Al2O3 (Aluminum Oxide) Sputtering Targets
- High Purity: Available in purities up to 99.999% for superior thin film quality.
- Excellent Stability: Exceptional thermal and chemical resistance for high-temperature and corrosive environments.
- Superior Hardness: Ideal for creating durable, scratch-resistant coatings.
- Dielectric Properties: High dielectric constant for microelectronic and capacitor applications.
- Consistent Performance: Engineered for uniform film deposition and low contamination levels.
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Description
| Material | Aluminum Oxide (Al2O3) |
| Purity | 99.9% – 99.999% / 3N 3N5 4N 4N5 5N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Aluminum Oxide (Al₂O₃) sputtering targets are advanced ceramic materials used in thin film deposition processes. Known for their outstanding thermal stability, chemical resistance, and dielectric properties, Al₂O₃ targets are ideal for applications requiring durability and high performance. These targets are manufactured to deliver exceptional quality and precision, ensuring uniform and consistent thin film deposition in various industries.
Key Applications
- Optical Coatings: Anti-reflective and protective coatings for lenses and displays.
- Microelectronics: Dielectric layers in semiconductor devices.
- Protective Coatings: Abrasion-resistant layers for tools and surfaces.
- Energy Storage: Thin films for advanced battery technologies.
- Biomedical Devices: Biocompatible coatings for implants and medical tools.
Features and Benefits
- High Purity: Available in purities up to 99.999% for superior thin film quality.
- Excellent Stability: Exceptional thermal and chemical resistance for high-temperature and corrosive environments.
- Superior Hardness: Ideal for creating durable, scratch-resistant coatings.
- Dielectric Properties: High dielectric constant for microelectronic and capacitor applications.
- Consistent Performance: Engineered for uniform film deposition and low contamination levels.
Specifications
- Material: Aluminum Oxide (Al₂O₃).
- Purity: 99.9% to 99.999%.
- Shapes: Round, rectangular, planar, and custom geometries.
- Dimensions: Standard and custom sizes available upon request.
- Density: ≥ 98% of theoretical density.
Customization Options
- Shapes and Sizes: Custom geometries and dimensions to fit specific sputtering systems.
- Bonding Services: Targets can be bonded to backing plates for enhanced thermal and mechanical performance.
- Special Requirements: Tailored purity levels, porosity specifications, and surface finishes based on application needs.
- Packaging: Custom packaging to ensure safe transport and handling.
Have specific requirements or need technical guidance? Contact our experts today for detailed information about Aluminum Oxide (Al₂O₃) sputtering targets, customization options, and pricing. Let us help you optimize your thin film deposition processes.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
