CrB2 (Chromium Diboride) Sputtering Targets
- Superior Hardness: Produces coatings with excellent wear resistance.
- High Thermal Stability: Ideal for high-temperature environments.
- Corrosion Resistance: Protects components exposed to harsh conditions.
- High Purity: Ensures consistent deposition and defect-free thin films.
- Customizable Design: Available in various sizes and configurations to suit diverse sputtering systems.
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Description
| Material | Chromium Diboride (CrB₂) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Chromium Diboride (CrB₂) sputtering targets are high-performance materials widely used in thin-film deposition processes for advanced coatings. Known for their exceptional hardness, thermal stability, and resistance to wear and corrosion, CrB₂ targets are ideal for producing durable and reliable films. These targets are frequently used in the electronics, aerospace, and energy sectors, as well as for protective and decorative coatings in industrial applications.
Key Applications
- Protective Coatings: Suitable for wear-resistant and anti-corrosion layers on tools and components.
- Electronic Devices: Used in thin films for microelectronics and semiconductor applications.
- Aerospace Industry: Provides high-temperature resistant coatings for critical components.
- Decorative Coatings: Enhances the appearance and durability of surfaces.
Features and Benefits
- Superior Hardness: Produces coatings with excellent wear resistance.
- High Thermal Stability: Ideal for high-temperature environments.
- Corrosion Resistance: Protects components exposed to harsh conditions.
- High Purity: Ensures consistent deposition and defect-free thin films.
- Customizable Design: Available in various sizes and configurations to suit diverse sputtering systems.
Specifications
- Purity: ≥99.5% for reliable and high-quality thin films.
- Density: Approx. 5.15 g/cm³.
- Shapes: Circular, rectangular, and custom geometries.
- Sizes: Adaptable to different sputtering equipment requirements.
- Surface Finish: Polished for uniform sputtering performance.
Customization Options
- Dimensions and Geometries: Tailored to fit specific deposition systems.
- Purity Levels: Higher purities available for specialized applications.
- Bonding Services: Backing plate bonding for enhanced mechanical stability and heat dissipation.
Looking for Chromium Diboride (CrB₂) sputtering targets for your thin-film deposition needs? Contact us today for detailed specifications, pricing, and tailored solutions.
