AlN (Aluminium Nitride) Sputtering Target
- High Thermal Conductivity: AlN offers one of the highest thermal conductivities among non-metals, which is vital for heat dissipation in high-power electronics and optoelectronics.
- Electrical Insulation: AlN is an excellent electrical insulator, making it suitable for electronic applications requiring electrical isolation with effective thermal management.
- Piezoelectric Properties: AlN exhibits strong piezoelectric properties, making it ideal for use in sensors, actuators, and acoustic wave devices.
- High Hardness and Durability: AlN films are mechanically robust, offering good wear resistance and durability for applications in harsh environments.
- Good Chemical Stability: AlN is resistant to many chemicals and environmental conditions, ensuring longevity in demanding applications.
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Description
Material | AlN |
Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
Shape | disc, plate, sheet, rod, customized |
Size | can be customized (contact us) |
Package | vacuum bag or customer’s request |
Place of Origin | China |
MOQ | 1pcs |
Supply Ability | 10000pcs per month |
Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Aluminum nitride (AlN) sputtering targets are widely used for depositing thin films in electronics, optoelectronics, and high-performance applications due to their excellent thermal, electrical, and mechanical properties. AlN offers a combination of high thermal conductivity, electrical insulation, and chemical stability, making it a preferred material for various advanced technologies.
Key Applications:
- Semiconductor Devices: AlN thin films are used in semiconductor devices where high thermal conductivity and electrical insulation are critical. They are often applied as substrates, thermal management layers, and insulators in microelectronics.
- Optoelectronics: AlN is transparent to UV light and has favorable optical properties, making it suitable for use in UV optoelectronics and photonics, including UV LEDs and laser diodes.
- Surface Acoustic Wave (SAW) Devices: AlN thin films are commonly used in SAW devices for RF filters and sensors, due to their piezoelectric properties and high-frequency performance.
- Thermal Management: With its high thermal conductivity (up to 200 W/mK), AlN is ideal for thermal management applications in power electronics, LED packaging, and other systems requiring efficient heat dissipation.
- High-Temperature Applications: AlN films exhibit excellent thermal stability and are used in applications that demand performance in high-temperature environments, such as aerospace, automotive, and industrial equipment.
- Dielectric Layers: AlN is used in thin-film dielectric layers for capacitors, MEMS devices, and RF components due to its electrical insulation and dielectric strength.
Features of AlN Sputtering Targets:
- High Thermal Conductivity: AlN offers one of the highest thermal conductivities among non-metals, which is vital for heat dissipation in high-power electronics and optoelectronics.
- Electrical Insulation: AlN is an excellent electrical insulator, making it suitable for electronic applications requiring electrical isolation with effective thermal management.
- Piezoelectric Properties: AlN exhibits strong piezoelectric properties, making it ideal for use in sensors, actuators, and acoustic wave devices.
- High Hardness and Durability: AlN films are mechanically robust, offering good wear resistance and durability for applications in harsh environments.
- Good Chemical Stability: AlN is resistant to many chemicals and environmental conditions, ensuring longevity in demanding applications.
Customization Options:
- Target Sizes: AlN sputtering targets are available in various diameters and thicknesses, as well as both planar and rotary configurations, to fit different deposition systems.
- Purity Levels: High-purity aluminum nitride targets (up to 99.999%) are available to ensure high-quality thin films with consistent properties.
- Target Bonding: AlN sputtering targets can be bonded to backing plates to improve thermal conductivity and reduce the risk of cracking during sputtering.
AlN (Aluminum Nitride) sputtering targets from Tinsan Materials are used for thin-film deposition in semiconductor, optoelectronic, and thermal management applications. High-purity AlN targets offer superior thermal conductivity, electrical insulation, and chemical stability, customizable for specific requirements.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.