Bismuth Oxide (Bi₂O₃) Sputtering Targets
- High Purity: Available in purities up to 99.999% for optimal film quality.
- Superior Deposition Uniformity: Enables precise and consistent thin-film formation.
- Thermal Stability: Performs well under high-temperature deposition conditions.
- Versatile Compatibility: Suitable for various sputtering systems, including DC and RF setups.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Bismuth Oxide (Bi2O3) |
| Purity | 99.9% – 99.999% / 3N 3N5 4N 4N5 5N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Bismuth Oxide (Bi₂O₃) sputtering targets are widely utilized in the production of thin films for optical, electronic, and energy-related applications. Known for its high refractive index and unique optical and electrical properties, Bi₂O₃ is an essential material for fabricating coatings in optoelectronics, solar cells, and gas sensors. These sputtering targets are engineered for superior performance in both DC and RF sputtering processes.
Key Applications
- Optical Coatings: Enhances transparency and refractive index in advanced optical devices.
- Semiconductors: Used in high-k dielectric films for microelectronics.
- Photovoltaics: Facilitates thin film production in solar cell technologies.
- Sensors: Key material for gas sensing layers in industrial and environmental monitoring.
Features and Benefits
- High Purity: Available in purities up to 99.999% for optimal film quality.
- Superior Deposition Uniformity: Enables precise and consistent thin-film formation.
- Thermal Stability: Performs well under high-temperature deposition conditions.
- Versatile Compatibility: Suitable for various sputtering systems, including DC and RF setups.
Specifications
- Material: Bismuth Oxide (Bi₂O₃)
- Purity: ≥ 99.9%
- Shape: Circular, rectangular, or custom shapes
- Dimensions: Customized sizes available upon request
- Density: Optimized to achieve maximum film deposition efficiency
Customization Options
- Target Bonding: Backing plate services for enhanced thermal management.
- Size and Shape: Custom dimensions and geometries tailored to your equipment.
- Purity Levels: Options for high-purity materials to meet specific application demands.
Partner with us to access premium Bismuth Oxide (Bi₂O₃) sputtering targets for your thin-film applications. Contact our experts for detailed specifications, customization requests, and pricing information.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
