Ca Calcium Sputtering Target
Calcium (Ca) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, specifically sputtering, to create thin films of calcium on various substrates. These targets are essential in various advanced technologies, including electronics, optics, and materials science, due to calcium’s unique properties.
Custom products or bulk orders, please contact us for competitive pricing!
- Satisfaction Guaranteed
- No Hassle Refunds
- Secure Payments
Description
| Material | Calcium (Ca) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pc |
| Supply Ability | 1000pcs per month |
| Lead time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Calcium (Ca) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, specifically sputtering, to create thin films of calcium on various substrates. These targets are essential in various advanced technologies, including electronics, optics, and materials science, due to calcium’s unique properties.
Key Features:
- Material: High-purity Calcium (Ca) is typically used, often with a purity level of 99.9% (3N) or higher, to ensure minimal impurities and high-quality thin films.
- Form: Calcium sputtering targets are available in various shapes, such as discs, rectangular plates, or custom geometries, depending on the application’s requirements.
- Density: The density of the calcium target is crucial for ensuring consistent sputtering rates and uniform film deposition.
Applications: Calcium sputtering targets are used in the production of electronic devices, optical coatings, and in the development of new materials with specialized properties.
Considerations:
- Reactivity: Calcium is highly reactive, especially in the presence of air or moisture, so it must be handled with care to avoid oxidation or contamination. Targets are typically stored in controlled environments and may require vacuum-sealed packaging.
- Deposition Control: Sputtering parameters, such as power, pressure, and substrate temperature, must be carefully optimized to achieve the desired film thickness, adhesion, and uniformity.
- Customization: Calcium targets can be customized in terms of size, shape, and purity to meet specific application needs.
Applications in Industry:
- Semiconductors: Used in the production of calcium-based compounds or doping materials in semiconductor devices.
- Optical Coatings: Employed to deposit thin films that alter the optical properties of lenses, mirrors, and other optical components.
- Materials Science: Calcium sputtering targets are used in research and development of new materials, especially those that require specific electronic, optical, or chemical properties.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
