Boron Nitride (BN) Sputtering Targets
- High Thermal Conductivity: BN targets are ideal for applications requiring effective heat management.
- Electrical Insulation: Provides excellent dielectric properties, essential for insulating layers in various electronic devices.
- Chemical Inertness: Highly resistant to most chemicals, ensuring long-term durability in aggressive environments.
- Easy to Sputter: BN sputtering targets have excellent sputtering properties, ensuring consistent and uniform deposition.
- High Purity: Available in high-purity grades for precision applications.
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Description
| Material | Boron Nitride (BN) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Boron Nitride (BN) sputtering targets are high-performance materials used in thin-film deposition processes. BN is renowned for its excellent thermal conductivity, electrical insulating properties, and high resistance to chemical degradation, making it ideal for applications in advanced electronics, optics, and coatings. These targets are available in both hexagonal and cubic forms, with hexagonal boron nitride (h-BN) being the most commonly used for sputtering applications due to its superior properties.
Key Applications
- Semiconductor Manufacturing: Used for insulating layers and dielectric coatings in semiconductor devices.
- Optical Coatings: BN thin films offer high thermal and chemical stability, making them ideal for optical coatings.
- Thermal Management: Used in electronics and LEDs for efficient heat dissipation.
- High-Temperature Applications: Excellent for use in high-temperature environments due to their high thermal stability.
Features and Benefits
- High Thermal Conductivity: BN targets are ideal for applications requiring effective heat management.
- Electrical Insulation: Provides excellent dielectric properties, essential for insulating layers in various electronic devices.
- Chemical Inertness: Highly resistant to most chemicals, ensuring long-term durability in aggressive environments.
- Easy to Sputter: BN sputtering targets have excellent sputtering properties, ensuring consistent and uniform deposition.
- High Purity: Available in high-purity grades for precision applications.
Specifications
- Material: Boron Nitride (BN)
- Forms Available: Hexagonal BN (h-BN), Cubic BN (c-BN)
- Purity: 99.9% or higher
- Diameter: Custom sizes available (up to 200mm or larger)
- Thickness: Customizable thickness options
- Density: ~2.0-2.1 g/cm³ for h-BN
- Resistivity: Insulating, typically >10⁹ Ω·cm
Customization Options
- Size and Shape: Tailored sizes and shapes to fit your sputtering system requirements.
- Purity: Options for higher purity targets for critical applications.
- Target Composition: Custom formulations with specific doping elements can be provided.
- Surface Finish: Available with polished or rough surfaces for specific deposition needs.
For more information on our Boron Nitride (BN) sputtering targets or to discuss your specific requirements, please contact us. Our experts are available to help with custom orders, technical support, and delivery options.
