Er2O3 (Erbium Oxide) Sputtering Target

Description

Material	Er2O3
Purity	99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape	disc, plate, sheet, rod, customized
Size	can be customized (contact us)
Package	vacuum bag or customer’s request
Place of Origin	China
MOQ	1pcs
Supply Ability	10000pcs per month
Lead Time	Qty: 1-100, Time: 3-10 days Qty: >100, Time: to be negotiated

Erbium Oxide (Er₂O₃) is a high-performance ceramic material that is widely used in thin-film deposition for various advanced optical, electronic, and photonic applications. Er₂O₃ sputtering targets are known for their excellent optical properties, particularly in infrared (IR) applications, and are highly valued in fiber-optic systems, lasers, and optical amplifiers.

Key Applications:

Optical Amplifiers: Er₂O₃ is a key material in the production of Erbium-Doped Fiber Amplifiers (EDFAs), which are critical in extending the range of fiber-optic communication systems. The erbium ions enable signal amplification in the 1.55 µm wavelength range, which is used in telecommunications.
Lasers: Erbium Oxide is used in laser systems, particularly in medical lasers and laser skin resurfacing due to its ability to emit light in the mid-IR region (around 2.94 µm). This wavelength is highly absorbed by water, making it effective for precise tissue ablation with minimal damage to surrounding areas.
Thin-Film Coatings: Er₂O₃ films are employed in optical coatings due to their high transparency in the IR spectrum and excellent refractive index, making them suitable for anti-reflective coatings, IR detectors, and optical sensors.
Photonic Devices: Er₂O₃ sputtering targets are used in the production of thin films for photonic devices, including optical waveguides, which are essential for integrating photonic circuits into various devices.
Energy Storage: Er₂O₃ thin films are explored in certain advanced energy storage systems, contributing to higher efficiency and stability in solid-state devices.

Features of Er₂O₃ Sputtering Targets:

High Infrared Transparency: Er₂O₃ has excellent transparency in the infrared range, making it a critical material for fiber-optic communications, laser systems, and IR detectors.
Optical Amplification: The presence of erbium ions in Er₂O₃ allows for efficient optical amplification in the telecommunications band around 1.55 µm, making it ideal for use in EDFAs.
Thermal Stability: Er₂O₃ sputtering targets provide thin films that are thermally stable and chemically inert, suitable for high-temperature applications.
Customizability: Er₂O₃ sputtering targets can be customized to meet specific deposition needs, including different geometries, sizes, and purity levels for improved thin-film performance.

Customization Options:

Target Sizes: Er₂O₃ sputtering targets come in various shapes and sizes, including round, rectangular, and custom dimensions, to fit different sputtering systems.
Purity Levels: High-purity Er₂O₃ targets (up to 99.99%) are available to ensure the highest quality films for critical optical and photonic applications.
Bonding Services: Er₂O₃ targets can be bonded to backing plates for improved heat dissipation during sputtering processes, reducing the risk of target cracking.

Er₂O₃ (Erbium Oxide) sputtering targets from Tinsan Materials are ideal for thin-film deposition in optical amplifiers, lasers, and photonic devices. Offering excellent IR transparency, high thermal stability, and customizable sizes and purity, Er₂O₃ targets are key materials for use in EDFAs, IR coatings, and medical lasers.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.