Ba Barium Sputtering Target

Barium (Ba) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, particularly sputtering, to create thin films on various substrates. Barium targets are typically used in the production of optical coatings, semiconductor devices, and other advanced materials due to their unique properties.

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Description

Material Barium (Ba)
Purity 99.9% – 99.999% / 3N 3N5 4N 4N5 5N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pc
Supply Ability 1000pcs per month
Lead time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Barium (Ba) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, particularly sputtering, to create thin films on various substrates. Barium targets are typically used in the production of optical coatings, semiconductor devices, and other advanced materials due to their unique properties.

Key Features:

  • Material: High-purity Barium (Ba) is used to ensure minimal contamination during the sputtering process.
  • Form: Barium sputtering targets are typically available in various forms, such as discs, plates, or custom shapes, depending on the specific requirements of the deposition process.
  • Purity: The purity of Barium sputtering targets is crucial, often exceeding 99.9% (3N) to ensure high-quality thin films.

Applications: Commonly used in the production of electronic components, optical coatings, and functional films. In semiconductors, they are used for creating layers in capacitors, sensors, and other electronic devices.

Considerations:

  • Handling: Barium is reactive and must be handled carefully to avoid contamination and oxidation. Targets are usually stored in controlled environments and may require specialized packaging.
  • Deposition Rate: The sputtering parameters, such as power and pressure, must be optimized to achieve the desired film thickness and properties.
  • Customization: Depending on the application, barium targets can be customized in terms of size, shape, and composition (if alloyed with other elements).

Applications in Industry:

  • Semiconductors: Used in the fabrication of microelectronic devices, where thin films of Barium compounds may be required.
  • Optical Coatings: Employed in creating layers that modify the optical properties of lenses and other optical components.
  • Advanced Materials: In research and development, barium sputtering targets can be used to explore new materials with unique electronic, optical, or mechanical properties.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.