Er Erbium Sputtering Target
- Material: High-purity Erbium, typically with a purity level of 99.9% (3N) or higher, ensures minimal impurities during the sputtering process.
- Form: Erbium sputtering targets are commonly available in the form of discs, rectangular plates, or custom shapes, depending on specific application requirements.
- Density: The target’s density is critical for achieving consistent deposition rates and high-quality thin films.
- Applications: These targets are used in applications such as optical amplifiers, lasers, telecommunications, and electronic devices.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Erbium (Er) |
| Purity | 99.9% – 99.999% / 3N 3N5 4N 4N5 5N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 1000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Erbium (Er) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes to deposit thin films of erbium on various substrates. Erbium (Er) is a rare earth metal with applications in areas such as photonics, telecommunications, and advanced materials, making these sputtering targets valuable for various industries.
Key Features:
- Material: High-purity Erbium, typically with a purity level of 99.9% (3N) or higher, ensures minimal impurities during the sputtering process.
- Form: Erbium sputtering targets are commonly available in the form of discs, rectangular plates, or custom shapes, depending on specific application requirements.
- Density: The target’s density is critical for achieving consistent deposition rates and high-quality thin films.
- Applications: These targets are used in applications such as optical amplifiers, lasers, telecommunications, and electronic devices.
Considerations:
- Reactivity: Erbium is relatively stable in air but can oxidize at elevated temperatures. It is important to handle it properly to avoid contamination or oxidation. Sputtering targets are usually stored in controlled environments.
- Deposition Control: Proper optimization of sputtering parameters—such as power, pressure, and substrate temperature—is crucial for achieving desired film thickness, uniformity, and properties.
- Customization: Erbium targets can be customized based on size, shape, and purity to match specific needs, making them suitable for a wide range of applications.
Applications in Industry:
- Telecommunications: Erbium-doped fibers are a key component in optical amplifiers, widely used in fiber-optic communication systems to amplify light signals.
- Lasers and Photonics: Erbium is used in solid-state lasers and other photonic devices, especially for generating wavelengths around 1.5 µm, a key range in telecommunications.
- Materials Science: Erbium sputtering targets are used in the development of new materials with unique optical, electronic, and magnetic properties.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
