Showing 13–24 of 24 results

  • WC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WC (Tungsten Carbide) Sputtering Target

    • Exceptional Hardness: WC films offer high hardness, contributing to their use in tools and wear-resistant coatings.
    • Thermal Stability: Tungsten Carbide thin films can withstand high temperatures without degrading, making them suitable for high-temperature environments.
    • High Melting Point: WC has a melting point above 2,870°C, ensuring it retains its structural integrity in extreme conditions.
    • Corrosion Resistance: WC coatings provide strong resistance against corrosion, enhancing the longevity of components used in harsh environments.
    • Excellent Adhesion: WC sputtered films adhere well to various substrates, including metals and ceramics, ensuring durability and longevity of the coatings.
  • WO3 Pellets Evaporation Material 3N-6N High Purity Tungsten Trioxide Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WO3 (Tungsten Trioxide) Pellets Granules Evaporation Materials

    • Electrochromic Properties: WO₃ can change color and transparency when voltage is applied, making it ideal for smart window applications.
    • High Refractive Index: WO₃ thin films provide superior optical performance in applications requiring high refractive index materials.
    • Environmental Durability: WO₃ films exhibit good chemical and thermal stability, ensuring durability in harsh environmental conditions.
    • Photocatalytic Activity: WO₃ is capable of breaking down pollutants and splitting water for hydrogen production when exposed to UV light.
  • WO3 Powder 3N-5N High Purity Tungsten Trioxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.999% Customized - Tinsan Materials

    WO3 (Tungsten Trioxide) Powder

    • High Purity: WO3 content of ≥99.9%.
    • Exceptional Optical Properties: High transparency in the visible spectrum.
    • Thermal and Chemical Stability: Resists high temperatures and corrosive environments.
    • Versatility: Suitable for applications in energy, environmental technology, and electronics.
    • Customizable Particle Sizes: Tailored to specific application requirements.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    WO3 (Tungsten Trioxide) Sputtering Targets

    • High Melting Point: WO₃ has a high melting point (~1473°C), making it suitable for high-temperature applications.
    • Chemical Stability: WO₃ is chemically stable and resistant to oxidation, ensuring long-term reliability in harsh environments.
    • Transparency Control: WO₃ films can be engineered for transparency modulation, useful in smart glass and energy-efficient windows.
    • High Conductivity: When doped or treated, WO₃ can exhibit increased electrical conductivity for various electronic applications.
  • WS2 Powder 3N-5N High Purity Tungsten Disulfide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.999% Customized - Tinsan Materials

    WS2 (Tungsten Disulfide) Powder

    • Ultra-Low Friction: Excellent solid lubricant properties with a coefficient of friction as low as 0.03.
    • High Thermal Stability: Effective up to 450°C in normal environments and up to 650°C in vacuum conditions.
    • High Purity: Ensures consistent performance in critical applications.
    • Versatile Particle Sizes: Available in nano and micron grades.
    • Chemical Resistance: High resistance to oxidation, corrosion, and wear.
    • Wide Application Range: Suitable for coatings, composites, lubricants, and electronics.
  • WS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WS2 (Tungsten Disulfide) Sputtering Target

    • Low Friction Coefficient: WS2 thin films exhibit an extremely low coefficient of friction, which is beneficial for improving the performance of mechanical systems in high-friction environments.
    • Thermal Stability: WS2 coatings maintain their properties at elevated temperatures, making them suitable for high-temperature applications.
    • High Wear Resistance: WS2 offers exceptional wear resistance, extending the operational life of coated components subjected to abrasive conditions.
    • Chemical Inertness: WS2 is resistant to corrosion and oxidation, making it durable in harsh chemical environments.
    • Layered Structure: The unique layered structure of WS2 provides excellent lubricating properties due to the easy shearing between layers.
  • WSe2 Pellets Evaporation Materials 3N-5N High Purity Tungsten Diselenide Granules Particles High Pure 99.9%-99.999% Customized - Tinsan Materials

    WSe2 (Tungsten Diselenide) Pellets Granules Evaporation Materials

    • High Purity: Ultra-pure WSe₂ for reliable and repeatable performance.
    • Layered Structure: Two-dimensional material with strong in-plane bonding and weak interlayer van der Waals forces.
    • Exceptional Optical Properties: Ideal for applications requiring precise light absorption and emission.
    • Chemical Stability: Resistant to oxidation and degradation in harsh environments.
    • Customizable Particle Size: Tailored to specific research or industrial needs.
  • WSe2 Powder 3N-5N High Purity Tungsten Diselenide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.999% Customized - Tinsan Materials

    WSe2 (Tungsten Diselenide) Powder

    • High Purity: ≥99.9% purity for enhanced performance and reliability in advanced applications.
    • Layered Structure: Exhibits a two-dimensional structure, similar to graphene, allowing for unique electronic and optical properties.
    • Optical Properties: Strong photoluminescence and excellent performance in the infrared (IR) spectrum, suitable for optoelectronic applications.
    • Electronic Performance: High electron mobility, making it an ideal candidate for transistors, sensors, and other electronic devices.
    • Stable and Durable: Resilient under a variety of environmental conditions, including exposure to moisture and oxygen.
    • Scalable Production: Available in different quantities and customizable particle sizes to meet specific application needs.
  • WSi2 Sputtering Targets 2N5-6N High Purity Tungsten Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    WSi2 (Tungsten Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Withstands high-temperature operations.
    • High Electrical Conductivity: Ideal for conductive and resistive layers.
    • Oxidation Resistance: Reliable performance in harsh environments.
    • High Purity: Ensures uniform deposition and minimal contamination.
    • Customizability: Available in various dimensions and purities to suit specific needs.
  • WTe2 Sputtering Targets 2N5-6N High Purity Tungsten Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    WTe2 (Tungsten Telluride) Sputtering Targets

    • High Purity: Ensures superior thin-film quality with minimal impurities.
    • Layered Structure: Supports the formation of ultra-thin films with excellent properties.
    • Stable Composition: Reliable and consistent deposition outcomes.
    • Versatile Application: Compatible with various sputtering systems and techniques.
    • Customizable Options: Tailored targets for specific research and industrial requirements.
  • WTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan MaterialsWTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    WTi (Tungsten Titanium) Alloy Target

    • High Melting Point: The combination of tungsten and titanium gives the alloy a high melting point, making WTi thin films highly durable and able to withstand extreme temperatures.
    • Oxidation and Corrosion Resistance: WTi thin films resist oxidation and corrosion, making them ideal for environments where materials are exposed to harsh conditions.
    • Excellent Adhesion: WTi thin films exhibit excellent adhesion to various substrates, which is crucial for thin-film performance in semiconductor and microelectronic applications.
    • Good Electrical Conductivity: Tungsten’s inherent conductivity is complemented by titanium, making the alloy an ideal choice for electrical applications, such as in semiconductors and thin-film resistors.
    • Mechanical Strength: The alloy’s mechanical strength ensures that WTi thin films are resistant to wear, making them suitable for use in hard coatings and other demanding applications.
  • WTi Particles Evaporation Material 2N-6N High Purity Tungsten Titanium Granules Pellets for Coating High Pure 99%-99.9999% Customized - Tinsan Materials

    WTi (Tungsten Titanium) Pellets 5N (99.999%) Granules Evaporation Materials

    • High Hardness: Provides excellent wear resistance, making it suitable for demanding applications.
    • Corrosion Resistance: Offers good resistance to oxidation and chemical corrosion.
    • Thermal Stability: Maintains mechanical properties at elevated temperatures.