target, 99.9%-99.9999% High Purity W Metal Sputtering Targets CustomizedTungsten Sputtering Target, 99.9%-99.9999% High Purity W Metal Sputtering Targets Customized

    W Tungsten Sputtering Target

    Tungsten sputtering targets are indispensable in industries that demand materials with high thermal and electrical conductivity, exceptional strength, and stability at extreme temperatures. These properties make tungsten a critical material in electronics, aerospace, energy, and medical applications.

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  • WC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WC (Tungsten Carbide) Sputtering Target

    • Exceptional Hardness: WC films offer high hardness, contributing to their use in tools and wear-resistant coatings.
    • Thermal Stability: Tungsten Carbide thin films can withstand high temperatures without degrading, making them suitable for high-temperature environments.
    • High Melting Point: WC has a melting point above 2,870°C, ensuring it retains its structural integrity in extreme conditions.
    • Corrosion Resistance: WC coatings provide strong resistance against corrosion, enhancing the longevity of components used in harsh environments.
    • Excellent Adhesion: WC sputtered films adhere well to various substrates, including metals and ceramics, ensuring durability and longevity of the coatings.
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  • WO3 Pellets Evaporation Material 3N-6N High Purity Tungsten Trioxide Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WO3 (Tungsten Trioxide) Pellets Granules Evaporation Materials

    • Electrochromic Properties: WO₃ can change color and transparency when voltage is applied, making it ideal for smart window applications.
    • High Refractive Index: WO₃ thin films provide superior optical performance in applications requiring high refractive index materials.
    • Environmental Durability: WO₃ films exhibit good chemical and thermal stability, ensuring durability in harsh environmental conditions.
    • Photocatalytic Activity: WO₃ is capable of breaking down pollutants and splitting water for hydrogen production when exposed to UV light.
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  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    WO3 (Tungsten Trioxide) Sputtering Targets

    • High Melting Point: WO₃ has a high melting point (~1473°C), making it suitable for high-temperature applications.
    • Chemical Stability: WO₃ is chemically stable and resistant to oxidation, ensuring long-term reliability in harsh environments.
    • Transparency Control: WO₃ films can be engineered for transparency modulation, useful in smart glass and energy-efficient windows.
    • High Conductivity: When doped or treated, WO₃ can exhibit increased electrical conductivity for various electronic applications.
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  • WS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WS2 (Tungsten Disulfide) Sputtering Target

    • Low Friction Coefficient: WS2 thin films exhibit an extremely low coefficient of friction, which is beneficial for improving the performance of mechanical systems in high-friction environments.
    • Thermal Stability: WS2 coatings maintain their properties at elevated temperatures, making them suitable for high-temperature applications.
    • High Wear Resistance: WS2 offers exceptional wear resistance, extending the operational life of coated components subjected to abrasive conditions.
    • Chemical Inertness: WS2 is resistant to corrosion and oxidation, making it durable in harsh chemical environments.
    • Layered Structure: The unique layered structure of WS2 provides excellent lubricating properties due to the easy shearing between layers.
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  • WSe2 Pellets Evaporation Materials 3N-5N High Purity Tungsten Diselenide Granules Particles High Pure 99.9%-99.999% Customized - Tinsan Materials

    WSe2 (Tungsten Diselenide) Pellets Granules Evaporation Materials

    • High Purity: Ultra-pure WSe₂ for reliable and repeatable performance.
    • Layered Structure: Two-dimensional material with strong in-plane bonding and weak interlayer van der Waals forces.
    • Exceptional Optical Properties: Ideal for applications requiring precise light absorption and emission.
    • Chemical Stability: Resistant to oxidation and degradation in harsh environments.
    • Customizable Particle Size: Tailored to specific research or industrial needs.
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