Bismuth Telluride (Bi2Te3) Sputtering Targets

  • High Purity: Offers high purity to ensure the quality of thin films and optimal device performance.
  • Excellent Thermoelectric Properties: Ideal for thermoelectric applications where high efficiency is crucial.
  • Uniform Deposition: Provides uniform and stable sputtering, ensuring consistent thin film quality.
  • Thermal Stability: Excellent resistance to heat and thermal cycling, making it suitable for high-temperature applications.

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Description

Material Bismuth Telluride (Bi₂Te₃)
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Bismuth Telluride (Bi₂Te₃) sputtering targets are high-purity materials widely used in the fabrication of thermoelectric devices, infrared detectors, and thermoelectric generators. Known for their excellent thermoelectric properties, these targets are ideal for applications requiring high-performance thin films with enhanced conductivity and thermoelectric efficiency. Bi₂Te₃ sputtering targets are commonly used in semiconductor and energy harvesting technologies.

Key Applications

  • Thermoelectric Devices: Used in the production of thermoelectric generators and coolers due to their high thermoelectric efficiency.
  • Infrared Detectors: Employed in optoelectronic devices for infrared detection and sensing.
  • Semiconductor Industry: Utilized in the deposition of thin films for electronic components and devices.
  • Energy Harvesting: Plays a role in systems designed for capturing and converting thermal energy into electrical power.

Features and Benefits

  • High Purity: Offers high purity to ensure the quality of thin films and optimal device performance.
  • Excellent Thermoelectric Properties: Ideal for thermoelectric applications where high efficiency is crucial.
  • Uniform Deposition: Provides uniform and stable sputtering, ensuring consistent thin film quality.
  • Thermal Stability: Excellent resistance to heat and thermal cycling, making it suitable for high-temperature applications.

Specifications

  • Composition: Bismuth Telluride (Bi₂Te₃)
  • Purity: 99.9% or higher (custom purities available)
  • Form: Available in disc, planar, and custom shapes
  • Size: Custom sizes available to meet specific project requirements
  • Density: Approximately 7.7 g/cm³
  • Application Temperature Range: Suitable for use in high-temperature deposition environments

Customization Options

  • Custom shapes and sizes can be tailored to meet specific deposition needs.
  • Adjustable purity levels based on project specifications.
  • Special coatings and additional modifications available for specific applications.
  • We offer custom cutting and polishing services to fit your system requirements.

For more information on Bi₂Te₃ sputtering targets or to discuss custom solutions for your specific applications, please contact our sales team. We are committed to providing high-quality materials and exceptional customer service. Reach out to us today to get started.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.