Gd2O3 (Gadolinium Oxide) Sputtering Target
- High Purity: Available in high-purity levels to ensure the quality of thin films for sensitive electronic and optical applications.
- Magnetic Properties: Gd₂O₃ exhibits strong magnetic behavior, making it suitable for applications in magnetic storage and spintronic devices.
- High-k Dielectric: Its high dielectric constant makes Gd₂O₃ ideal for use in semiconductor devices as a gate dielectric material.
- Thermal Stability: Gd₂O₃ is thermally stable, maintaining its structural integrity and properties during high-temperature processes.
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Description
Material | Gd2O3 |
Purity | 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N |
Shape | disc, plate, sheet, rod, customized |
Size | can be customized (contact us) |
Package | vacuum bag or customer’s request |
Place of Origin | China |
MOQ | 1pcs |
Supply Ability | 10000pcs per month |
Lead Time | Qty: 1-100, Time: 3-10 days
Qty: >100, Time: to be negotiated |
Gadolinium Oxide (Gd₂O₃) sputtering targets are used for the production of thin films in a variety of advanced technological applications. Gd₂O₃ is a rare earth oxide with unique magnetic, optical, and dielectric properties, making it useful in industries such as electronics, photonics, and biomedical devices.
Key Applications:
- Semiconductors: Gd₂O₃ thin films are used as high-k dielectric materials in semiconductor devices, improving insulation and performance in transistors and integrated circuits.
- Magnetic Materials: Gd₂O₃ films are employed in spintronics and magnetic devices due to their magnetic properties, making them suitable for memory storage applications.
- Optoelectronics: Gadolinium oxide is used in optical coatings, lasers, and scintillators, benefiting from its transparency in the infrared (IR) range and excellent refractive index.
- Biomedical Devices: Gd₂O₃ is explored in medical imaging, particularly in magnetic resonance imaging (MRI), where gadolinium-based contrast agents enhance image quality.
- Luminescent Materials: Gd₂O₃ thin films are used in phosphors and other luminescent materials for display technologies and lighting applications.
Features of Gd₂O₃ Sputtering Targets:
- High Purity: Available in high-purity levels to ensure the quality of thin films for sensitive electronic and optical applications.
- Magnetic Properties: Gd₂O₃ exhibits strong magnetic behavior, making it suitable for applications in magnetic storage and spintronic devices.
- High-k Dielectric: Its high dielectric constant makes Gd₂O₃ ideal for use in semiconductor devices as a gate dielectric material.
- Thermal Stability: Gd₂O₃ is thermally stable, maintaining its structural integrity and properties during high-temperature processes.
Customization Options:
- Target Sizes: Available in various sizes and shapes to meet specific sputtering system requirements.
- Purity Levels: High-purity Gd₂O₃ sputtering targets tailored to ensure superior film quality for critical applications.
- Bonding Services: Gd₂O₃ targets can be bonded to backing plates for better heat management during sputtering.
Tinsan Materials offers high-purity Gd₂O₃ (Gadolinium Oxide) sputtering targets for thin film deposition in semiconductors, magnetic devices, and optoelectronics. Gd₂O₃ films provide excellent dielectric and magnetic properties for advanced technological applications.
If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.