C Carbon Graphite Sputtering Targets
- Purity: Graphite sputtering targets are available in high purity (typically 99.9% or higher) to ensure optimal film quality, especially in semiconductor and energy storage applications.
- High Conductivity: Graphite offers excellent electrical conductivity, making it suitable for thin films in electronic components.
- Thermal Stability: Graphite can withstand high temperatures, making it ideal for applications in high-heat environments.
- Chemical Resistance: Graphite is resistant to many chemicals, enabling its use in corrosive environments and protective coatings.
- Customizable Size and Shape: Available in various forms, such as discs, plates, and custom shapes to fit specific deposition systems.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Graphite (C) |
| Purity | 99.9% – 99.99999% / 3N 3N5 4N 4N5 5N 5N5 6N 6N5 7N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Graphite sputtering targets are widely used in physical vapor deposition (PVD) processes to create thin films with unique electrical, thermal, and mechanical properties. Graphite, a form of carbon, is known for its excellent conductivity, chemical resistance, and high-temperature stability, making it valuable in numerous industrial applications.
Key Applications:
- Semiconductors: Graphite thin films are used in semiconductor manufacturing for electrode materials, interconnects, and other components due to their conductive properties.
- Energy Storage: Graphite films are employed in batteries and supercapacitors, serving as anode materials in lithium-ion batteries and improving energy storage efficiency.
- Tribological Coatings: Graphite’s solid lubrication properties make it ideal for wear-resistant coatings in automotive, aerospace, and industrial machinery applications.
- Aerospace and Defense: Graphite films provide thermal protection and are used in high-temperature environments, such as in spacecraft and military applications, where durability and heat resistance are crucial.
- Optical Coatings: Graphite thin films are applied in optical devices where electrical conductivity and chemical resistance are required, particularly in harsh environments.
Features of Graphite Sputtering Targets:
- Purity: Graphite sputtering targets are available in high purity (typically 99.9% or higher) to ensure optimal film quality, especially in semiconductor and energy storage applications.
- High Conductivity: Graphite offers excellent electrical conductivity, making it suitable for thin films in electronic components.
- Thermal Stability: Graphite can withstand high temperatures, making it ideal for applications in high-heat environments.
- Chemical Resistance: Graphite is resistant to many chemicals, enabling its use in corrosive environments and protective coatings.
- Customizable Size and Shape: Available in various forms, such as discs, plates, and custom shapes to fit specific deposition systems.
Customization Options:
- Dimensions: Graphite sputtering targets can be produced in a variety of sizes, including custom diameters and thicknesses, to meet specific deposition system requirements.
- Purity Levels: High-purity graphite (99.9% or higher) is available for sensitive applications like semiconductors and energy storage devices.
- Backing Plates: Optional backing plates can be added for improved durability and mounting during the sputtering process.
Graphite sputtering targets from Tinsan Materials offer high-purity C for thin film deposition in semiconductors, energy storage, and tribological coatings. Custom sizes and shapes available for optimized PVD performance.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
