Fe3O4 (Magnetite / Iron Oxide) Sputtering Targets
- High Purity: Guarantees consistent deposition and minimal contamination in thin films.
- Strong Magnetic Properties: Provides excellent performance in magnetic and spintronic devices.
- High Electrical Conductivity: Enhances the functionality of conductive thin films.
- Customizable Dimensions: Manufactured to meet the requirements of diverse sputtering systems.
- Versatile Material: Suitable for applications ranging from electronics to biomedical engineering.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
| Material | Magnetite (Fe₃O₄ / Iron Oxide) |
| Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
| Shape | disc, plate, sheet, rod, customized |
| Size | can be customized (contact us) |
| Package | vacuum bag or customer’s request |
| Place of Origin | China |
| MOQ | 1pcs |
| Supply Ability | 10000pcs per month |
| Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Fe₃O₄ (Magnetite / Iron Oxide) sputtering targets are composed of high-purity magnetite, a naturally magnetic iron oxide material. These targets are widely used in thin-film deposition for applications requiring magnetic or conductive properties. Fe₃O₄ thin films exhibit excellent magnetoresistance, high electrical conductivity, and unique optical characteristics, making them ideal for advanced electronic, magnetic, and optical devices.
Key Applications
- Magnetic Storage Devices: Used in creating magnetic thin films for data storage technologies.
- Spintronics: Suitable for spintronic devices that exploit the electron’s spin in addition to charge.
- Transparent Conductors: Employed in optoelectronics requiring conductive and transparent layers.
- Sensors and Detectors: Ideal for magnetic and electromagnetic sensing applications.
- Biomedical Applications: Utilized in bio-compatible magnetic coatings for medical devices and research.
Features and Benefits
- High Purity: Guarantees consistent deposition and minimal contamination in thin films.
- Strong Magnetic Properties: Provides excellent performance in magnetic and spintronic devices.
- High Electrical Conductivity: Enhances the functionality of conductive thin films.
- Customizable Dimensions: Manufactured to meet the requirements of diverse sputtering systems.
- Versatile Material: Suitable for applications ranging from electronics to biomedical engineering.
Specifications
- Purity: Typically ≥ 99.9% to ensure high-quality deposition.
- Density: Optimized for efficient sputtering.
- Shape: Available in discs, plates, and custom geometries.
- Dimensions: Custom sizes to fit specific sputtering equipment.
- Composition: Fe₃O₄ with precise stoichiometric control for reliable thin-film characteristics.
Customization Options
- Target Size: Fe₃O₄ sputtering targets are available in various dimensions to meet different system requirements.
- Backing Plates: Optional backing plates for enhanced thermal conductivity and mechanical stability.
- Composition Adjustments: Custom stoichiometry is available for specialized applications.
For more details about Fe₃O₄ sputtering targets, including pricing and customization, please reach out to our expert team. We’re here to assist with your thin-film deposition needs.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.
