Showing 13–17 of 17 results

  • WSe2 Pellets Evaporation Materials 3N-5N High Purity Tungsten Diselenide Granules Particles High Pure 99.9%-99.999% Customized - Tinsan Materials

    WSe2 (Tungsten Diselenide) Pellets Granules Evaporation Materials

    • High Purity: Ultra-pure WSe₂ for reliable and repeatable performance.
    • Layered Structure: Two-dimensional material with strong in-plane bonding and weak interlayer van der Waals forces.
    • Exceptional Optical Properties: Ideal for applications requiring precise light absorption and emission.
    • Chemical Stability: Resistant to oxidation and degradation in harsh environments.
    • Customizable Particle Size: Tailored to specific research or industrial needs.
  • WSi2 Sputtering Targets 2N5-6N High Purity Tungsten Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    WSi2 (Tungsten Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Withstands high-temperature operations.
    • High Electrical Conductivity: Ideal for conductive and resistive layers.
    • Oxidation Resistance: Reliable performance in harsh environments.
    • High Purity: Ensures uniform deposition and minimal contamination.
    • Customizability: Available in various dimensions and purities to suit specific needs.
  • WTe2 Sputtering Targets 2N5-6N High Purity Tungsten Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    WTe2 (Tungsten Telluride) Sputtering Targets

    • High Purity: Ensures superior thin-film quality with minimal impurities.
    • Layered Structure: Supports the formation of ultra-thin films with excellent properties.
    • Stable Composition: Reliable and consistent deposition outcomes.
    • Versatile Application: Compatible with various sputtering systems and techniques.
    • Customizable Options: Tailored targets for specific research and industrial requirements.
  • WTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan MaterialsWTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    WTi (Tungsten Titanium) Alloy Target

    • High Melting Point: The combination of tungsten and titanium gives the alloy a high melting point, making WTi thin films highly durable and able to withstand extreme temperatures.
    • Oxidation and Corrosion Resistance: WTi thin films resist oxidation and corrosion, making them ideal for environments where materials are exposed to harsh conditions.
    • Excellent Adhesion: WTi thin films exhibit excellent adhesion to various substrates, which is crucial for thin-film performance in semiconductor and microelectronic applications.
    • Good Electrical Conductivity: Tungsten’s inherent conductivity is complemented by titanium, making the alloy an ideal choice for electrical applications, such as in semiconductors and thin-film resistors.
    • Mechanical Strength: The alloy’s mechanical strength ensures that WTi thin films are resistant to wear, making them suitable for use in hard coatings and other demanding applications.
  • WTi Particles Evaporation Material 2N-6N High Purity Tungsten Titanium Granules Pellets for Coating High Pure 99%-99.9999% Customized - Tinsan Materials

    WTi (Tungsten Titanium) Pellets 5N (99.999%) Granules Evaporation Materials

    • High Hardness: Provides excellent wear resistance, making it suitable for demanding applications.
    • Corrosion Resistance: Offers good resistance to oxidation and chemical corrosion.
    • Thermal Stability: Maintains mechanical properties at elevated temperatures.