CeO2 (Cerium Dioxide) Sputtering Target
- High Refractive Index: CeO₂ is valued in optical applications due to its high refractive index and transparency in the visible spectrum.
- Excellent Catalytic Properties: CeO₂’s strong ability to promote oxidation reactions makes it essential in catalytic applications.
- Dielectric Properties: CeO₂ has a high dielectric constant, making it suitable for thin film applications in the semiconductor industry.
- Chemical Stability: CeO₂ is chemically stable in harsh environments, ensuring the durability of thin films under various conditions.
Custom products or bulk orders, please contact us for competitive pricing!
- Satisfaction Guaranteed
- No Hassle Refunds
- Secure Payments
Description
| Material | CeO2 |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Cerium Dioxide (CeO₂) sputtering targets are widely used for thin film deposition in various industries due to CeO₂’s excellent optical, catalytic, and electronic properties. It is commonly used in applications like optical coatings, fuel cells, catalysts, and semiconductor devices.
Key Applications:
- Optical Coatings: CeO₂ is often used for creating transparent, durable optical coatings on lenses and glass surfaces. Its high refractive index and UV-blocking ability make it ideal for protective and functional coatings.
- Catalysts: CeO₂ is a powerful oxidizing agent, frequently used in automotive catalytic converters and fuel cells to improve oxygen ion conductivity and support redox reactions.
- Semiconductors: CeO₂ thin films are used in semiconductor devices as dielectric layers due to their high dielectric constant and compatibility with silicon-based technologies.
- Fuel Cells: In solid oxide fuel cells (SOFCs), CeO₂ plays a key role in enhancing oxygen ion conductivity and overall cell efficiency.
- Polishing Agents: CeO₂ is used as a high-performance polishing material for glass and semiconductor wafers due to its abrasive characteristics.
Features of CeO₂ Sputtering Targets:
- High Refractive Index: CeO₂ is valued in optical applications due to its high refractive index and transparency in the visible spectrum.
- Excellent Catalytic Properties: CeO₂’s strong ability to promote oxidation reactions makes it essential in catalytic applications.
- Dielectric Properties: CeO₂ has a high dielectric constant, making it suitable for thin film applications in the semiconductor industry.
- Chemical Stability: CeO₂ is chemically stable in harsh environments, ensuring the durability of thin films under various conditions.
Customization Options:
- Target Sizes: Available in various sizes and shapes to accommodate different sputtering systems and thin film requirements.
- Purity Levels: High-purity CeO₂ sputtering targets (up to 99.99%) ensure film quality and performance in sensitive applications.
- Bonding Services: CeO₂ targets can be bonded to backing plates to enhance thermal conductivity and prevent cracking during sputtering.
CeO₂ (Cerium Dioxide) sputtering targets from Tinsan Materials are used in optical coatings, catalysts, semiconductors, and fuel cells. Offering high refractive index, catalytic activity, and dielectric properties, CeO₂ targets are available in various sizes and purity levels for thin film deposition.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
