AlSi (Aluminium Silicon) Alloy Target
- Excellent Electrical Conductivity: AlSi alloys offer good electrical conductivity, making them ideal for interconnect layers and conductive films in electronic devices.
- Thermal Stability: AlSi films exhibit high thermal stability, ensuring reliable performance in high-temperature environments, such as semiconductor processing.
- Prevention of Electromigration: The addition of silicon to aluminum helps mitigate electromigration, improving the longevity and reliability of electronic components.
- Corrosion Resistance: AlSi alloys have good resistance to oxidation and corrosion, contributing to the durability of thin films in harsh operating conditions.
- Lightweight and Strong: The lightweight nature of aluminum, combined with the added strength from silicon, makes AlSi alloys versatile in applications requiring both durability and reduced weight.
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Description
| Material | Aluminium Silicon |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Aluminum-Silicon (AlSi) alloy sputtering targets are widely used in semiconductor and electronics industries due to their excellent combination of thermal and electrical conductivity, as well as their ability to form highly stable and durable thin films. The AlSi alloy combines the lightweight, high thermal conductivity of aluminum with the strength and durability of silicon, making it ideal for thin-film applications in integrated circuits and microelectronics.
Key Applications:
- Semiconductor Industry: AlSi alloy sputtering targets are extensively used in semiconductor fabrication for interconnect layers, where aluminum’s high electrical conductivity is combined with silicon’s ability to prevent electromigration.
- Thin-Film Deposition: AlSi is a popular choice for thin-film deposition in integrated circuits, providing a reliable material for wiring and contacts in microelectronic devices.
- Microelectronics: AlSi thin films are used in the production of microelectronic components, where precise control of film properties is critical for device performance.
- Solar Cells: AlSi alloys are utilized in the manufacturing of solar cells for creating conductive contacts and layers, enhancing the efficiency and durability of photovoltaic devices.
- Aerospace Components: The lightweight and high strength-to-weight ratio of AlSi alloys make them suitable for thin-film coatings in aerospace applications.
Features of AlSi Alloy Sputtering Targets:
- Excellent Electrical Conductivity: AlSi alloys offer good electrical conductivity, making them ideal for interconnect layers and conductive films in electronic devices.
- Thermal Stability: AlSi films exhibit high thermal stability, ensuring reliable performance in high-temperature environments, such as semiconductor processing.
- Prevention of Electromigration: The addition of silicon to aluminum helps mitigate electromigration, improving the longevity and reliability of electronic components.
- Corrosion Resistance: AlSi alloys have good resistance to oxidation and corrosion, contributing to the durability of thin films in harsh operating conditions.
- Lightweight and Strong: The lightweight nature of aluminum, combined with the added strength from silicon, makes AlSi alloys versatile in applications requiring both durability and reduced weight.
Customization Options:
- Dimensions: AlSi sputtering targets can be manufactured in a variety of sizes and shapes, including discs, plates, and custom geometries, to fit different deposition systems.
- Purity Levels: High-purity AlSi alloy sputtering targets (up to 99.99%) are available for advanced semiconductor and electronic applications.
- Aluminum-to-Silicon Ratio: The ratio of aluminum to silicon can be customized to achieve desired properties, such as improved conductivity, enhanced strength, or specific thermal characteristics.
AlSi alloy sputtering targets from Tinsan Materials combine excellent electrical conductivity, thermal stability, and corrosion resistance for semiconductor, microelectronics, and solar cell applications. Custom sizes and compositions available for optimized thin-film deposition.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
