CaF2 (Calcium Fluoride) Sputtering Targets
- Wide Optical Transparency: Effective from UV to IR spectra (0.13–11 μm).
- High Chemical Stability: Resistant to moisture and chemical degradation.
- Low Refractive Index: Reduces the need for complex multilayer coatings.
- Thermal Stability: Suitable for high-temperature thin-film deposition.
- High Purity: Ensures uniform film quality and minimizes defects.
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Description
| Material | Calcium Fluoride (CaF₂) |
| Purity | 99.9% – 99.99999% / 3N 3N5 4N 4N5 5N 5N5 6N 6N5 7N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Calcium Fluoride (CaF₂) sputtering targets are premium materials widely used in thin-film deposition applications, particularly in the optical and electronic industries. Renowned for their broad optical transparency, excellent chemical stability, and low refractive index, CaF₂ targets enable the production of high-quality thin films for coatings and optical components.
Key Applications
- Optical Coatings: Thin films for anti-reflective (AR) coatings, UV, and IR applications.
- Semiconductors: Passivation and insulation layers in electronic devices.
- Lasers: Coatings for lenses, mirrors, and windows in laser systems.
- Photolithography: Films for UV-transparent optics in semiconductor fabrication.
- Research and Development: Material studies in photonics and nanotechnology.
Features and Benefits
- Wide Optical Transparency: Effective from UV to IR spectra (0.13–11 μm).
- High Chemical Stability: Resistant to moisture and chemical degradation.
- Low Refractive Index: Reduces the need for complex multilayer coatings.
- Thermal Stability: Suitable for high-temperature thin-film deposition.
- High Purity: Ensures uniform film quality and minimizes defects.
Specifications
- Chemical Formula: CaF₂
- Purity: ≥ 99.9% (ultra-high purity options available).
- Density: ~3.18 g/cm³
- Melting Point: ~1,418°C
- Shapes: Circular, rectangular, and custom geometries.
- Sizes: Standard and custom dimensions compatible with various sputtering systems.
Customization Options
- Geometry: Custom sizes and shapes to match specific sputtering systems.
- Purity Levels: Ultra-high purity options for specialized optical applications.
- Backing Plates: Integrated solutions for enhanced thermal and mechanical performance.
- Custom Compositions: Tailored formulations for unique project requirements.
Enhance your thin-film deposition projects with high-quality Calcium Fluoride (CaF₂) sputtering targets. Contact us today for expert advice, customization options, and reliable materials for your applications.
