CrSi2 (Chromium Disilicide) Sputtering Targets
- High Purity: Ensures the production of defect-free thin films with superior properties.
- Thermal Stability: Withstands high-temperature processes without degradation.
- Excellent Conductivity: Suitable for electronic and optoelectronic applications.
- Customizable Design: Available in a variety of shapes and sizes to fit specific sputtering systems.
- Durable Material: Resistant to oxidation and corrosion for reliable long-term use.
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Description
| Material | Chromium Disilicide (CrSi₂) |
| Purity | 99.5% – 99.9999% / 2N5 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Chromium Disilicide (CrSi₂) sputtering targets are advanced materials designed for thin-film deposition applications in electronics, optics, and energy sectors. Known for their exceptional thermal stability, electrical conductivity, and corrosion resistance, CrSi₂ targets are widely used in semiconductors, protective coatings, and high-temperature applications. These targets provide consistent performance, ensuring high-quality films in PVD processes.
Key Applications
- Semiconductors: Used for interconnects and barrier layers in electronic devices.
- Optical Coatings: Ideal for anti-reflective and protective coatings on lenses and mirrors.
- Energy Applications: Suitable for use in thermoelectric and photovoltaic devices.
- Wear-Resistant Coatings: Enhances durability of tools and components exposed to high-stress environments.
Features and Benefits
- High Purity: Ensures the production of defect-free thin films with superior properties.
- Thermal Stability: Withstands high-temperature processes without degradation.
- Excellent Conductivity: Suitable for electronic and optoelectronic applications.
- Customizable Design: Available in a variety of shapes and sizes to fit specific sputtering systems.
- Durable Material: Resistant to oxidation and corrosion for reliable long-term use.
Specifications
- Purity: ≥99.5% for high-performance thin films.
- Density: Approx. 5.22 g/cm³.
- Shapes: Circular, rectangular, and custom geometries.
- Sizes: Adaptable to different deposition system requirements.
- Surface Finish: Fine-polished for uniform sputtering.
Customization Options
- Dimensions and Geometries: Tailored to meet equipment-specific needs.
- Purity Grades: Higher purities available upon request.
- Bonding Services: Backing plate bonding for enhanced thermal conductivity and mechanical stability.
Need Chromium Disilicide (CrSi₂) sputtering targets for your thin-film application? Contact us today for quotes, technical support, and custom solutions tailored to your project requirements.
